公开(公告)号：US20130307054A1

公开(公告)日：2013-11-21

申请号：US13606292

申请日：2012-09-07

申请人： Shinichi YASUDA ,  Kosuke Tatsumura ,  Mari Matsumoto ,  Koichiro Zaitsu ,  Masato Oda ,  Atsuhiro Kinoshita ,  Daisuke Hagishima ,  Yoshifumi Nishi ,  Takahiro Kurita ,  Shinobu Fujita

发明人： Shinichi YASUDA ,  Kosuke Tatsumura ,  Mari Matsumoto ,  Koichiro Zaitsu ,  Masato Oda ,  Atsuhiro Kinoshita ,  Daisuke Hagishima ,  Yoshifumi Nishi ,  Takahiro Kurita ,  Shinobu Fujita

IPC分类号： H01L27/105

CPC分类号： G11C16/10 ,  H01L21/823456 ,  H01L21/823462 ,  H01L27/11526 ,  H01L27/11573 ,  H01L29/7881 ,  H01L29/792

摘要： One embodiment provides a semiconductor integrated circuit, including: a substrate; a plurality of nonvolatile memory portions formed in the substrate, each including a first nonvolatile memory and a second nonvolatile memory; and a plurality of logic transistor portions formed in the substrate, each including at least one of logic transistor, wherein the logic transistors include: a first transistor which is directly connected to drains of the first and second nonvolatile memories at its gate; and a second transistor which is not directly connected to the drains of the first and second nonvolatile memories, and wherein a bottom surface of the gate of each of the logic transistors sandwiching the first and second nonvolatile memories is lower in height from a top surface of the substrate than a bottom surface of the control gate of each of the first and second nonvolatile memories.

摘要翻译： 一个实施例提供一种半导体集成电路，包括：基板; 形成在所述基板中的多个非易失性存储部，每个包括第一非易失性存储器和第二非易失性存储器; 以及形成在所述衬底中的多个逻辑晶体管部分，每个逻辑晶体管部分包括逻辑晶体管中的至少一个，其中所述逻辑晶体管包括：第一晶体管，其第一和第二非易失性存储器的栅极直接连接到第一晶体管; 以及第二晶体管，其不直接连接到第一和第二非易失性存储器的漏极，并且其中夹着第一和第二非易失性存储器的每个逻辑晶体管的栅极的底表面的高度与 所述基板比所述第一和第二非易失性存储器中的每一个的所述控制栅极的底表面。

公开(公告)号：US08553464B2

公开(公告)日：2013-10-08

申请号：US13240087

申请日：2011-09-22

申请人： Yoshifumi Nishi ,  Daisuke Hagishima ,  Shinichi Yasuda ,  Tetsufumi Tanamoto ,  Takahiro Kurita ,  Atsuhiro Kinoshita ,  Shinobu Fujita

发明人： Yoshifumi Nishi ,  Daisuke Hagishima ,  Shinichi Yasuda ,  Tetsufumi Tanamoto ,  Takahiro Kurita ,  Atsuhiro Kinoshita ,  Shinobu Fujita

IPC分类号： G11C11/35

CPC分类号： H01L27/11568 ,  G11C16/0458 ,  G11C16/10 ,  H01L27/11573 ,  H01L27/11803

摘要： An aspect of the present embodiment, there is provided a nonvolatile programmable logic switch including a first memory cell transistor, a second memory cell transistor, a pass transistor and a first substrate electrode applying a substrate voltage to the pass transistor, wherein a writing voltage is applied to the first wiring, a first voltage is applied to one of a second wiring and a third wiring and a second voltage which is lower than the first voltage is applied to the other of the second wiring and the third wiring, and the first substrate voltage which is higher than the second voltage and lower than the first voltage is applied to a well of the pass transistor, when data is written into the first memory cell transistor or the second memory cell transistor.

