公开(公告)号：US6054181A

公开(公告)日：2000-04-25

申请号：US692286

申请日：1996-08-05

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05D3/12

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： A method of subjecting a plurality of wafers to coating and beating treatments where a first boat is placed on a stage arranged in an interface section. The first boat is capable of containing the wafers stacked at intervals in a vertical direction. The stage is capable of moving in a horizontal direction, and has a plurality of positions for respectively placing a plurality of boats. The wafers are conveyed from a supply section to a coating section, and are subjected to a coating treatment one by one. The wafers, which have undergone the coating treatment, are conveyed to the interface section. The wafers, which have undergone the coating treatment, are loaded into the first boat placed on the stage, in the interface section. The first boat containing the wafers, which have undergone the coating treatment, is located at a transfer position by moving the stage. The first boat, located at a transfer position by moving the stage. The first boat, located at the transfer position, is conveyed from the stage into a heating section, and the wafers, which have undergone the coating treatment, are subjected to a heating treatment simultaneously and all together.

摘要翻译： 一种将多个晶片进行涂覆和打浆处理的方法，其中第一个船被放置在布置在界面部分中的台上。 第一艘船能够容纳沿垂直方向间隔堆叠的晶片。 舞台能够沿水平方向移动，并且具有用于分别放置多个船的多个位置。 将晶片从供给部输送到涂布部，并逐个进行涂布处理。 已经经过涂覆处理的晶片被输送到界面部分。 已经进行了涂覆处理的晶片被装载到接口部分中放置在载物台上的第一个舟皿中。 包含经过涂覆处理的晶片的第一艘船通过移动台架位于转移位置。 第一艘船，通过移动舞台位于转移位置。 位于转移位置的第一个船从载物台输送到加热部分，并且经过涂覆处理的晶片同时进行加热处理。

公开(公告)号：US5565034A

公开(公告)日：1996-10-15

申请号：US331083

申请日：1994-10-28

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding member, and a moving member for detachably supplying a plurality of object holding member and simultaneously moving the plurality of object holding member, and a heat-treatment section having a second transfer member for transferring the object placed on the object holding member to a heat-treatment section for heat-treating the plurality of objects, which have undergone the coating process, in accordance with a batch process.

摘要翻译： 根据本发明的基板处理装置包括接口部分，其具有第一传送部件，用于从涂覆处理部分传送物体，用于根据单个片材处理将物体施加到物体上，并将物体保持部件移动 用于可拆卸地供给多个物体保持部件并同时移动多个物体保持部件的部件，以及具有用于将放置在物体保持部件上的物体转印到热处理部的热转印部件的热处理部， 根据分批处理对经过涂覆处理的多个物体进行处理。

公开(公告)号：US5725664A

公开(公告)日：1998-03-10

申请号：US692436

申请日：1996-08-05

申请人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

发明人： Mitsuhiro Nanbu ,  Naruaki Iida ,  Hideaki Gotou ,  Masanori Tateyama ,  Yuji Yoshimoto ,  Tomoko Ishimoto ,  Hidetami Yaegashi ,  Yasunori Kawakami ,  Takahide Fukuda ,  Akihiro Fujimoto ,  Takashi Takekuma ,  Hiroyuki Matsukawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67265 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

摘要： An apparatus for subjecting a plurality of wafers to coating and heating treatments, including a coating section for subjecting the wafers to a coating treatment one by one, a heating section for subjecting wafers which have undergone the coating treatment to a heating treatment all together, and an interface section arranged between the coating section and the heating section. The wafers are heat-treated in the heat treatment section while the wafers are stacked at intervals in a vertical direction in a boat. The wafers which have undergone the coating treatment are loaded into the boat by a conveying member in the interface section. The conveying member and the boat are surrounded by a surrounding space formed by a casing at the interface section. A circulation line is combined with an air supply and exhaust system, for circulating air in the surrounding space. A dehumidifier is arranged on the circulation line for dehumidifying air in the circulation line to provide localized dehumidification of the surrounding space formed by the casing.

