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    Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
    4.
    发明授权
    Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning 有权
    用于制冷和空调的金属表面的等离子体聚合增强

    公开(公告)号：US07178584B2

    公开(公告)日：2007-02-20

    申请号：US10952904

    申请日：2004-09-30

    申请人： Seok-Keun Koh ,  Hyung Jin Jung ,  Won Kook Choi ,  Byung Ha Kang ,  Ki Hwan Kim ,  Sam Chul Ha ,  Cheol Hwan Kim ,  Sung-Chang Choi

    发明人： Seok-Keun Koh ,  Hyung Jin Jung ,  Won Kook Choi ,  Byung Ha Kang ,  Ki Hwan Kim ,  Sam Chul Ha ,  Cheol Hwan Kim ,  Sung-Chang Choi

    IPC分类号： F28F13/18

    CPC分类号： C23C16/503 ,  B05D1/62 ,  B05D3/148 ,  B05D5/083 ,  C23C16/30 ,  C23C16/50 ,  C23C16/515 ,  C23C16/56 ,  F25B47/003 ,  F28F13/18 ,  F28F2245/02 ,  F28F2245/04

    摘要： According to the present invention, there is provided a plasma polymerization surface modification of a metal for enhancing its applicability for use in refrigerating and air conditioning such as in constructing heat exchanges, by using a DC discharge plasma, comprising the steps of: (a) positioning an anode electrode which is substantially of metal to be surface-modified and a cathode electrode in a chamber, (b) maintaining a pressure in the chamber at a predetermined vacuum level, (c) blowing a reaction gas composed of an unsaturated aliphatic hydrocarbon monomer gas or fluorine-containing monomer and silicon containing monomer gas at a predetermined pressure and a non-polymerizable gas at a predetermined pressure into the chamber, and (d) applying a voltage to the electrodes in order to obtain a DC discharge, whereby to obtain a plasma consisting of positive and negative ions and radicals generated from the unsaturated aliphatic hydrocarbon monomer gas and the non-polymerizable gas, and then forming a polymer with hydrophilicity or hydrophobicity on the surface of the anode electrode by plasma deposition, and there is also provided a plasma polymerization surface modification of a metal for enhancing its applicability for use in refrigerating and air conditioning such as in constructing heat exchanges, by using an RF plasma.

    摘要翻译： 根据本发明，通过使用DC放电等离子体，提供了一种金属的等离子体聚合表面改性，用于增强其在制冷和空调中的应用，例如构建热交换，其包括以下步骤：（a） 将基本上要被表面改性的金属的阳极电极和阴极电极放置在室中，（b）将室内的压力保持在预定的真空度，（c）吹送由不饱和脂族烃组成的反应气体 单体气体或含氟单体和预定压力的含硅单体气体和以预定压力进入室的非可聚合气体，以及（d）向电极施加电压以获得DC放电，从而 获得由不饱和脂肪烃单体气体和不可聚合气体产生的正离子和负离子和自由基组成的等离子体， 然后通过等离子体沉积在阳极电极的表面上形成具有亲水性或疏水性的聚合物，并且还提供金属的等离子体聚合表面改性以增强其用于制冷和空调的适用性，例如构建热交换 ，通过使用RF等离子体。

    Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
    5.
    发明授权
    Apparatus for surface modification of polymer, metal and ceramic materials using ion beam 失效
    使用离子束对聚合物，金属和陶瓷材料进行表面改性的设备

    公开(公告)号：US06319326B1

    公开(公告)日：2001-11-20

    申请号：US09555832

    申请日：2000-08-07

    申请人： Seok-Keun Koh ,  Hyung Jin Jung ,  Won Kook Choi ,  Jung Cho

    发明人： Seok-Keun Koh ,  Hyung Jin Jung ,  Won Kook Choi ,  Jung Cho

    IPC分类号： C23C1600

    CPC分类号： H01J37/3277 ,  C23C16/4417 ,  C23C16/486 ,  D06B19/00 ,  H01J37/317 ,  H01J2237/338

    摘要： An apparatus for surface modification of a polymer, metal, and ceramic material using an ion beam (IB) is disclosed, which is capable of supplying and controlling a voltage (220) applied to a material to be surface-modified so that an ion beam (IB) energy irradiated to the material is controlled, the degree of the vacuum of a reaction gas in a portion of a vacuum chamber in which the ion beam is irradiated is differentiated from that in a portion in which the ion beam is generated, and both-side irradiating processing and continuous processing is applicable.

