公开(公告)号：US5811823A

公开(公告)日：1998-09-22

申请号：US757726

申请日：1996-11-26

申请人： Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

发明人： Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

IPC分类号： H01J37/04 ,  C23C14/48 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/265 ,  H01L21/677 ,  H01L21/683

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion source, an electrode assembly, a platform mounting a workpiece, and a ion beam measuring structure. The ion source in conjunction with the electrode assembly forms an ion beam in the shape of a ribbon beam. The ion beam is formed and directed such that a first portion of the ion beam treats the workpiece while a second portion of the ion beam is contemporaneously measured by the beam measuring structure. A controller obtains data from the beam measuring structure on the ion beam's parameters, and then generates control signals to the ion implantation system in response to the data.

摘要翻译： 快速有效地处理大量平板显示器的高通量离子注入系统。 离子注入系统具有离子源，电极组件，安装工件的平台和离子束测量结构。 与电极组件结合的离子源形成带状束形状的离子束。 离子束的形成和定向使得离子束的第一部分处理工件，而离子束的第二部分由束测量结构同时测量。 控制器从离子束参数获取束测量结构的数据，然后根据数据产生离子注入系统的控制信号。

公开(公告)号：US06203406B1

公开(公告)日：2001-03-20

申请号：US09309931

申请日：1999-05-11

申请人： Peter H. Rose ,  Piero Sferlazzo ,  Robert G. van der Heide

发明人： Peter H. Rose ,  Piero Sferlazzo ,  Robert G. van der Heide

IPC分类号： B24B100

CPC分类号： B24C3/22 ,  B08B7/0092 ,  B24C1/003 ,  H05K3/26

摘要： A scheme for removing foreign material from the surface of a substrate by directing a high velocity aerosol of at least partially frozen particles against the foreign material to be removed. Different schemes are described for accelerating the frozen particles to very high velocities sufficient for particle removal, removal of organic layers (e.g., hard baked photoresist or ion implanted photoresist) and removal of metallic layers. In one embodiment, liquid droplets are entrained in a high velocity gas flow and the resulting gas/liquid mixture is passed through an expansion nozzle to produce a high velocity aerosol of frozen particles. In another embodiment, frozen aerosol particles are entrained in, e.g., a sonic or supersonic gas jet before impacting a surface to be cleaned. The cleaning aerosols may be applied to substrates inside a vacuum chamber or directly from a hand-held device. Also, various scanning systems are described for achieving substantially uniform exposure of the substrate to the cleaning aerosol.

摘要翻译： 通过将至少部分冻结的颗粒的高速气溶胶引导到待除去的异物上来从基材的表面除去异物的方案。 描述了用于将冷冻颗粒加速至非常高的速度以用于颗粒去除，去除有机层（例如硬烘烤的光致抗蚀剂或离子注入的光致抗蚀剂）和去除金属层的不同方案。 在一个实施例中，液滴被夹带在高速气流中，并且使得到的气体/液体混合物通过膨胀喷嘴以产生冷冻颗粒的高速气溶胶。 在另一个实施方案中，在冲击待清洁表面之前，将冷冻的气溶胶颗粒夹带在例​​如声波或超音速气体射流中。 清洁气溶胶可以施加到真空室内的基底或直接从手持装置施加。 此外，描述了各种扫描系统，以实现基板对清洁气溶胶的基本上均匀的曝光。