摘要翻译： 一种用于对多个晶片进行涂覆和加热处理的设备，包括用于对晶片进行一次涂覆处理的涂布部分，将经过涂覆处理的晶片全部进行加热处理的加热部分一起进行加热处理;以及 布置在涂覆部分和加热部分之间的界面部分。 在热处理部分中对晶片进行热处理，同时晶片在船上沿垂直方向间隔堆叠。 已经经过涂覆处理的晶片通过接口部分中的传送部件装载到船中。 输送构件和舟皿由在界面部分处由壳体形成的周围空间包围。 循环管线与供气和排气系统结合，用于在周围空间循环空气。 在循环管线上设置除湿器，用于对循环管线中的空气进行除湿，以提供由壳体形成的周围空间的局部除湿。

公开(公告)号：US06787226B2

公开(公告)日：2004-09-07

申请号：US10274914

申请日：2002-10-22

申请人： Yoshirou Niino ,  Hideki Endou ,  Manabu Iizuka ,  Hisayoshi Daicho ,  Hideki Tanaka ,  Yuji Yoshimoto

发明人： Yoshirou Niino ,  Hideki Endou ,  Manabu Iizuka ,  Hisayoshi Daicho ,  Hideki Tanaka ,  Yuji Yoshimoto

IPC分类号： D02D300

CPC分类号： C03C25/28 ,  C03C25/26 ,  C03C25/32 ,  C03C25/326 ,  C08J5/08 ,  C08J2367/06 ,  Y10T428/24994 ,  Y10T428/249948 ,  Y10T428/2904 ,  Y10T428/2907 ,  Y10T428/2933 ,  Y10T428/2938 ,  Y10T428/2962 ,  Y10T428/2964 ,  Y10T428/2971

摘要： Chopped strands having a sizing agent impregnated on glass fiber strands, to be used for a molded product of unsaturated polyester resin BMC, wherein the sizing agent comprises a urethane resin, a vinyl acetate resin and a silane coupling agent, and wherein the mass ratio of the urethane resin to the vinyl acetate resin is from 30:70 to 70:30.

摘要翻译： 用于不饱和聚酯树脂BMC的成型体的用于浸渍在玻璃纤维束上的施胶剂的切断线，其中上浆剂包含聚氨酯树脂，乙酸乙烯酯树脂和硅烷偶联剂，其中， 乙酸乙烯酯树脂的聚氨酯树脂为30:70至70:30。

公开(公告)号：US06472458B2

公开(公告)日：2002-10-29

申请号：US09749652

申请日：2000-12-28

申请人： Yuji Yoshimoto ,  Toshimasa Ikeda ,  Junji Toki

发明人： Yuji Yoshimoto ,  Toshimasa Ikeda ,  Junji Toki

IPC分类号： C08K300

CPC分类号： F21V7/22 ,  B29C45/0001 ,  B29C45/174 ,  B29L2011/0083 ,  F21S41/37 ,  F21S43/33 ,  F21S43/50

摘要： A lamp reflector having a substrate in which desired surface smoothness and rigidity are ensured, while the dimensional accuracy is high. Also, a method of manufacturing such a lamp reflector. In order to ensure surface smoothness, rigidity, and high dimensional accuracy, the lamp reflector is provided with a substrate made of a composition containing at least polyphenylene sulfide resin (PPS resin), synthetic calcium carbonate whiskers, and synthetic calcium carbonate (CaCO3). And the method for manufacturing this lamp reflector includes injection molding using high-pressure gas.

