公开(公告)号：US20050270312A1

公开(公告)日：2005-12-08

申请号：US11143092

申请日：2005-06-02

申请人： Pankaj Lad ,  Ian McMackin ,  Van Truskett ,  Norman Schumaker ,  Sidlgata Sreenivasan ,  Duane Voth ,  Philip Schumaker ,  Edward Fletcher

发明人： Pankaj Lad ,  Ian McMackin ,  Van Truskett ,  Norman Schumaker ,  Sidlgata Sreenivasan ,  Duane Voth ,  Philip Schumaker ,  Edward Fletcher

IPC分类号： B41J2/01 ,  B41J3/28 ,  B41J3/407 ,  G03F7/00 ,  H01L51/40

CPC分类号： B82Y10/00 ,  B41J3/28 ,  B82Y40/00 ,  G03F7/0002 ,  H01L51/0004

摘要： The present invention is directed to a method for dispensing a total volume of liquid on a substrate, the method including, inter alia, disposing a plurality of spaced-apart droplets on a region of the substrate, each having an unit volume associated therewith, with an aggregate volume of the droplets in the region being a function of a volume of a pattern to be formed thereat.

摘要翻译： 本发明涉及一种用于在基底上分配总体积的液体的方法，该方法尤其包括在衬底区域上设置多个间隔开的液滴，每个液滴具有与之相关联的单位体积，与 该区域中的液滴的总体积是要在其上形成的图案的体积的函数。

公开(公告)号：US20070228608A1

公开(公告)日：2007-10-04

申请号：US11694193

申请日：2007-03-30

申请人： Steven Shackleton ,  Pankaj Lad ,  Ian McMackin ,  Frank Xu ,  Sidlgata Sreenivasan

发明人： Steven Shackleton ,  Pankaj Lad ,  Ian McMackin ,  Frank Xu ,  Sidlgata Sreenivasan

IPC分类号： B29C35/08 ,  B29C43/02

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C43/021 ,  B29C43/34 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3438 ,  B29K2105/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.

摘要翻译： 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。

公开(公告)号：US20070114686A1

公开(公告)日：2007-05-24

申请号：US11565393

申请日：2006-11-30

申请人： Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Ian McMackin ,  Pankaj Lad

发明人： Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Ian McMackin ,  Pankaj Lad

IPC分类号： B29D11/00

CPC分类号： G03F7/70875 ,  B29C33/20 ,  B29C43/003 ,  B29C43/021 ,  B29C43/36 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/3233 ,  B29C2043/3488 ,  B29C2043/5841 ,  B29D11/00365 ,  G03B27/62 ,  G03F7/707

摘要： The present invention is directed towards a method and a system of expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.

摘要翻译： 本发明涉及排出位于基底和模具之间的气体的方法和系统，所述基底和模具进一步具有位于其间的液体。

公开(公告)号：US20060172549A1

公开(公告)日：2006-08-03

申请号：US11108208

申请日：2005-04-18

申请人： Byung-Jin Choi ,  Anshuman Cherala ,  Yeong-jun Choi ,  Mario Meissl ,  Sidlgata Sreenivasan ,  Norman Schumaker ,  Xiaoming Lu ,  Ian McMackin ,  Daniel Babbs

发明人： Byung-Jin Choi ,  Anshuman Cherala ,  Yeong-jun Choi ,  Mario Meissl ,  Sidlgata Sreenivasan ,  Norman Schumaker ,  Xiaoming Lu ,  Ian McMackin ,  Daniel Babbs

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/6875 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6838 ,  Y10S977/887

摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.

公开(公告)号：US20070247608A1

公开(公告)日：2007-10-25

申请号：US11694612

申请日：2007-03-30

申请人： Sidlgata Sreenivasan ,  Philip Schumaker ,  Ian McMackin

发明人： Sidlgata Sreenivasan ,  Philip Schumaker ,  Ian McMackin

IPC分类号： G03B27/62

CPC分类号： G03B27/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/42 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7076 ,  G03F9/7084

摘要： The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.

