摘要:
Water-fast printing of paper stock using a colorant solution containing water-soluble polymeric dyes is accomplished by a three step process. Step 1 is selecting a paper stock characterized as containing at least 250 ppm by weight of cation, particularly a polyvalent metal cation (especially Ca.sup.2+ or Al.sup.3+). In step 2, a colorant solution is applied to the paper. This solution is water-based, containing up to 30 wt % of an organic paper-penetrating agent (such as an alkanol), and at least 500 ppm of one or more anionic group-possessing polymeric colorants. In step 3, the solvent is exhausted by either evaporation (which may be aided by the application of heat) or diffusion into the paper stock, or by a combination of both.
摘要:
Anthrapyridones are prepared in high yields from 1-aminoanthraquinones or 1-alkylaminoanthraquinones and phenylacetyl halides when tertiary amides are employed as reaction media. The phenylacetyl halides can be generated in situ from phenylacetic acid and thionyl halide or phosgene.
摘要:
A family of polymeric black colorants is disclosed. The subject colorants are composed of an organic polymer backbone comprised of a plurality of aromatic rings from which depend via azo groups a plurality of chromophore units having the structure ##STR1## wherein M is hydrogen or preferably a cation. These polymeric colorants are water-soluble, and noncrystalline and form dyes and inks that are fast to paper stock.
摘要:
Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
摘要:
Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.
摘要翻译:用于光致抗蚀剂组合物的聚合物包括具有下式的重复单元:其中Z表示聚合物主链的重复单元; X是选自亚烷基,亚芳基,亚芳基,羰基,羧基,羧基亚烷基,氧基,氧化烯及其组合的连接基团,R选自氢,烷基,芳基和环烷基, 条件是X和R不是相同环系的一部分。 还公开了用于图案化光致抗蚀剂组合物的浮雕图像的方法,其中光致抗蚀剂组合物具有小于6.5E + 14分子/ cm 2 / s的除气速率。
摘要:
Copolyamic acid is obtained from tetracarboxylic acid dianhydride, diamine and a fluorinated diamine and/or fluorinated tetracarboxylic acid dianhydride; and optionally ester or amine salt derivative thereof to obtain radiation sensitive polymer; and low optical high thermally stable polyimide from curing the above polyamic acid and/or derivative thereof.
摘要:
Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.
摘要:
Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.
摘要翻译:用于光致抗蚀剂组合物的聚合物包括具有下式的重复单元:其中Z表示聚合物主链的重复单元; X是选自亚烷基,亚芳基,亚芳基,羰基,羧基,羧基亚烷基,氧基,氧化烯及其组合的连接基团,R选自氢,烷基,芳基和环烷基, 条件是X和R不是相同环系的一部分。 还公开了用于图案化光致抗蚀剂组合物的浮雕图像的方法,其中光致抗蚀剂组合物具有小于6.5E + 14分子/ cm 2 / s的除气速率。
摘要:
Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.
摘要翻译:涂料组合物包括聚合物,其包括:其中R1是含硅部分,R2是酸稳定的内酯官能团,R3是酸不稳定的内酯官能团; X 1,X 2,X 3独立地为H或CH 3; 并且m和o是非零正整数,n是零或表示重复单元数的正整数; 光致酸发生器; 和溶剂。 还公开了在含有该图案的涂料组合物中形成图案的方法。
摘要:
Block copolymers of polyimide and poly (phenylquinoxaline) have been synthesized. They are useful, particularly as dielectric layers in thin film multilayer structures. The most preferred embodiments are formed from polyimides which are those from pyromellitic dianhydride and oxydianiline. The most preferred poly (phenylquinoxaline) is a monofunctional oligomer, which yields the best microstructure.