公开(公告)号：US5825038A

公开(公告)日：1998-10-20

申请号：US756656

申请日：1996-11-26

申请人： Julian G. Blake ,  Kenneth H. Purser ,  Adam A. Brailove ,  Peter H. Rose ,  Barbara J. Hughey

发明人： Julian G. Blake ,  Kenneth H. Purser ,  Adam A. Brailove ,  Peter H. Rose ,  Barbara J. Hughey

IPC分类号： H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/3007 ,  H01J2237/083

摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.

摘要翻译： 快速有效地处理大量平板显示器的高通量离子注入系统。 离子注入系统具有产生离子流的离子室，具有用于将离子流成形为带状束的高纵横比的细长槽的等离子体电极，以及用于将离子流引向工件的电极组件 。 等离子体电极可以包括具有基本上彼此平行取向的多个细长狭缝的分离提取系统。 离子注入系统还可以具有用于使离子流均匀化的扩散系统。 各种示例性扩散系统包括具有开口阵列，扩散磁体，扩散电极和抖动磁体的有孔板。

公开(公告)号：US5793050A

公开(公告)日：1998-08-11

申请号：US756133

申请日：1996-11-26

申请人： Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

发明人： Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

IPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

公开(公告)号：US6025602A

公开(公告)日：2000-02-15

申请号：US66180

申请日：1998-04-23

申请人： Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

发明人： Peter H. Rose ,  Julian G. Blake ,  Adam A. Brailove ,  Zhongmin Yang ,  Richard F. McRay ,  Barbara J. Hughey

IPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683 ,  H01J37/20

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

摘要翻译： 一种快速有效地处理大量工件的离子注入系统，如平板显示器。 离子注入系统包括安装离子源的高真空处理室，单个工件平移台和负载锁。 安装在处理室内的单个工件处理组件都将工件从装载锁上移除，并通过由离子源产生的离子束在植入期间支撑工件。 处理室与负载锁组件选择性地流体连通，负载锁组件又与工件加载或终端机械地集成。 另外，工件处理组件包括用于在植入期间沿线性扫描方向平移工件的平移台或元件。 该线性扫描方向沿着与植入系统的水平纵向轴线横向或正交的路径延伸。 根据一个实践，扫描方向和纵向轴线之间形成小于或等于约85度的角度。

公开(公告)号：US5828070A

公开(公告)日：1998-10-27

申请号：US756972

申请日：1996-11-26

申请人： Adam A. Brailove ,  Peter H. Rose ,  Julian G. Blake ,  Zhongmin Yang ,  Kenneth H. Purser

发明人： Adam A. Brailove ,  Peter H. Rose ,  Julian G. Blake ,  Zhongmin Yang ,  Kenneth H. Purser

IPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683 ,  G01N21/00 ,  G21K5/10

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a loadlock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

摘要翻译： 一种用于导电地和/或对流地将热量从已经由处理系统例如离子注入系统处理的工件传送的系统和方法。 通过将工件放置在相对靠近装载锁的地板并保持在相对较冷的温度下，来实现来自工件的导热传递。 腔室压力通过压力调节器设置在选定的压力下，并且真空压力施加到最接近工件的工件的背面，以使工件与室底板接触，从而实现从工件到冷却表面的热传递。

公开(公告)号：US5811823A

公开(公告)日：1998-09-22

申请号：US757726

申请日：1996-11-26

申请人： Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

发明人： Julian G. Blake ,  Piero Sferlazzo ,  Peter H. Rose ,  Adam A. Brailove

IPC分类号： H01J37/04 ,  C23C14/48 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/265 ,  H01L21/677 ,  H01L21/683

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion source, an electrode assembly, a platform mounting a workpiece, and a ion beam measuring structure. The ion source in conjunction with the electrode assembly forms an ion beam in the shape of a ribbon beam. The ion beam is formed and directed such that a first portion of the ion beam treats the workpiece while a second portion of the ion beam is contemporaneously measured by the beam measuring structure. A controller obtains data from the beam measuring structure on the ion beam's parameters, and then generates control signals to the ion implantation system in response to the data.

摘要翻译： 快速有效地处理大量平板显示器的高通量离子注入系统。 离子注入系统具有离子源，电极组件，安装工件的平台和离子束测量结构。 与电极组件结合的离子源形成带状束形状的离子束。 离子束的形成和定向使得离子束的第一部分处理工件，而离子束的第二部分由束测量结构同时测量。 控制器从离子束参数获取束测量结构的数据，然后根据数据产生离子注入系统的控制信号。

公开(公告)号：US5760405A

公开(公告)日：1998-06-02

申请号：US756970

申请日：1996-11-26

申请人： Michael C. King ,  Julian G. Blake ,  Peter H. Rose

发明人： Michael C. King ,  Julian G. Blake ,  Peter H. Rose

IPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317 ,  H01L21/00 ,  H01L21/677 ,  H01L21/683 ,  H01J27/20

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705

摘要： An ion source for generating an ion beam of primary ions is disclosed that includes a plasma chamber and magnets positioned therein for separating the primary ions of the plasma from secondary ions within the plasma. An electrode assembly extracts the primary ions through an extractor outlet port of the plasma chamber to form an ion beam, which preferentially is shaped as a ribbon beam. The primary ions are accelerated in the form of a ribbon beam toward the target workpiece for doping the device. The magnets are oriented in the chamber to produce a uniform current density of primary ions parallel to the elongated axis of the ribbon beam.

