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    Lithography system and projection method
    1.
    发明申请
    Lithography system and projection method 失效
    光刻系统和投影方法

    公开(公告)号：US20070064213A1

    公开(公告)日：2007-03-22

    申请号：US11521671

    申请日：2006-09-15

    申请人： Remco Jager ,  Aukje Arianne Kastelijn ,  Guido Boer ,  Marco Jan Wieland ,  Stijn Willem Herman Steenbrink

    发明人： Remco Jager ,  Aukje Arianne Kastelijn ,  Guido Boer ,  Marco Jan Wieland ,  Stijn Willem Herman Steenbrink

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70291 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31777

    摘要： The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

    摘要翻译： 本发明涉及一种光刻系统，其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具，所述曝光工具包括用于控制曝光投影的控制单元，所述控制单元至少部分地包括在 所述曝光工具的投影空间，并且通过光信号提供控制数据，所述光信号通过使用自由空间光学互连而耦合到所述控制单元，所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元，其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分，所述孔或者所述反射镜的孔可选地用于通过 曝光预测

    Lithography system and projection method
    3.
    发明授权
    Lithography system and projection method 有权
    光刻系统和投影方法

    公开(公告)号：US08242467B2

    公开(公告)日：2012-08-14

    申请号：US12728965

    申请日：2010-03-22

    申请人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

    发明人： Remco Jager ,  Aukje Arianne Annette Kastelijn ,  Guido de Boer ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

    IPC分类号： G21K5/04

    CPC分类号： G03F7/70291 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31777

    摘要： The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

    摘要翻译： 本发明涉及一种光刻系统，其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具，所述曝光工具包括用于控制曝光投影的控制单元，所述控制单元至少部分地包括在 所述曝光工具的投影空间，并且通过光信号提供控制数据，所述光信号通过使用自由空间光学互连而耦合到所述控制单元，所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元，其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分，所述孔或者所述反射镜的孔可选地用于通过 曝光预测

    Modulation device and charged particle multi-beamlet lithography system using the same
    5.
    发明授权
    Modulation device and charged particle multi-beamlet lithography system using the same 有权
    调制装置和带电粒子的多光束光刻系统使用相同

    公开(公告)号：US08841636B2

    公开(公告)日：2014-09-23

    申请号：US12911859

    申请日：2010-10-26

    申请人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

    发明人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

    IPC分类号： H01J37/317 ,  H01J37/04 ,  B82Y40/00 ,  B82Y10/00 ,  H01J37/07

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

    摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.

    摘要翻译： 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。 束发生器被布置用于产生多个带电粒子子束。 子束消隐器阵列被布置成用于图形化子束。 子束遮蔽器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据，并且电连接到一个或多个调制器。 屏蔽结构是导电材料，用于基本上屏蔽在光敏元件附近从调制器产生的电场。 屏蔽结构被设置为预定电位。 投影系统布置成将图案化的子束投影到目标表面上。

    CHARGED PARTICLE BEAM MODULATOR
    6.
    发明申请
    CHARGED PARTICLE BEAM MODULATOR 有权
    充电颗粒光束调制器

    公开(公告)号：US20120292491A1

    公开(公告)日：2012-11-22

    申请号：US13295252

    申请日：2011-11-14

    申请人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink ,  Teunis Van De Peut ,  Henk Derks

    发明人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink ,  Teunis Van De Peut ,  Henk Derks

    IPC分类号： G21K5/04

    CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/2482

    摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.

    摘要翻译： 本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。 光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。 调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。 调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。 电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

    Charged particle multi-beamlet lithography system with modulation device
    7.
    发明申请
    Charged particle multi-beamlet lithography system with modulation device 有权
    带调制装置的带电粒子多光束光刻系统

    公开(公告)号：US20110260040A1

    公开(公告)日：2011-10-27

    申请号：US12911911

    申请日：2010-10-26

    申请人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

    发明人： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

    IPC分类号： G01J1/42

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

    摘要： A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device, a plurality of modulators arranged in arrays, each modulator provided with electrodes extending on opposing sides of an aperture for generating a voltage difference across the aperture, and a plurality of light sensitive elements arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column, wherein the modulation device is subdivided into a plurality of alternating beam areas and non-beam areas, the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.

    摘要翻译： 一种用于将图案转印到目标表面上的带电粒子光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束 到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得 子束被阻挡或不被阻挡束阻挡。 调制装置包括排列成阵列的多个孔，用于使子束通过调制装置，多个以阵列排列的调制器，每个调制器设置有在孔的相对侧延伸的电极，用于产生穿过孔的电压差， 以及多个以阵列排列的感光元件，用于接收调制光束并将光束转换成用于致动调制器的电信号，其中光敏元件位于列内，其中调制装置被细分为多个 交替光束区域和非光束区域，调制器阵列位于光束区域中，并且光敏元件阵列位于非光束区域中，并且与相邻光束区域中的调制器连通。

    Lithography system and projection method
    8.
    发明申请
    Lithography system and projection method 有权
    光刻系统和投影方法

    公开(公告)号：US20080073588A1

    公开(公告)日：2008-03-27

    申请号：US11716452

    申请日：2007-03-09

    申请人： Pieter Kruit ,  Remco Jager ,  Stijn Willem Steenbrink ,  Marco Wieland

    发明人： Pieter Kruit ,  Remco Jager ,  Stijn Willem Steenbrink ,  Marco Wieland

    IPC分类号： H01J37/08

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70508 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01J2237/31771 ,  H01L21/67282

    摘要： The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.

    摘要翻译： 本发明涉及一种探针形成光刻系统，用于使用黑白写入策略（即写入或不写入网格单元）在诸如晶片的目标表面上产生图案，从而在包含网格单元的网格上划分所述图案 所述图案包括尺寸大于网格单元的尺寸的特征，在每个单元中，所述探针被切换为“开”或“关”，其中所述目标上的探针覆盖比网格单元大得多的表面积，以及 其中在特征内，在探针大小的范围以及这种系统可以基于的方法上实现黑白写入的位置相关分布。

    LITHOGRAPHY SYSTEM
    10.
    发明申请
    LITHOGRAPHY SYSTEM 有权
    LITHOGRAPHY系统

    公开(公告)号：US20100045958A1

    公开(公告)日：2010-02-25

    申请号：US12611847

    申请日：2009-11-03

    申请人： Jan-Jaco Marco Wieland ,  Johannes Christiaan van 't Spijker ,  Remco Jager ,  Pieter Kruit

    发明人： Jan-Jaco Marco Wieland ,  Johannes Christiaan van 't Spijker ,  Remco Jager ,  Pieter Kruit

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70383 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70825 ,  G03F7/70991 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/2482

    摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

    摘要翻译： 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度，并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少 一个调制光束，以及至少一个光发射器，用于将至少一个调制光束传输到调制调制器。