摘要翻译： 具有确保所需表面平滑度和刚性的基板的灯反射器，而尺寸精度高。 另外，制造这种灯反射体的方法。 为了确保表面平滑性，刚性和高尺寸精度，灯反射器设置有由至少含有聚苯硫醚树脂（PPS树脂），合成碳酸钙晶须和合成碳酸钙（CaCO 3）组成的基板。 制造该灯反射体的方法包括使用高压气体的注射成型。

公开(公告)号：US5374312A

公开(公告)日：1994-12-20

申请号：US144492

申请日：1993-11-01

申请人： Keizo Hasebe ,  Kiyohisa Tateyama ,  Yuji Yoshimoto ,  Yuji Matsuyama ,  Tetsuro Nakahara ,  Yoshio Kimura

发明人： Keizo Hasebe ,  Kiyohisa Tateyama ,  Yuji Yoshimoto ,  Yuji Matsuyama ,  Tetsuro Nakahara ,  Yoshio Kimura

IPC分类号： B05C5/00 ,  B05C5/02 ,  B05C11/08 ,  G03F7/16 ,  H01L21/20

CPC分类号： B05C5/001 ,  B05C11/08 ,  B05C5/0208 ,  B05C5/027 ,  G03F7/162 ,  Y10S134/902

摘要： A liquid coating system according to the present invention comprises, a liquid supply source, a nozzle having an inlet communicating with the liquid supply source and a substantially linear liquid discharge portion, a pressure feed unit for feeding the liquid under pressure from the liquid supply source to the nozzle by means of compressed gas, a spin chuck for fixedly supporting a semiconductor wafer, an up-and-down cylinder for causing the liquid discharge portion of the nozzle to closely face the wafer on the spin chuck, and a rotating mechanism for rotating the spin chuck. The nozzle includes a liquid reservoir, in which the liquid supplied from the liquid supply source is collected, and a large number of small passages communicating with the liquid reservoir. The liquid coating system further comprises an air operation valve disposed in a communication passage between the inlet of the nozzle and the liquid supply source and used to reduce the pressure of the liquid fed under pressure to the liquid reservoir.

摘要翻译： 根据本发明的液体涂覆系统包括：液体供应源，具有与液体供应源连通的入口和基本上线性的液体排出部分的喷嘴;压力供给单元，用于在液体供应源 通过压缩气体到喷嘴，用于固定地支撑半导体晶片的旋转卡盘，用于使喷嘴的液体排出部分紧密地面对旋转卡盘上的晶片的上下缸体，以及用于 旋转旋转卡盘。 喷嘴包括从液体供应源供应的液体被收集的液体储存器和与液体储存器连通的大量小通道。 液体涂布系统还包括设置在喷嘴入口和液体供应源之间的连通通道中的空气操作阀，用于将在压力下供给的液体的压力降低到液体储存器。

公开(公告)号：US08669718B2

公开(公告)日：2014-03-11

申请号：US13541044

申请日：2012-07-03

申请人： Masafumi Yamamoto ,  Katunobu Hamamoto ,  Hiroyuki Asano ,  Hisaya Takikita ,  Hiroyuki Nakagawa ,  Yuji Yoshimoto

发明人： Masafumi Yamamoto ,  Katunobu Hamamoto ,  Hiroyuki Asano ,  Hisaya Takikita ,  Hiroyuki Nakagawa ,  Yuji Yoshimoto

IPC分类号： H05B37/02

CPC分类号： H05B33/0842 ,  H05B33/0815

摘要： An LED lighting device includes: a power source unit for supplying the DC output voltage to a light-emitting diode; a control unit for adjusting the DC output voltage; and a control power source unit for supplying a control power to the control unit. The control power source unit generates the control power with the DC output voltage and has: a current-limiting resistor for limiting an electric current that flows from the power source unit to the control unit; a constant voltage unit for converting a voltage to be applied to the control unit through the current-limiting resistor unit to a constant voltage; and a switching unit for switching a resistance value of the current-limiting resistor unit among a plurality of resistance values.