摘要翻译： 公开了用于产生一次离子的离子束的离子源，其包括等离子体室和位于其中的磁体，用于将等离子体的主离子与等离子体内的次离子分离。 电极组件通过等离子体室的提取器出口提取初级离子以形成优选成形为带状束的离子束。 初级离子以带状束的形式加速到目标工件以掺杂该器件。 磁体在腔室中定向以产生平行于带状束的细长轴线的初级离子的均匀电流密度。

公开(公告)号：US09093104B2

公开(公告)日：2015-07-28

申请号：US13342762

申请日：2012-01-03

申请人： Frank Sinclair ,  Julian G. Blake ,  Helen L. Maynard ,  Alexander C. Kontos

发明人： Frank Sinclair ,  Julian G. Blake ,  Helen L. Maynard ,  Alexander C. Kontos

IPC分类号： B44C1/22 ,  G11B5/855

CPC分类号： G11B5/855

摘要： A novel technique for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on a second portion of the catalysis layer adjacent to the first portion of the catalysis layer.

摘要翻译： 公开了一种用于制造位图案化介质的新型技术。 在一个特定的示例性实施例中，该技术可以被实现为用于制造钻头图案介质的方法。 该技术可以被实现为一种方法，包括：在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。

公开(公告)号：US08466039B2

公开(公告)日：2013-06-18

申请号：US13399637

申请日：2012-02-17

申请人： Deepak A. Ramappa ,  Julian G. Blake

发明人： Deepak A. Ramappa ,  Julian G. Blake

IPC分类号： H01L21/30

CPC分类号： H01L21/76254 ,  Y10S438/977

摘要： A method of cleaving a substrate is disclosed. A species, such as hydrogen or helium, is implanted into a substrate to form a layer of microbubbles. The substrate is then annealed a pressure greater than atmosphere. This annealing may be performed in the presence of the species that was implanted. This diffuses the species into the substrate. The substrate is then cleaved along the layer of microbubbles. Other steps to form an oxide layer or to bond to a handle also may be included.

摘要翻译： 公开了一种切割基板的方法。 将诸如氢或氦的物质植入衬底中以形成微泡层。 然后将衬底退火，压力大于大气压。 该退火可以在植入物种的存在下进行。 这将物种扩散到基质中。 然后沿着微泡层切割底物。 可以包括形成氧化物层或结合到手柄的其它步骤。

公开(公告)号：US08329260B2

公开(公告)日：2012-12-11

申请号：US12181516

申请日：2008-07-29

申请人： Julian G. Blake ,  Paul J. Murphy

发明人： Julian G. Blake ,  Paul J. Murphy

IPC分类号： C23C14/48 ,  C23C14/58 ,  C23C14/54 ,  C23C14/10

CPC分类号： H01L21/76254 ,  H01J2237/2001 ,  H01J2237/31701

摘要： A substrate is implanted with a species to form a layer of microbubbles in the substrate. The species may be hydrogen or helium in some embodiments. The size at which the microbubbles are stable within the substrate is controlled. In one example, this is by cooling the substrate. In one embodiment, the substrate is cooled to approximately between −150° C. and 30° C. This cooling also may reduce diffusion of the species in the substrate and will reduce surface roughness when the substrate is cleaved along the layer of microbubbles.

摘要翻译： 植入衬底以在衬底中形成微泡层。 在一些实施方案中，该物质可以是氢或氦。 微泡在基底内稳定的尺寸受到控制。 在一个实例中，这是通过冷却衬底。 在一个实施方案中，将基底冷却至约-150℃至30℃。该冷却还可以减少物质在基底中的扩散，并且当沿着微泡层切割基底时将降低表面粗糙度。

公开(公告)号：US20120280442A1

公开(公告)日：2012-11-08

申请号：US13101280

申请日：2011-05-05

申请人： Richard J. Hertel ,  Julian G. Blake ,  Edward D. MacIntosh ,  Alexander C. Kontos ,  Frank Sinclair ,  Christopher A. Rowland ,  Mayur Jagtap ,  Sankar Ganesh Kolappan

发明人： Richard J. Hertel ,  Julian G. Blake ,  Edward D. MacIntosh ,  Alexander C. Kontos ,  Frank Sinclair ,  Christopher A. Rowland ,  Mayur Jagtap ,  Sankar Ganesh Kolappan

IPC分类号： B23Q3/06 ,  B25B11/00

CPC分类号： H01L21/68771 ,  G11B23/0021 ,  G11B23/0317 ,  G11B23/0327

摘要： A media carrier, adapted to hold a plurality of pieces of magnetic media, is disclosed. This media carrier can be placed on the workpiece support, or platen, allowing the magnetic media to be processed. In some embodiments, the media carrier is designed such that only one side of the magnetic media is exposed, requiring a robot or other equipment to invert each piece of media in the carrier to process the second side. In other embodiments, the media carrier is designed such that both sides of the magnetic media are exposed. In this scenario, the media carrier is inverted on the platen to allow processing of the second side.

摘要翻译： 公开了适于容纳多个磁性介质的介质载体。 该介质载体可以放置在工件支撑件或压板上，允许磁性介质被处理。 在一些实施例中，介质载体被设计成使得只有磁性介质的一侧被暴露，需要机器人或其他设备来反转载体中的每个介质以处理第二侧。 在其他实施例中，介质载体被设计成使得磁性介质的两侧都被暴露。 在这种情况下，媒体载体在压板上反转，以允许处理第二面。