SCANNING ELECTRON MICROSCOPE
    1.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号:US20090230304A1

    公开(公告)日:2009-09-17

    申请号:US12396593

    申请日:2009-03-03

    IPC分类号: G01N23/00

    摘要: In a VP-SEM that uses gas multiplication induced within a low-vacuum sample chamber and uses a method of detecting a positive displacement current, a secondary electron detector for the VP-SEM that responds at high speed, which can acquire a TV-Scan rate image at a low cost while saving a space is provided. A secondary electron detector is formed by forming the electron supplying electrode and the detection electrode on the flexible thin film type substrate such as a polyimide film, etc., by an etching method. Thereby, the space can be saved while realizing low cost due to mass production. Further, the ion horizontally moving with respect to the surface of the secondary electron detector is detected and the ion moving in a vertical direction returned to the sample holder is not detected, making it possible to realize a high-speed response.

    摘要翻译: 在使用在低真空样品室内引起的气体倍增并使用检测正位移电流的方法的VP-SEM中,用于高速响应的VP-SEM的二次电子检测器,其可以获取TV扫描 提供了节省空间的低成本的速率图像。 通过蚀刻方法在诸如聚酰亚胺膜等的柔性薄膜型基板上形成电子供给电极和检测电极来形成二次电子检测器。 由此,可以节省空间,同时由于批量生产而实现低成本。 此外,检测相对于二次电子检测器的表面水平移动的离子,并且未检测到返回到样品架的垂直方向的离子移动,使得可以实现高速响应。

    Scanning electron microscope
    2.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US08097848B2

    公开(公告)日:2012-01-17

    申请号:US12396593

    申请日:2009-03-03

    IPC分类号: H01J37/28

    摘要: In a VP-SEM that uses gas multiplication induced within a low-vacuum sample chamber and uses a method of detecting a positive displacement current, a secondary electron detector for the VP-SEM that responds at high speed, which can acquire a TV-Scan rate image at a low cost while saving a space is provided. A secondary electron detector is formed by forming the electron supplying electrode and the detection electrode on the flexible thin film type substrate such as a polyimide film, etc., by an etching method. Thereby, the space can be saved while realizing low cost due to mass production. Further, the ion horizontally moving with respect to the surface of the secondary electron detector is detected and the ion moving in a vertical direction returned to the sample holder is not detected, making it possible to realize a high-speed response.

    摘要翻译: 在使用在低真空样品室内引起的气体倍增并使用检测正位移电流的方法的VP-SEM中,用于高速响应的VP-SEM的二次电子检测器,其可以获取TV扫描 提供了节省空间的低成本的速率图像。 通过蚀刻方法在诸如聚酰亚胺膜等的柔性薄膜型基板上形成电子供给电极和检测电极来形成二次电子检测器。 由此,可以节省空间,同时由于批量生产而实现低成本。 此外,检测相对于二次电子检测器的表面水平移动的离子,并且未检测到返回到样品架的垂直方向的离子移动,使得可以实现高速响应。

    Charged particle beam device
    3.
    发明授权
    Charged particle beam device 有权
    带电粒子束装置

    公开(公告)号:US09287083B2

    公开(公告)日:2016-03-15

    申请号:US13979964

    申请日:2011-12-16

    摘要: Provided is a charged particle beam device that is capable of suppressing an field-of-view deviation occurring when observing a tilted image or a left-right parallax-angle image acquired by irradiating a tilted beam on a sample while continuously compensating a focus. By means of an aligner for compensating field-of-view (54) installed between an objective lens (7) that focuses a primary charged particle beam on a surface of the sample (10), and a deflector for controlling tilt angle (53) that tilts the primary charged particle beam, the field-of-view deviation occurring during tilting of the primary charged particle beam is suppressed based on an amount of compensation required by a tilt angle of the deflector for controlling tilt angle (53), lens conditions, and a distance between the objective lens (7) and the sample (10), in conjunction with a focus compensation of the objective lens (7).

    摘要翻译: 提供了一种带电粒子束装置,其能够抑制在观察通过在连续补偿焦点的同时对样品照射倾斜光束而获得的倾斜图像或左右视差角图像时发生的视场偏差。 借助于用于补偿视场(54)的对准器,其安装在将初级带电粒子束聚焦在样品(10)的表面上的物镜(7)和用于控制倾斜角(53)的偏转器之间, 使主要带电粒子束倾斜,基于用于控制倾斜角(53)的偏转器的倾斜角所需的补偿量,抑制主要带电粒子束倾斜期间发生的视场偏差(53),透镜条件 ,以及物镜(7)和样本(10)之间的距离,结合物镜(7)的聚焦补偿。

    CHARGED PARTICLE BEAM DEVICE
    4.
    发明申请
    CHARGED PARTICLE BEAM DEVICE 有权
    充电颗粒光束装置

