公开(公告)号：US6054181A

公开(公告)日：2000-04-25

申请号：US692286

申请日：1996-08-05

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05D3/12

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： A method of subjecting a plurality of wafers to coating and beating treatments where a first boat is placed on a stage arranged in an interface section. The first boat is capable of containing the wafers stacked at intervals in a vertical direction. The stage is capable of moving in a horizontal direction, and has a plurality of positions for respectively placing a plurality of boats. The wafers are conveyed from a supply section to a coating section, and are subjected to a coating treatment one by one. The wafers, which have undergone the coating treatment, are conveyed to the interface section. The wafers, which have undergone the coating treatment, are loaded into the first boat placed on the stage, in the interface section. The first boat containing the wafers, which have undergone the coating treatment, is located at a transfer position by moving the stage. The first boat, located at a transfer position by moving the stage. The first boat, located at the transfer position, is conveyed from the stage into a heating section, and the wafers, which have undergone the coating treatment, are subjected to a heating treatment simultaneously and all together.

摘要翻译： 一种将多个晶片进行涂覆和打浆处理的方法，其中第一个船被放置在布置在界面部分中的台上。 第一艘船能够容纳沿垂直方向间隔堆叠的晶片。 舞台能够沿水平方向移动，并且具有用于分别放置多个船的多个位置。 将晶片从供给部输送到涂布部，并逐个进行涂布处理。 已经经过涂覆处理的晶片被输送到界面部分。 已经进行了涂覆处理的晶片被装载到接口部分中放置在载物台上的第一个舟皿中。 包含经过涂覆处理的晶片的第一艘船通过移动台架位于转移位置。 第一艘船，通过移动舞台位于转移位置。 位于转移位置的第一个船从载物台输送到加热部分，并且经过涂覆处理的晶片同时进行加热处理。

公开(公告)号：US5565034A

公开(公告)日：1996-10-15

申请号：US331083

申请日：1994-10-28

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding member, and a moving member for detachably supplying a plurality of object holding member and simultaneously moving the plurality of object holding member, and a heat-treatment section having a second transfer member for transferring the object placed on the object holding member to a heat-treatment section for heat-treating the plurality of objects, which have undergone the coating process, in accordance with a batch process.

摘要翻译： 根据本发明的基板处理装置包括接口部分，其具有第一传送部件，用于从涂覆处理部分传送物体，用于根据单个片材处理将物体施加到物体上，并将物体保持部件移动 用于可拆卸地供给多个物体保持部件并同时移动多个物体保持部件的部件，以及具有用于将放置在物体保持部件上的物体转印到热处理部的热转印部件的热处理部， 根据分批处理对经过涂覆处理的多个物体进行处理。

公开(公告)号：US5725664A

公开(公告)日：1998-03-10

申请号：US692436

申请日：1996-08-05

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： An apparatus for subjecting a plurality of wafers to coating and heating treatments, including a coating section for subjecting the wafers to a coating treatment one by one, a heating section for subjecting wafers which have undergone the coating treatment to a heating treatment all together, and an interface section arranged between the coating section and the heating section. The wafers are heat-treated in the heat treatment section while the wafers are stacked at intervals in a vertical direction in a boat. The wafers which have undergone the coating treatment are loaded into the boat by a conveying member in the interface section. The conveying member and the boat are surrounded by a surrounding space formed by a casing at the interface section. A circulation line is combined with an air supply and exhaust system, for circulating air in the surrounding space. A dehumidifier is arranged on the circulation line for dehumidifying air in the circulation line to provide localized dehumidification of the surrounding space formed by the casing.

摘要翻译： 一种用于对多个晶片进行涂覆和加热处理的设备，包括用于对晶片进行一次涂覆处理的涂布部分，将经过涂覆处理的晶片全部进行加热处理的加热部分一起进行加热处理;以及 布置在涂覆部分和加热部分之间的界面部分。 在热处理部分中对晶片进行热处理，同时晶片在船上沿垂直方向间隔堆叠。 已经经过涂覆处理的晶片通过接口部分中的传送部件装载到船中。 输送构件和舟皿由在界面部分处由壳体形成的周围空间包围。 循环管线与供气和排气系统结合，用于在周围空间循环空气。 在循环管线上设置除湿器，用于对循环管线中的空气进行除湿，以提供由壳体形成的周围空间的局部除湿。

公开(公告)号：US5518542A

公开(公告)日：1996-05-21

申请号：US336213

申请日：1994-11-04

申请人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

发明人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

IPC分类号： H01L21/304 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/00 ,  H01L21/311 ,  H01L21/677 ,  B05C1/00

CPC分类号： H01L21/67173 ,  B08B1/007 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/31116 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/6715 ,  H01L21/67178 ,  B08B2203/0288 ,  Y10S134/902 ,  Y10S414/136 ,  Y10S414/141

摘要： There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

摘要翻译： 提供了一种双面基板清洁装置，包括用于装载/卸载其中存储有待处理物体的载体的承载站，用于传送从承载站取出的物体的传送机构，至少一个清洁机构，布置 沿着传送机构传送物体的传送路径，用于清洁物体，以及沿着传送路径布置的用于反转物体的物体反转机构。

公开(公告)号：US5964954A

公开(公告)日：1999-10-12

申请号：US890996

申请日：1997-07-10

申请人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

发明人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

IPC分类号： H01L21/304 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/00 ,  H01L21/311 ,  H01L21/677 ,  B08B7/00 ,  B08B7/04

