Abstract:
A COA substrate is provided including a substrate base, a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a color resist layer, and a pixel electrode layer. The surface of the color resist layer is provided with a protrusion and a recess, and the pixel electrode is disposed on the protrusion and the recess. A plurality of protrusions and a plurality of recesses are provided, thereby increasing the display quality of a liquid crystal display device.
Abstract:
An LCD panel and an LCD device are provided. The LCD panel includes a first substrate, which includes a first metal layer, a first insulating layer, an active layer, a second metal layer, a second insulating layer, a color barrier layer, a first transparent conductive layer, a planarization layer, and a second transparent conductive layer electrically connected with the first transparent conductive layer sequentially formed. The first metal layer includes scanning lines. Black matrices are arranged on positions corresponding to scanning lines and corresponding to channels.
Abstract:
A display panels having a direct contact of the source or drain and pixel electrode. The display panels includes an array substrate. The array substrate includes a substrate and at least one TFT and at least one pixel electrode on the array substrate. The TFT includes a gate, a source, a drain, a gate insulation layer and a trench layer, the trench layer include an AS Island pattern and a doped layer, the source and the drain are arranged on the doped layer, and the AS Island pattern is arranged on the gate insulation layer. The source or the drain directly contacts with the pixel electrode without any material layers provided there between.
Abstract:
A TFT device for measuring a contact resistance and a measurement method for a contact resistance are disclosed. The TFT includes an active layer, a gate electrode and a gate insulation layer. The active layer includes a channel and at least three doping regions. Two of the at least three doping regions is connected through a channel. To measure the contact resistance, two of the at least three doping regions are selected and used as testing points for measuring. The gate electrode is disposed to correspond to the channel. The gate insulation layer insulatively isolates the active layer from the gate electrode. Excellent uniformity can be achieved so that manufacturing, film forming quality, and interface property show similarity to the maximum degree. Accordingly, measurement accuracy is increased, and distribution region can be saved to thereby increase utilization of an experimental region.
Abstract:
TFT device for measuring a contact resistance and measurement method for a contact resistance are disclosed. The TFT includes an active layer, a gate electrode and a gate insulation layer. The active layer includes a channel and at least three doping regions, wherein, two of the at least three doping regions is connected through a channel, when measuring the contact resistance, using two of the at least three doping regions as testing points for measuring. The gate electrode disposed correspondingly to the channel. The gate insulation layer for insulating the active layer from the gate electrode. The uniformity of the present invention is well, the manufacturing process, the film forming quality and the interface property are similar in a maximum degree. Accordingly, a measurement accuracy is increased, saving the distribution region at the same time, increasing the utilization of the experimental region.
Abstract:
The present invention provides a manufacture method of a TFT array substrate and a TFT array substrate structure, and the TFT array substrate structure comprises a substrate (1), a first metal electrode (2) on the substrate (1), a gate isolation layer (3) positioned on the substrate (1) and completely covering the first metal electrode (2), an island shaped semiconductor layer (4) on the gate isolation layer (3), a second metal electrode (6) on the gate isolation layer (3) and the island shaped semiconductor layer (4), a protecting layer (8) on the second metal electrode (6), a color resist layer (7) on the protecting layer (8), a protecting layer (12) on the color resist layer (7) and a first pixel electrode layer (9) on the protecting layer (12); a via (81) is formed on the protecting layer (8), the color resist layer (7) and the protecting layer (12), and an organic material layer (10) fills the inside of the via (81).
Abstract:
A liquid crystal display panel is disclosed. The liquid crystal display panel comprises a plurality of pixel units, wherein each pixel unit is composed of a first sub pixel unit with a first pixel voltage and a second sub pixel unit with a second pixel voltage which use a same data line while different scanning lines respectively; and wherein the second sub pixel unit is driven during a driving period of the first sub pixel unit. According to the present disclosure, the influence of a second coupling voltage on the LCD during alternating current driving process can be eliminated.
Abstract:
A COA substrate is provided including a substrate base, a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a color resist layer, and a pixel electrode layer. The surface of the color resist layer is provided with a protrusion and a recess, and the pixel electrode is disposed on the protrusion and the recess. A plurality of protrusions and a plurality of recesses are provided, thereby increasing the display quality of a liquid crystal display device.
Abstract:
The present invention proposes a low temperature poly-silicon thin-film transistor having a dual-gate structure and a method for forming the low temperature poly-silicon thin-film transistor. The low temperature poly-silicon thin-film transistor includes: a substrate, one or more patterned amorphous silicon (a-Si) layers, disposed in a barrier layer on the substrate, for forming a bottom gate, an NMOS disposed on the barrier layer, and a PMOS disposed on the barrier layer. The NMOS comprises a patterned gate electrode (GE) layer as a top gate, and the patterned GE layer and the bottom gate formed by the one or more patterned a-Si layers form a dual-gate structure. The present invention proposes a low temperature poly-silicon thin-film transistor with a more stabilized I-V characteristic, better driving ability, low power consumption, and higher production yield.
Abstract:
The present invention provides a method for manufacturing a COA liquid crystal panel and a COA liquid crystal panel. The method includes forming a first pixel electrode layer on a color resist layer, forming a planarization layer on the first pixel electrode layer, and forming a second pixel electrode layer that is in engagement with the first pixel electrode layer on the planarization layer so as to achieve planarization of the pixel electrode layer to the maximum extent. Further, the second pixel electrode layer includes a pixel electrode block that is located in each sub pixel zone and has a lateral border located above a scan line and a longitudinal border located above a signal line so as to achieve self-shielding of light for the scan line and the signal line, allowing for omission of lateral and longitudinal black matrixes. Further, a dot-like black matrix is formed on a glass substrate at a location corresponding to a TFT on the array substrate to shield light for a site of a channel thereby simplifying the manufacturing process and increase the aperture ratio.