摘要翻译： 一种LED照明装置，包括：电源单元，用于将DC输出电压提供给发光二极管; 用于调整DC输出电压的控制单元; 以及用于向控制单元提供控制电力的控制电源单元。 所述控制电源单元利用所述直流输出电压生成所述控制电力，并具有限制从所述电源单元流向所述控制单元的电流的限流电阻; 用于将通过限流电阻器单元施加到控制单元的电压转换为恒定电压的恒压单元; 以及切换单元，用于在多个电阻值之间切换限流电阻器单元的电阻值。

公开(公告)号：US06990380B2

公开(公告)日：2006-01-24

申请号：US10023898

申请日：2001-12-21

申请人： Yuji Yoshimoto ,  Ryouichi Uemura ,  Kunie Ogata ,  Yoichi Deguchi

发明人： Yuji Yoshimoto ,  Ryouichi Uemura ,  Kunie Ogata ,  Yoichi Deguchi

IPC分类号： G05B11/01

CPC分类号： H01L21/67276 ,  G05B23/0264 ,  G05B2219/45031

摘要： An object of the present invention is to grasp easily a process history of a target object such as a semiconductor wafer. The processing apparatus of the present invention includes: a processing apparatus body which includes a plurality of process units for executing a prescribed process to a target object, and transport mechanism for transporting said target object between the process units; a first controller for controlling the processing apparatus as a whole; a second controller for controlling the process units; an information storage section for taking in a signal transmitted and received between the first and second controllers; and a host computer for monitoring operation states of the process units. The present invention is extended to a processing system including a plurality of the processing apparatuses connected with a host computer which is further connected with a monitor computer through a communication network.

公开(公告)号：US07031792B2

公开(公告)日：2006-04-18

申请号：US10114248

申请日：2002-04-03

申请人： Yuji Yoshimoto ,  Ryouichi Uemura ,  Kunie Ogata ,  Yoichi Deguchi

发明人： Yuji Yoshimoto ,  Ryouichi Uemura ,  Kunie Ogata ,  Yoichi Deguchi

IPC分类号： G06F19/00 ,  H01L21/30

CPC分类号： G11C29/006

摘要： A processing apparatus comprises a process apparatus body equipped with a plurality of process sections for applying a predetermined processing to a target object and a transfer device for transferring the target object among the process sections, a first control section for controlling the entire process apparatus body including the transfer device, a second control section for controlling the plural process sections, an information storage section receiving the signal exchanged between the first control section and the second control section and storing a plurality of information including the information corresponding to the received signal, and an information storage selecting mechanism for selecting the storing frequency of the information to the information storage section in accordance with the kind of the information.

公开(公告)号：US5985465A

公开(公告)日：1999-11-16

申请号：US681478

申请日：1996-07-23

申请人： Hisayoshi Daichou ,  Yuji Yoshimoto

发明人： Hisayoshi Daichou ,  Yuji Yoshimoto

IPC分类号： C08K3/40 ,  C08L31/04 ,  C08L33/04 ,  C08L33/12 ,  C08L67/00 ,  C08L67/02 ,  C08L67/06 ,  F21V7/22 ,  G02B5/08 ,  G03B21/28 ,  B32B15/08 ,  B32B15/14 ,  C04B14/42

CPC分类号： F21S48/1394 ,  C08L67/06 ,  F21V7/22 ,  Y10T428/31681 ,  Y10T428/31692

摘要： A molding composition for a lamp reflector is disclosed, which comprises an unsaturated polyester resin, glass fiber, inorganic filler and a thermoplastic resin in an amount effective for preventing shrinkage of the molding composition during curing of the composition to form the lamp reflector; and a process for producing the lamp reflector and a lamp reflector produced by molding the molding composition are also disclosed.

摘要翻译： 公开了一种用于灯反射器的模制组合物，其包含不饱和聚酯树脂，玻璃纤维，无机填料和热塑性树脂，其量可有效地防止组合物在固化期间收缩而形成灯反射器; 还公开了通过模塑成型组合物制造灯反射器和灯反射器的方法。