Methods of Fabricating Silicon on Insulator (SOI) Wafers
    1.
    发明申请
    Methods of Fabricating Silicon on Insulator (SOI) Wafers 审中-公开
    在绝缘体(SOI)晶片上制造硅的方法

    公开(公告)号:US20090221133A1

    公开(公告)日:2009-09-03

    申请号:US12370783

    申请日:2009-02-13

    IPC分类号: H01L21/762

    CPC分类号: H01L21/76254

    摘要: Methods of fabricating SOI wafers are provided including providing a donor wafer and forming a hydrogen ion implantation layer in the donor wafer. A circumference portion of one side of the donor wafer is recessed to form a height difference. The one side of the donor wafer and a handle wafer are bonded to form a bonded wafer. The bonded wafer is heat treated to separate the bonded wafer along the hydrogen ion implantation layer.

    摘要翻译: 提供制造SOI晶片的方法包括提供施主晶片并在施主晶片中形成氢离子注入层。 供体晶片的一侧的周边部分被凹入以形成高度差。 供体晶片和处理晶片的一侧被结合以形成接合晶片。 接合的晶片被热处理以沿着氢离子注入层分离键合的晶片。

    Methods of selectively forming silicon-on-insulator structures using selective expitaxial growth process
    9.
    发明授权
    Methods of selectively forming silicon-on-insulator structures using selective expitaxial growth process 有权
    使用选择性外延生长工艺选择性地形成绝缘体上硅结构的方法

    公开(公告)号:US08735265B2

    公开(公告)日:2014-05-27

    申请号:US13082861

    申请日:2011-04-08

    IPC分类号: H01L21/20

    摘要: A method of forming a silicon based optical waveguide can include forming a silicon-on-insulator structure including a non-crystalline silicon portion and a single crystalline silicon portion of an active silicon layer in the structure. The non-crystalline silicon portion can be replaced with an amorphous silicon portion and maintaining the single crystalline silicon portion and the amorphous portion can be crystallized using the single crystalline silicon portion as a seed to form a laterally grown single crystalline silicon portion including the amorphous and single crystalline silicon portions.

    摘要翻译: 形成硅基光波导的方法可以包括在该结构中形成包括非晶硅部分和活性硅层的单晶硅部分的绝缘体上硅结构。 可以用非晶硅部分替代非晶硅部分,并且使用单晶硅部分作为种子来保持单晶硅部分和非晶部分可以结晶,以形成横向生长的单晶硅部分,其包括非晶态和 单晶硅部分。