公开(公告)号：US5967156A

公开(公告)日：1999-10-19

申请号：US335327

申请日：1994-11-07

申请人： Peter H. Rose ,  Piero Sferlazzo

发明人： Peter H. Rose ,  Piero Sferlazzo

IPC分类号： H01L21/304 ,  B08B7/00 ,  B82B1/00 ,  H01L21/00 ,  H01L21/306 ,  H05K3/26

CPC分类号： H01L21/02043 ,  B08B7/0092 ,  H01L21/67051 ,  H05K3/26

摘要： In one aspect, foreign material on the surface of a substrate is processed to form a reaction product by: providing a directed flow of a fluid, comprising a reactant, to the vicinity of the foreign material to be processed; and delivering an aerosol of at least partially frozen particles continuously or intermittently to the foreign material to aid the reactant react with the foreign material to form the reaction product. In another aspect, foreign material is processed by: providing a directed flow of a fluid, comprising a reactant, to the foreign material to be processed in a limited area reaction region corresponding to a minor fraction of the total area of the substrate; agitating the foreign material in the limited area reaction region to aid the reactant react with the foreign material to form the reaction product; and providing relative motion between the substrate and the directed flow of fluid to achieve a substantially uniform exposure of the foreign material to fluid flow and the agitation. Infrared or ultraviolet radiation may also be delivered to the foreign material. Specific methods for processing oxide layers, organic layers and metal contamination are also described.

摘要翻译： 在一个方面，通过以下方式处理衬底表面上的异物：通过以下方式处理反应产物：将包含反应物的流体的定向流提供到待处理的异物附近; 并且将至少部分冷冻的颗粒的气溶胶连续地或间歇地递送到异物以帮助反应物与异物反应以形成反应产物。 在另一方面，异物通过以下方式加工：在对应于基底的总面积的较小部分的有限区域反应区域内，向包含反应物的流体提供定向流动的待处理异物; 搅拌有限区域反应区域中的异物以帮助反应物与异物反应形成反应产物; 并且提供衬底和流体的有向流之间的相对运动，以实现外来材料基本均匀地暴露于流体流动和搅动。 红外线或紫外线辐射也可能被输送到异物。 还描述了用于加工氧化物层，有机层和金属污染物的具体方法。

公开(公告)号：US5931721A

公开(公告)日：1999-08-03

申请号：US335329

申请日：1994-11-07

申请人： Peter H. Rose ,  Piero Sferlazzo ,  Robert G. van der Heide

发明人： Peter H. Rose ,  Piero Sferlazzo ,  Robert G. van der Heide

IPC分类号： H01L21/304 ,  B08B7/00 ,  B24C1/00 ,  B24C3/22 ,  B82B1/00 ,  H05K3/26 ,  B24C7/00

CPC分类号： B24C3/22 ,  B08B7/0092 ,  B24C1/003 ,  H05K3/26

摘要： A scheme for removing foreign material from the surface of a substrate by directing a high velocity aerosol of at least partially frozen particles against the foreign material to be removed. Different schemes are described for accelerating the frozen particles to very high velocities sufficient for particle removal, removal of organic layers (e.g., hard baked photoresist or ion implanted photoresist) and removal of metallic layers. In one embodiment, liquid droplets are entrained in a high velocity gas flow and the resulting gas/liquid mixture is passed through an expansion nozzle to produce a high velocity aerosol of frozen particles. In another embodiment, frozen aerosol particles are entrained in, e.g., a sonic or supersonic gas jet before impacting a surface to be cleaned. The cleaning aerosols may be applied to substrates inside a vacuum chamber or directly from a hand-held device. Also, various scanning systems are described for achieving substantially uniform exposure of the substrate to the cleaning aerosol.

摘要翻译： 通过将至少部分冻结的颗粒的高速气溶胶引导到待除去的异物上来从基材的表面除去异物的方案。 描述了用于将冷冻颗粒加速至非常高的速度以用于颗粒去除，去除有机层（例如硬烘烤的光致抗蚀剂或离子注入的光致抗蚀剂）和去除金属层的不同方案。 在一个实施例中，液滴被夹带在高速气流中，并且使得到的气体/液体混合物通过膨胀喷嘴以产生冷冻颗粒的高速气溶胶。 在另一个实施方案中，在冲击待清洁表面之前，将冷冻的气溶胶颗粒夹带在例​​如声波或超音速气体射流中。 清洁气溶胶可以施加到真空室内的基底或直接从手持装置施加。 此外，描述了各种扫描系统，以实现基板对清洁气溶胶的基本上均匀的曝光。