CPC分类号： H01L21/67173 ,  B08B1/007 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/31116 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/6715 ,  H01L21/67178 ,  B08B2203/0288 ,  Y10S134/902 ,  Y10S414/136 ,  Y10S414/141

摘要： There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

摘要翻译： 提供了一种双面基板清洁装置，包括用于装载/卸载其中存储有待处理物体的载体的承载站，用于传送从载体台取出的物体的传送机构，至少一个清洁机构， 沿着传送机构传送物体的传送路径，用于清洁物体，以及沿着传送路径布置的用于反转物体的物体反转机构。

公开(公告)号：US5686143A

公开(公告)日：1997-11-11

申请号：US597536

申请日：1996-02-02

申请人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

发明人： Hiroyuki Matsukawa ,  Akira Yonemizu ,  Michiaki Matsushita ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hidetami Yaegashi ,  Takahide Fukuda

IPC分类号： H01L21/304 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/00 ,  H01L21/311 ,  H01L21/677 ,  B05D3/00

CPC分类号： H01L21/67173 ,  B08B1/007 ,  B08B1/04 ,  B08B3/04 ,  B08B3/12 ,  H01L21/31116 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/6715 ,  H01L21/67178 ,  B08B2203/0288 ,  Y10S134/902 ,  Y10S414/136 ,  Y10S414/141

摘要： There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

摘要翻译： 提供了一种双面基板清洁装置，包括用于装载/卸载其中存储有待处理物体的载体的承载站，用于传送从承载站取出的物体的传送机构，至少一个清洁机构，布置 沿着传送机构传送物体的传送路径，用于清洁物体，以及沿着传送路径布置的用于反转物体的物体反转机构。

公开(公告)号：US5928390A

公开(公告)日：1999-07-27

申请号：US787862

申请日：1997-01-23

申请人： Hidetami Yaegashi ,  Takayuki Toshima ,  Masami Akimoto ,  Eiji Yamaguchi ,  Junichi Kitano ,  Takayuki Katano ,  Hiroshi Shinya ,  Naruaki Iida

发明人： Hidetami Yaegashi ,  Takayuki Toshima ,  Masami Akimoto ,  Eiji Yamaguchi ,  Junichi Kitano ,  Takayuki Katano ,  Hiroshi Shinya ,  Naruaki Iida

IPC分类号： H01L21/00 ,  H01L21/68 ,  B23P21/00 ,  B65G49/07 ,  H01L21/027

CPC分类号： H01L21/67178 ,  H01L21/67196 ,  H01L21/67225 ,  H01L21/67742 ,  Y10T29/41

摘要： A processing apparatus comprises a plurality of process unit groups each including a plurality of process units for subjecting an object to a series of processes, the process units being arranged vertically in multiple stages, an object transfer space being defined among the process unit groups, and a transfer mechanism for transferring the object, the transfer mechanism having a transfer member vertically movable in the object transfer space, the transfer member being capable of transferring the object to each of the process units. The processing apparatus further comprises a mechanism for forming a downward air flow in the object transfer space, a mechanism for controlling the quantity of the downward air flow, and a mechanism for controlling the pressure in the object transfer space. Thus, a variation in condition of the object transfer space is reduced.

摘要翻译： 处理装置包括多个处理单元组，每个处理单元组包括用于对象进行一系列处理的多个处理单元，处理单元以多级垂直排列，在处理单元组之间定义对象传送空间，以及 用于传送物体的传送机构，传送机构具有可在物体传送空间中垂直移动的传送部件，传送部件能够将物体传送到每个处理单元。 处理装置还包括用于在物体传送空间中形成向下的空气流的机构，用于控制向下的空气流量的机构，以及用于控制物体传送空间中的压力的​​机构。 因此，物体传送空间的状态的变化减小。

公开(公告)号：US6017663A

公开(公告)日：2000-01-25

申请号：US277735

申请日：1999-03-29

申请人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

发明人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

IPC分类号： G03F7/30 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  H01L21/00 ,  H01L21/027 ,  G03F9/00

CPC分类号： H01L21/67173 ,  G03F7/16 ,  G03F7/26 ,  G03F7/7075 ,  G03F7/70866 ,  H01L21/67017 ,  H01L21/67178 ,  Y10S414/135

摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.

摘要翻译： 一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域 将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次， 在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及 根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

公开(公告)号：US6097469A

公开(公告)日：2000-08-01

申请号：US277734

申请日：1999-03-29

申请人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

发明人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

IPC分类号： G03F7/30 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  H01L21/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： H01L21/67173 ,  G03F7/16 ,  G03F7/26 ,  G03F7/7075 ,  G03F7/70866 ,  H01L21/67017 ,  H01L21/67178 ,  Y10S414/135

摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.

摘要翻译： 一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域 将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次， 在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及 根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

公开(公告)号：US5932380A

公开(公告)日：1999-08-03

申请号：US823470

申请日：1997-03-24

申请人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

发明人： Hidetami Yaegashi ,  Yasunori Kawakami ,  Jae Hoon Park ,  Keiko Kanzawa ,  Takayuki Katano ,  Takayuki Toshima ,  Yuji Kakazu

IPC分类号： G03F7/30 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  H01L21/00 ,  H01L21/027 ,  G03C5/00

CPC分类号： H01L21/67173 ,  G03F7/16 ,  G03F7/26 ,  G03F7/7075 ,  G03F7/70866 ,  H01L21/67017 ,  H01L21/67178 ,  Y10S414/135

摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.