PHOTO MASK AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING TRENCHES BY USING PHOTO MASK
    2.
    发明申请
    PHOTO MASK AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING TRENCHES BY USING PHOTO MASK 审中-公开
    照片掩模及其制造方法以及使用照片掩模形成倾斜物的方法

    公开(公告)号:US20150118603A1

    公开(公告)日:2015-04-30

    申请号:US14224112

    申请日:2014-03-25

    Abstract: Embodiments of the invention provide a photo mask capable of simultaneously forming trenches for preventing an under-fill leakage in a process of forming an opening of a solder resist. In accordance with at least one embodiment, the photo mask includes a transparent base material having a non-transmitting film formed on one surface thereof, a semi-transmitting region formed by performing selective etching using a laser on the transparent base material, a transmitting region and a non-transmitting region formed on the transparent base material together with the semi-transmitting region, and an opening of a solder resist and trenches for preventing a leakage of an under-fill liquid or EMC mold may be simultaneously formed using the photo mask.

    Abstract translation: 本发明的实施例提供一种能够在形成阻焊剂的开口的过程中同时形成沟槽以防止欠填漏的光掩模。 根据至少一个实施例,光掩模包括透明基材,其具有在其一个表面上形成的非透光膜,通过使用激光在透明基材上进行选择性蚀刻而形成的半透射区域,透射区域 以及与半透射区域一起形成在透明基材上的非透射区域,并且可以使用光掩模同时形成用于防止未充填液体或EMC模具泄漏的阻焊剂和沟槽的开口 。

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