公开(公告)号：US5523652A

公开(公告)日：1996-06-04

申请号：US312142

申请日：1994-09-26

申请人： Piero Sferlazzo ,  Peter H. Rose ,  Frank R. Trueira

发明人： Piero Sferlazzo ,  Peter H. Rose ,  Frank R. Trueira

IPC分类号： C23C14/48 ,  H01J27/18 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265 ,  H01J7/24

CPC分类号： H01J27/18 ,  H01J2237/0817 ,  H01J2237/31701

摘要： A microwave energized ion source apparatus is supported by a support tube extending into a cavity defined by a housing assembly and includes a dielectric plasma chamber, a pair of vaporizers, a microwave tuning and transmission assembly and a magnetic field generating assembly. The chamber defines an interior region into which source material and ionizable gas are routed. The chamber is overlied by a cap having an arc slit through which generated ions exit the chamber. The microwave tuning and transmission assembly, which feeds microwave energy to the chamber in the TEM mode, includes a coaxial microwave energy transmission line center conductor. One end of the conductor fits into a recessed portion of the chamber and transmits microwave energy to the chamber. The center conductor extends through an evacuated portion of a coaxial tube surrounding the conductor. A vacuum seal is disposed in or adjacent the coaxial tube and from the boundary between the evacuated coaxial tube and a non-evacuated region. The arc slit cap is secured to a chamber housing surrounding the chamber and is adapted to interfit with a clamping assembly secured to an end of the support tube such that the arc slit is aligned with a predetermined ion beam line. The energy transmission center conductor is coupled to a tuning center conductor which is slideably overlied by a pair of slug tuners. Moving the slug tuners along their paths of travel changes an impedance of the microwave energy input to the chamber.

摘要翻译： 微波激励的离子源设备由延伸到由壳体组件限定的空腔中的支撑管支撑，并且包括介电等离子体室，一对蒸发器，微波调谐和传输组件以及磁场产生组件。 腔室限定了源材料和可电离气体被路由到的内部区域。 该室被具有弧形狭缝的帽覆盖，通过该狭缝产生离子离开室。 微波调谐传输组件，其以TEM模式将微波能量馈送到室，包括同轴微波能量传输线中心导体。 导体的一端装配到腔室的凹陷部分，并将微波能量传递到腔室。 中心导体延伸穿过围绕导体的同轴管的抽真空部分。 真空密封件设置在同轴管中或邻近于同轴管和从抽真空的同轴管和非抽空区域之间的边界。 弧形狭缝盖被固定到围绕室的腔室壳体，并且适于与固定到支撑管的端部的夹紧组件相配合，使得弧形狭缝与预定的离子束线对准。 能量传输中心导体耦合到调谐中心导体，该调谐中心导体可滑动地覆盖一对子弹调谐器。 沿着其行进路径移动塞子调谐器改变输入到腔室的微波能量的阻抗。

公开(公告)号：US4580058A

公开(公告)日：1986-04-01

申请号：US594756

申请日：1984-03-29

申请人： Eric L. Mears ,  Peter H. Rose

发明人： Eric L. Mears ,  Peter H. Rose

IPC分类号： H01J37/317 ,  G21K1/08

CPC分类号： H01J37/3171

摘要： Scanning, as of ion beams, in which two radially aligned devices, e.g. ion source and extraction electrode, are isolated from and accurately positioned with respect to one another, while the second device moves arcuately to produce a scanning effect. Advantageously, while one device, e.g. the ion source, is moved by a rotating shaft, the second device, e.g., the extraction electrode, moves on a curved track centered on the axis of the shaft. While the devices are disposed within respective parts of a vacuum chamber, a mechanical synchronizing mechanism, located outside of the chamber, moves the devices via seals. The specific mechanism shown comprises a driven lead screw, an insulating crank for driving a shaft on which an ion source is mounted, and an arcuate motion tracking device which transmits the motion of the insulating crank into the chamber for driving the extraction electrode upon a curved track.