    摘要翻译： 公开了一种使用离子束（IB）对聚合物，金属和陶瓷材料进行表面改性的装置，其能够提供和控制施加到待表面改性的材料上的电压（220），使得离子束 （IB）照射到材料的能量时，照射离子束的真空室的一部分中的反应气体的真空度与生成离子束的部分的反应气体的真空度不同， 适用于双面照射处理和连续处理。

    Method for pretreating a polymer substrate using an ion beam for subsequent deposition of indium oxide or indium tin oxide
    6.
    发明授权
    Method for pretreating a polymer substrate using an ion beam for subsequent deposition of indium oxide or indium tin oxide 失效
    使用离子束预处理聚合物衬底以后续沉积氧化铟或氧化铟锡的方法

    公开(公告)号：US06787441B1

    公开(公告)日：2004-09-07

    申请号：US10182986

    申请日：2002-11-13

    申请人： Seok-Keun Koh ,  Young-Whoan Beag ,  Jun-Sik Cho ,  Young-Gun Han

    发明人： Seok-Keun Koh ,  Young-Whoan Beag ,  Jun-Sik Cho ,  Young-Gun Han

    IPC分类号： H01L2144

    CPC分类号： C23C14/022 ,  C23C14/086 ,  C23C14/22

    摘要： A method of depositing indium oxide or indium tin oxide thin film on a polymer substrate is disclosed. In the method, oxygen or argon ion beam is radiated on a polymer substrate by a constant accelerating energy in a vacuum state to modify the surface of the polymer substrate, on which an IO thin film or an ITO thin film is deposited while oxygen ion beam, argon ion beam or their mixture ion beam is being radiated in a vacuum state. In addition, ion beam is generated from a cold cathode ion source by using argon, oxygen or their mixture gas and sputtered at a target substance composed of In2O3 or In2O3 and SnO2, thereby an IO or an ITO thin film can be deposited on the surface-modified polymer substrate.

    摘要翻译： 公开了一种在聚合物基底上沉积氧化铟或氧化铟锡薄膜的方法。 在该方法中，氧气或氩离子束在真空状态下通过恒定的加速能量辐射在聚合物衬底上，以改变聚合物衬底的表面，其上沉积有IO薄膜或ITO薄膜，而氧离子束 氩离子束或其混合离子束在真空状态下被辐射。 此外，通过使用氩，氧或它们的混合气体从冷阴极离子源产生离子束并溅射在由In 2 O 3或In 2 O 3和SnO 2组成的目标物质上，从而可以在表面上沉积IO或ITO薄膜 改性聚合物基材。

    Method of forming ITO film
    7.
    发明授权
    Method of forming ITO film 失效
    ITO膜形成方法

    公开(公告)号：US07309405B2

    公开(公告)日：2007-12-18

    申请号：US10751972

    申请日：2004-01-07

    申请人： Jun-Sik Cho ,  Young-Gun Han ,  Young-Whoan Beag ,  Seok-Keun Koh

    发明人： Jun-Sik Cho ,  Young-Gun Han ,  Young-Whoan Beag ,  Seok-Keun Koh

    IPC分类号： C23C14/35

    CPC分类号： C23C14/3492 ,  C23C14/086 ,  C23C14/46 ,  H01L51/0021 ,  H01L2251/308

    摘要： Disclosed is a method of forming an ITO film by optimized sequential sputter deposition of seed and bulk layers having different sputter process conditions, which is applicable to various display devices, and more particularly, to an organic light-emitting device needing an ultra-planarized surface roughness. In forming a transparent conducting electrode of a display device on a transparent substrate with an ITO film including a seed layer and a bulk layer, a method of forming the ITO film includes a first sputter deposition step of forming the ITO film on the substrate with sputtering gas supplied to an ion source at an ambience of oxygen flowing in the vicinity of the substrate and a second sputter deposition step of forming the ITO film with the sputtering gas supplied to the ion source only, wherein the first and second sputter deposition steps have different process conditions, respectively and wherein the seed and bulk layers are deposited by the first or second sputter deposition step.