    公开(公告)号:US20130299715A1

    公开(公告)日:2013-11-14

    申请号:US13979964

    申请日:2011-12-16

    IPC分类号: H01J37/147

    摘要: Provided is a charged particle beam device that is capable of suppressing an field-of-view deviation occurring when observing a tilted image or a left-right parallax-angle image acquired by irradiating a tilted beam on a sample while continuously compensating a focus. By means of an aligner for compensating field-of-view (54) installed between an objective lens (7) that focuses a primary charged particle beam on a surface of the sample (10), and a deflector for controlling tilt angle (53) that tilts the primary charged particle beam, the field-of-view deviation occurring during tilting of the primary charged particle beam is suppressed based on an amount of compensation required by a tilt angle of the deflector for controlling tilt angle (53), lens conditions, and a distance between the objective lens (7) and the sample (10) , in conjunction with a focus compensation of the objective lens (7).

    摘要翻译: 提供了一种带电粒子束装置,其能够抑制在观察通过在连续补偿焦点的同时对样品照射倾斜光束而获得的倾斜图像或左右视差角图像时发生的视场偏差。 借助于用于补偿视场(54)的对准器,其安装在将初级带电粒子束聚焦在样品(10)的表面上的物镜(7)和用于控制倾斜角(53)的偏转器之间, 使主要带电粒子束倾斜,基于用于控制倾斜角(53)的偏转器的倾斜角所需的补偿量,抑制主要带电粒子束倾斜期间发生的视场偏差(53),透镜条件 ,以及物镜(7)和样本(10)之间的距离,结合物镜(7)的聚焦补偿。

    Scanning Electron Microscope
    7.
    发明申请
    Scanning Electron Microscope 有权
    扫描电子显微镜

    公开(公告)号:US20080035843A1

    公开(公告)日:2008-02-14

    申请号:US11768291

    申请日:2007-06-26

    IPC分类号: H01J49/00

    摘要: In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate to generate subsidiary electrons. An electric field supply electrode applied with a positive voltage of +100 to +500V is arranged in a gap defined by the reflection plate and a specimen stage. A first detection electrode is arranged to detect ion current attributable to backscattering electrons and a second detection electrode is arranged to detect current representative of coexistence of ion currents attributable to secondary electron and backscattering electron. The scanning electron microscope constructed as above can achieve simultaneous separation/detection of secondary electron and backscattering electron.

    摘要翻译: 在扫描型电子显微镜中,在试样室内设置接地电位的反射板,反射散射从试样射出的电子撞击在反射板上,产生副电子。 施加+100〜+ 500V的正电压的电场供给电极被配置在由反射板和样本台所限定的间隙中。 布置第一检测电极以检测归因于后向散射电子的离子电流,并且布置第二检测电极以检测代表归属于二次电子和后向散射电子的离子电流共存的电流。 如上构造的扫描电子显微镜可以实现二次电子和后向散射电子的同时分离/检测。

    Scanning electron microscope
    8.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US07755045B2

    公开(公告)日:2010-07-13

    申请号:US11768291

    申请日:2007-06-26

    IPC分类号: H01J37/26

    摘要: In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate to generate subsidiary electrons. An electric field supply electrode applied with a positive voltage of +100 to +500V is arranged in a gap defined by the reflection plate and a specimen stage. A first detection electrode is arranged to detect ion current attributable to backscattering electrons and a second detection electrode is arranged to detect current representative of coexistence of ion currents attributable to secondary electron and backscattering electron. The scanning electron microscope constructed as above can achieve simultaneous separation/detection of secondary electron and backscattering electron.

    摘要翻译: 在扫描型电子显微镜中,在试样室内设置接地电位的反射板,反射散射从试样射出的电子撞击在反射板上,产生副电子。 施加+100〜+ 500V的正电压的电场供给电极被配置在由反射板和样本台所限定的间隙中。 布置第一检测电极以检测归因于后向散射电子的离子电流,并且布置第二检测电极以检测代表归属于二次电子和后向散射电子的离子电流共存的电流。 如上构造的扫描电子显微镜可以实现二次电子和后向散射电子的同时分离/检测。

    Charged particle beam apparatus
    10.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US08629395B2

    公开(公告)日:2014-01-14

    申请号:US13521273

    申请日:2011-01-12

    摘要: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).

    摘要翻译: 为了提供一种带电粒子束装置,其能够将鉴别中的带电粒子束信号检测为多个能带,并且使用该信号获得每个能带的高分辨率图像,带电粒子束装置具有带电粒子 来源(12-1); 限制带电粒子束(4)的直径的孔(16); 用于带电粒子束的光学器件(14,17,19) 样品架(21); 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器(40) 以及处理来自带电粒子检测器的输出信号的信号计算单元。 带电粒子检测器(40)具有第一检测灵敏度的第一小检测器(51)和具有第二检测灵敏度的第二小检测器(52),并从检体上的位置观察检测立体角, 对于第一小型检测器(51)和第二小型检测器(52),带电粒子束(4)将被照射到其上。