摘要翻译： 像离子束一样扫描，其中两个径向排列的装置，例如， 离子源和引出电极相对于彼此隔离并且被精确定位，而第二装置弧形移动以产生扫描效果。 有利地，虽然一个装置，例如 离子源通过旋转轴移动，第二装置（例如，提取电极）在以轴的轴线为中心的弯曲轨道上移动。 当装置设置在真空室的相应部分内时，位于室外的机械同步机构通过密封件移动装置。 所示的具体机构包括从动导螺杆，用于驱动其上安装有离子源的轴的绝缘曲柄，以及弓形运动跟踪装置，其将绝缘曲柄的运动传递到用于驱动提取电极的腔室中的弯曲 跟踪。

公开(公告)号：US5729028A

公开(公告)日：1998-03-17

申请号：US789629

申请日：1997-01-27

申请人： Peter H. Rose

发明人： Peter H. Rose

IPC分类号： G21K5/04 ,  C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H05H5/03 ,  H05H5/06 ,  H01J23/10

CPC分类号： H05H5/06

摘要： An ion accelerator for use in an ion beam implanter. The accelerator forms milliampere beams of heavy ions such as boron and phosphorous in a configuration in which the terminal ion source is replaced by a neutral beam injector. The neutral beam is formed at ground by the conversion of a focused beam of positive ions to neutral ions in a charge exchange canal. The neutral beam so formed is stripped of one or more electrons in a gas or vapor filled canal in the high voltage terminal. A 180.degree. analyzing magnet located in the high voltage terminal analyzes and directs a selected charge state to an acceleration tube parallel to the neutral beam injection tube where the selected positive ions are accelerated to ground potential. To extend the energy range of the accelerator below the injection energy, a high voltage insulator is provided to insulate the ground end of the positive ion acceleration tube permitting the acceleration tube and terminal to be uniformly biased at a negative voltage to decelerate the beam to very low energies at a location close to the point of use. An accelerator assembly includes a 90.degree. analyzing magnet in the high voltage terminal.

摘要翻译： 用于离子束注入机的离子加速器。 在末端离子源被中性射束注射器代替的结构中，加速器形成毫安的重离子束如硼和磷。 通过在电荷交换管中将聚合的正离子束转变成中性离子，中性束在地面形成。 如此形成的中性光束在高压端子中的气体或蒸气填充的管中被剥离出一个或多个电子。 位于高压端子的180°分析磁体分析并将选定的充电状态引导到平行于中性束注入管的加速管，其中所选择的正离子被加速到地电位。 为了将加速器的能量范围扩大到注入能量以下，提供高压绝缘体以使正离子加速管的接地端绝缘，允许加速管和端子被均匀地偏压在负电压以将梁减速到非常 在靠近使用点的位置处的低能量。 加速器组件包括在高压端子中的90°分析磁体。

