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    Method for calibrating large fixed electronic scale
    3.
    发明授权
    Method for calibrating large fixed electronic scale 有权
    校准大型固定电子秤的方法

    公开(公告)号：US09097574B2

    公开(公告)日：2015-08-04

    申请号：US13704667

    申请日：2011-05-30

    Applicant: Jinhui Yao ,  Qin Lin ,  Jianhui Lin ,  Hui Chi

    Inventor： Jinhui Yao ,  Qin Lin ,  Jianhui Lin ,  Hui Chi

    IPC: G01G19/02 ,  G01G23/01

    CPC classification number: G01G23/01 ,  G01G19/02

    Abstract: A method for calibrating large fixed electronic scale is provided. The method applies an auxiliary verification device to calibrate the large fixed electronic scale without using a weight and includes following steps of: loading and unloading every supporting point on the scale table board of the scale by at least one self-locating loading and unloading mechanism; measuring and displaying a load that each loading and unloading mechanisms applies to the scale table board by at least one high accuracy load gauge; controlling a size of the load that each loading and unloading mechanisms applies to the scale table board by a constant load control device; and comparing a precise load displayed by the high accuracy load gauge with a gauge weighing display value of the scale to obtain a calibration error of the scale. The present method greatly improves working efficiency and safety and reduces costs.

    Abstract translation: 提供了一种用于校准大型固定电子秤的方法。 该方法采用辅助验证装置，不使用重量校准大型固定电子秤，包括以下步骤：通过至少一个自定位装卸机构对秤上秤台上的每个支撑点进行装卸; 测量和显示每个装载和卸载机构通过至少一个高精度负载表适用于秤台板的负载; 通过恒定负载控制装置控制每个装载和卸载机构应用于秤台的负载尺寸; 并将由高精度负载表显示的精确负载与秤的称重显示值进行比较，以获得刻度的校准误差。 本方法大大提高了工作效率和安全性，降低了成本。

    Method of making radiation-sensitive sol-gel materials
    4.
    发明授权
    Method of making radiation-sensitive sol-gel materials 有权
    制造辐射敏感溶胶凝胶材料的方法

    公开(公告)号：US08808969B2

    公开(公告)日：2014-08-19

    申请号：US13443533

    申请日：2012-04-10

    Applicant: Qin Lin ,  Yubao Wang ,  Tony D. Flaim

    Inventor： Qin Lin ,  Yubao Wang ,  Tony D. Flaim

    IPC: G03F7/26 ,  G03F7/075 ,  G03F7/20

    CPC classification number: G03F7/075 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/20

    Abstract: Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 μm.

    Abstract translation: 提供了辐射敏感的溶胶 - 凝胶组合物，以及形成微电子结构和如此形成的结构的方法。 组合物包含分散或溶解在溶剂体系中的溶胶 - 凝胶化合物和碱产生剂。 溶胶 - 凝胶化合物包括具有与硅结合的可交联部分的包含硅的重复单体单元。 暴露于辐射后，基底发生器产生强碱，其使组合物中的溶胶 - 凝胶化合物交联，得到不溶于显影剂或溶剂的交联层。 可以除去该层的未曝光部分以产生图案化的溶胶 - 凝胶层。 本发明可用于形成包含特征尺寸小于约1μm的特征的溶胶 - 凝胶材料的图案。

    Method and apparatus for solar collector with integral stagnation temperature control
    8.
    发明申请
    Method and apparatus for solar collector with integral stagnation temperature control 有权
    具有整体停滞温度控制的太阳能集热器的方法和装置

    公开(公告)号：US20070272233A1

    公开(公告)日：2007-11-29

    申请号：US11511493

    申请日：2006-08-29

    Applicant: Stephen Harrison ,  Qin Lin ,  Lucio Mesquita ,  David Valletta

    Inventor： Stephen Harrison ,  Qin Lin ,  Lucio Mesquita ,  David Valletta

    IPC: F24J2/40

    CPC classification number: F24S10/50 ,  F24S40/53 ,  F24S50/40 ,  Y02E10/44

    Abstract: This invention relates to a method and apparatus for a solar collector having intergral control of the maximum temperature that it can reach, thereby avoiding excessive stagnation temperatures in the collector. In one embodiment, a solar collector comprises a top portion comprising glazing, a bottom portion; an absorber disposed between said top portion and said bottom portion for absorbing solar energy received through said glazing, said absorber in a spaced relationship above said bottom portion such that a channel is defined between a lower surface of said absorber and an upper surface of said bottom portion; an inlet and an outlet associated with and at substantially opposite ends of said channel between said absorber and said bottom portion, for ventilating said channel; and a damper for opening said outlet at a temperature equal to or above a first selected temperature and for closing said outlet at a temperature equal to or below a second selected temperature; wherein said first and second selected temperatures are below a stagnation temperature of the solar collector.

    Abstract translation: 本发明涉及一种用于太阳能集热器的方法和装置，其具有可达到的最高温度的整体控制，从而避免了集电器中的过度停滞温度。 在一个实施例中，太阳能收集器包括顶部，其包括玻璃窗，底部; 吸收器，设置在所述顶部和所述底部之间，用于吸收通过所述窗玻璃收到的太阳能，所述吸收体在所述底部部分之上以间隔开的关系形成，使得通道限定在所述吸收体的下表面和所述底部的上表面之间 一部分; 与所述吸收器和所述底部之间的所述通道相关联的入口和出口，用于使所述通道通风; 以及用于在等于或高于第一选定温度的温度下打开所述出口并在等于或低于第二选定温度的温度下关闭所述出口的阻尼器; 其中所述第一和第二选定温度低于所述太阳能收集器的停滞温度。

    Reversal lithography approach by selective deposition of nanoparticles
    10.
    发明授权
    Reversal lithography approach by selective deposition of nanoparticles 有权
    通过选择性沉积纳米粒子的反转光刻方法

    公开(公告)号：US08836082B2

    公开(公告)日：2014-09-16

    申请号：US13017903

    申请日：2011-01-31

    Applicant: Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    Inventor： Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    IPC: H01L29/02 ,  B82Y10/00 ,  B82Y30/00

    CPC classification number: B82Y30/00 ,  B82Y10/00

    Abstract: A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating the tops of the features. As a result, a patterned imaging layer can be removed using solvent, blanket exposure followed by developer washing, or dry etching directly, without an etch-back process, and the original bright field lithography pattern can be reversed into dark field features, and transferred into subsequent layers using the nanoparticle reversal material as an etch mask.

    Abstract translation: 描述了没有回蚀的新型反转光刻工艺。 反转材料包括纳米颗粒，其被选择性地沉积到特征之间的间隙中，而不覆盖特征的顶部。 结果，可以使用溶剂，毯式曝光，显影剂洗涤或直接干法蚀刻，而不用蚀刻工艺去除图案化成像层，并且原始的明视野光刻图案可以反转成暗场特征，并转移 使用纳米颗粒反转材料作为蚀刻掩模进入后续层。

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