摘要翻译： 本发明涉及用于0级（通过压印或光刻或电子束等图案化）和1级（通过印记图案化）的图案化场的形状的选择，使得这些形状在细分时一起消除开路 地区由护城河引起。

公开(公告)号：US20050185169A1

公开(公告)日：2005-08-25

申请号：US10782187

申请日：2004-02-19

申请人： Ian McMackin ,  Philip Schumaker ,  Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Michael Watts

发明人： Ian McMackin ,  Philip Schumaker ,  Byung-Jin Choi ,  Sidlgata Sreenivasan ,  Michael Watts

IPC分类号： B81C1/00 ,  B81C99/00 ,  G01N21/84 ,  G03F7/00 ,  G03F7/20 ,  G01N21/88

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B81C1/0046 ,  B81C99/004 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/8422 ,  G03F7/70625 ,  G03F7/7065

摘要： The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.

摘要翻译： 本发明旨在提供一种测量设置在基底上的膜的特性的方法和系统。 该方法包括识别胶片上的多个处理区域; 测量所述多个处理区域的子集的特征，定义测量的特征; 确定测量特征之一的变化; 并且基于所测量的特征之一与与所述子集的剩余处理区域相关联的测量特征的比较来将所述变化的原因相关联。 系统执行上述方法。

公开(公告)号：US20060076717A1

公开(公告)日：2006-04-13

申请号：US11127041

申请日：2005-05-11

申请人： Sidlgata Sreenivasan ,  Byung Choi ,  Norman Schumaker ,  Ronald Voisin ,  Michael Watts ,  Mario Meissl

发明人： Sidlgata Sreenivasan ,  Byung Choi ,  Norman Schumaker ,  Ronald Voisin ,  Michael Watts ,  Mario Meissl

IPC分类号： B29C35/08 ,  B29C41/02 ,  B29C41/12

CPC分类号： B81C1/0046 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002

摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

公开(公告)号：US20060176466A1

公开(公告)日：2006-08-10

申请号：US11389731

申请日：2006-03-27

申请人： Byung Choi ,  Ronald Voisin ,  Sidlgata Sreenivasan ,  Michael Watts ,  Daniel Babbs ,  Mario Meissl ,  Hillman Bailey ,  Norman Schumaker

发明人： Byung Choi ,  Ronald Voisin ,  Sidlgata Sreenivasan ,  Michael Watts ,  Daniel Babbs ,  Mario Meissl ,  Hillman Bailey ,  Norman Schumaker

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  B29C33/20 ,  B29C43/003 ,  B29C43/021 ,  B29C43/36 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/3233 ,  B29C2043/3488 ,  B29C2043/5841 ,  B29D11/00365 ,  G03B27/62 ,  G03F7/707

摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

公开(公告)号：US20060077374A1

公开(公告)日：2006-04-13

申请号：US11127060

申请日：2005-05-11

申请人： Sidlgata Sreenivasan ,  Michael Watts ,  Byung Choi ,  Mario Meissl ,  Norman Schumaker ,  Ronald Voisin

发明人： Sidlgata Sreenivasan ,  Michael Watts ,  Byung Choi ,  Mario Meissl ,  Norman Schumaker ,  Ronald Voisin

IPC分类号： G03B27/58

CPC分类号： B82Y10/00 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B81C1/0046 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0271

摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.

摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。

公开(公告)号：US20070026542A1

公开(公告)日：2007-02-01

申请号：US11470829

申请日：2006-09-07

申请人： Sidlgata Sreenivasan ,  Ian McMackin ,  Byung-Jin Choi ,  Ronald Voisin

发明人： Sidlgata Sreenivasan ,  Ian McMackin ,  Byung-Jin Choi ,  Ronald Voisin

IPC分类号： H01L21/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3417 ,  C03C2217/77 ,  C03C2218/31 ,  C03C2218/328

摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.

摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 期望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。