公开(公告)号：US4804852A

公开(公告)日：1989-02-14

申请号：US32513

申请日：1987-03-30

申请人： Peter H. Rose ,  Marvin Farley ,  Lee Grodzins

发明人： Peter H. Rose ,  Marvin Farley ,  Lee Grodzins

IPC分类号： H01J37/317 ,  G21K5/02

CPC分类号： H01J37/3172

摘要： A magnetic scanning technique for sweeping an ion beam across an implantation target, such as a semiconductor wafer, by means of modulating the energy of a beam and directing it through an analyzer magnet, which effects a scanning motion of the beam of constant intensity, the wave form for the modulation being selected to take into account that the areal density of the ions in the scanned beam varies dependently with the amount of displacement of the beam from a reference point. An ion scan can be obtained in which the ions travel in parallel paths and enter the target at a constant desired angle throughout the scan. The technique is applicable to targets held stationary or rotated during implant. By employing predetermined modulation wave forms which are adapted to other parameters of the selected system, a desired scan distribution of ions can be obtained, for instance a uniform distribution in X and Y directions. As applied to a semiconductor wafer rotated on a disc past the ion beam, the technique solves the problem of compensating for the fact that the area of a ring on the spinning disc depends linearly on the radius of the ring. The technique makes use of the properties of ion beams in uniform magnetic fields to produce a radial dependence of the density of the ion beam on the wafer which precisely cancels the radial dependence of circumferential length as a function of radius. The magnetic scanning technique is well adapted for use with large wafers held on rotating discs and has advantages over the conventional techniques of either electrostatic or mechanical scanning. The technique is readily adapted to a variety of other wafer transport systems including rotating conveyors and linear transports.

摘要翻译： 一种磁扫描技术，用于通过调制光束的能量并引导其通过分析器磁体来影响离子束穿过诸如半导体晶片的注入靶，其实现恒定强度的束的扫描运动， 波形被选择以考虑扫描光束中的离子的面密度随着光束从参考点的位移量而变化。 可以获得离子扫描，其中离子在平行路径中行进并且在整个扫描期间以恒定的期望角度进入目标。 该技术适用于在植入期间保持静止或旋转的目标。 通过采用适合于所选系统的其它参数的预定调制波形，可以获得所需的离子扫描分布，例如在X和Y方向上的均匀分布。 当应用于在盘上经过离子束旋转的半导体晶片时，该技术解决了补偿旋转盘上的环的面积与环的半径成线性关系的问题。 该技术利用均匀磁场中的离子束的性质来产生离子束在晶片上的密度的径向依赖性，其精确地抵消作为半径的函数的圆周长度的径向依赖性。 磁扫描技术非常适合用于保持在旋转盘上的大晶片，并且具有优于静电或机械扫描的常规技术的优点。 该技术易于适用于各种其他晶片输送系统，包括旋转输送机和线性输送机。

公开(公告)号：US5828070A

公开(公告)日：1998-10-27

申请号：US756972

申请日：1996-11-26

申请人： Adam A. Brailove ,  Peter H. Rose ,  Julian G. Blake ,  Zhongmin Yang ,  Kenneth H. Purser

发明人： Adam A. Brailove ,  Peter H. Rose ,  Julian G. Blake ,  Zhongmin Yang ,  Kenneth H. Purser

IPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683 ,  G01N21/00 ,  G21K5/10

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a loadlock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

摘要翻译： 一种用于导电地和/或对流地将热量从已经由处理系统例如离子注入系统处理的工件传送的系统和方法。 通过将工件放置在相对靠近装载锁的地板并保持在相对较冷的温度下，来实现来自工件的导热传递。 腔室压力通过压力调节器设置在选定的压力下，并且真空压力施加到最接近工件的工件的背面，以使工件与室底板接触，从而实现从工件到冷却表面的热传递。

公开(公告)号：US5825038A

公开(公告)日：1998-10-20

申请号：US756656

申请日：1996-11-26

申请人： Julian G. Blake ,  Kenneth H. Purser ,  Adam A. Brailove ,  Peter H. Rose ,  Barbara J. Hughey

发明人： Julian G. Blake ,  Kenneth H. Purser ,  Adam A. Brailove ,  Peter H. Rose ,  Barbara J. Hughey

IPC分类号： H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/3007 ,  H01J2237/083

摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.

摘要翻译： 快速有效地处理大量平板显示器的高通量离子注入系统。 离子注入系统具有产生离子流的离子室，具有用于将离子流成形为带状束的高纵横比的细长槽的等离子体电极，以及用于将离子流引向工件的电极组件 。 等离子体电极可以包括具有基本上彼此平行取向的多个细长狭缝的分离提取系统。 离子注入系统还可以具有用于使离子流均匀化的扩散系统。 各种示例性扩散系统包括具有开口阵列，扩散磁体，扩散电极和抖动磁体的有孔板。