    摘要翻译： 公开了通过优化具有不同溅射工艺条件的溅射工艺条件的种子和体层的顺序溅射沉积来形成ITO膜的方法，其适用于各种显示装置，更具体地说，涉及需要超平面化表面的有机发光装置 粗糙度 在透明基板上形成透明导电电极的ITO膜包括种子层和体层之后，形成ITO膜的方法包括：第一溅射沉积步骤，用溅射法在衬底上形成ITO膜 以在衬底附近流动的氧的气氛供给到离子源的气体以及仅供给到离子源的溅射气体形成ITO膜的第二溅射沉积步骤，其中第一和第二溅射沉积步骤具有不同的 工艺条件，并且其中种子和体层通过第一或第二溅射沉积步骤沉积。

    Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
    8.
    发明申请
    Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning 有权
    用于制冷和空调的金属表面的等离子体聚合增强

    公开(公告)号：US20050061024A1

    公开(公告)日：2005-03-24

    申请号：US10952904

    申请日：2004-09-30

    申请人： Seok-Keun Koh ,  Hyung Jung ,  Won Choi ,  Byung Kang ,  Ki Kim ,  Sam Ha ,  Cheol Kim ,  Sung-Chang Choi

    发明人： Seok-Keun Koh ,  Hyung Jung ,  Won Choi ,  Byung Kang ,  Ki Kim ,  Sam Ha ,  Cheol Kim ,  Sung-Chang Choi

    IPC分类号： C23C16/44 ,  B05D3/14 ,  B05D5/08 ,  B05D7/24 ,  C08F2/00 ,  C08G83/00 ,  C23C14/12 ,  C23C14/22 ,  C23C16/30 ,  C23C16/50 ,  C23C16/503 ,  C23C16/515 ,  C23C16/56 ,  F25B47/00 ,  F28F13/18 ,  F25B41/00

    CPC分类号： C23C16/503 ,  B05D1/62 ,  B05D3/148 ,  B05D5/083 ,  C23C16/30 ,  C23C16/50 ,  C23C16/515 ,  C23C16/56 ,  F25B47/003 ,  F28F13/18 ,  F28F2245/02 ,  F28F2245/04

    摘要： According to the present invention, there is provided a plasma polymerization surface modification of a metal for enhancing its applicability for use in refrigerating and air conditioning such as in constructing heat exchanges, by using a DC discharge plasma, comprising the steps of: (a) positioning an anode electrode which is substantially of metal to be surface-modified and a cathode electrode in a chamber, (b) maintaining a pressure in the chamber at a predetermined vacuum level, (c) blowing a reaction gas composed of an unsaturated aliphatic hydrocarbon monomer gas or fluorine-containing monomer and silicon containing monomer gas at a predetermined pressure and a non-polymerizable gas at a predetermined pressure into the chamber, and (d) applying a voltage to the electrodes in order to obtain a DC discharge, whereby to obtain a plasma consisting of positive and negative ions and radicals generated from the unsaturated aliphatic hydrocarbon monomer gas and the non-polymerizable gas, and then forming a polymer with hydrophilicity or hydrophobicity on the surface of the anode electrode by plasma deposition, and there is also provided a plasma polymerization surface modification of a metal for enhancing its applicability for use in refrigerating and air conditioning such as in constructing heat exchanges, by using an RF plasma.

    摘要翻译： 根据本发明，通过使用DC放电等离子体，提供了一种金属的等离子体聚合表面改性，用于增强其在制冷和空调中的应用，例如构建热交换，其包括以下步骤：（a） 将基本上要被表面改性的金属的阳极电极和阴极电极放置在室中，（b）将室内的压力保持在预定的真空度，（c）吹送由不饱和脂族烃组成的反应气体 单体气体或含氟单体和预定压力的含硅单体气体和以预定压力进入室的非可聚合气体，以及（d）向电极施加电压以获得DC放电，从而 获得由不饱和脂肪烃单体气体和不可聚合气体产生的正离子和负离子和自由基组成的等离子体， 然后通过等离子体沉积在阳极电极的表面上形成具有亲水性或疏水性的聚合物，并且还提供金属的等离子体聚合表面改性以增强其用于制冷和空调的适用性，例如构建热交换 ，通过使用RF等离子体。