摘要翻译： 本实施例的一个方面提供了一种非易失性可编程逻辑开关，包括第一存储单元晶体管，第二存储单元晶体管，传输晶体管和向该通过晶体管施加衬底电压的第一衬底电极，其中写入电压为 施加到第一布线，第一电压施加到第二布线和第三布线中的一个，并且低于第一电压的第二电压施加到第二布线和第三布线中的另一布线，第一基板 当数据被写入第一存储单元晶体管或第二存储单元晶体管时，高于第二电压并低于第一电压的电压被施加到传输晶体管的阱。

公开(公告)号：US08610196B2

公开(公告)日：2013-12-17

申请号：US13608436

申请日：2012-09-10

申请人： Tetsufumi Tanamoto ,  Kosuke Tatsumura ,  Kiwamu Sakuma ,  Atsuhiro Kinoshita ,  Shinobu Fujita ,  Koichi Muraoka

发明人： Tetsufumi Tanamoto ,  Kosuke Tatsumura ,  Kiwamu Sakuma ,  Atsuhiro Kinoshita ,  Shinobu Fujita ,  Koichi Muraoka

IPC分类号： H01L27/11

CPC分类号： H01L29/42332 ,  G11C11/412 ,  G11C14/0063 ,  H01L27/1104 ,  H01L29/7881

摘要： In a memory of an embodiment, first and second P-channel transistors are formed on a first semiconductor region, and each of the first and second P-channel transistors has a structure formed by stacking a first insulating film, a first floating gate, a second insulating film, a second floating gate, a third insulating film, and a first control gate in this order on the first semiconductor region. In the memory, first and second N-channel transistors are formed on a second semiconductor region, and each of the first and second N-channel transistors has a structure formed by stacking a fourth insulating film, a third floating gate, a fifth insulating film, a fourth floating gate, a sixth insulating film, and a second control gate in this order on the second semiconductor region.

摘要翻译： 在实施例的存储器中，第一和第二P沟道晶体管形成在第一半导体区域上，并且第一和第二P沟道晶体管中的每一个具有通过堆叠第一绝缘膜，第一浮动栅极， 第二绝缘膜，第二浮栅，第三绝缘膜和第一控制栅极。 在存储器中，第一和第二N沟道晶体管形成在第二半导体区域上，并且第一和第二N沟道晶体管中的每一个具有通过堆叠第四绝缘膜，第三浮栅，第五绝缘膜 ，第四浮栅，第六绝缘膜和第二控制栅极。

公开(公告)号：US20130069134A1

公开(公告)日：2013-03-21

申请号：US13608436

申请日：2012-09-10

申请人： Tetsufumi TANAMOTO ,  Kosuke Tatsumura ,  Kiwamu Sakuma ,  Atsuhiro Kinoshita ,  Shinobu Fujita ,  Koichi Muraoka

发明人： Tetsufumi TANAMOTO ,  Kosuke Tatsumura ,  Kiwamu Sakuma ,  Atsuhiro Kinoshita ,  Shinobu Fujita ,  Koichi Muraoka

IPC分类号： H01L27/11

CPC分类号： H01L29/42332 ,  G11C11/412 ,  G11C14/0063 ,  H01L27/1104 ,  H01L29/7881

摘要： In a memory of an embodiment, first and second P-channel transistors are formed on a first semiconductor region, and each of the first and second P-channel transistors has a structure formed by stacking a first insulating film, a first floating gate, a second insulating film, a second floating gate, a third insulating film, and a first control gate in this order on the first semiconductor region. In the memory, first and second N-channel transistors are formed on a second semiconductor region, and each of the first and second N-channel transistors has a structure formed by stacking a fourth insulating film, a third floating gate, a fifth insulating film, a fourth floating gate, a sixth insulating film, and a second control gate in this order on the second semiconductor region.

摘要翻译： 在实施例的存储器中，第一和第二P沟道晶体管形成在第一半导体区域上，并且第一和第二P沟道晶体管中的每一个具有通过堆叠第一绝缘膜，第一浮动栅极， 第二绝缘膜，第二浮栅，第三绝缘膜和第一控制栅极。 在存储器中，第一和第二N沟道晶体管形成在第二半导体区域上，并且第一和第二N沟道晶体管中的每一个具有通过堆叠第四绝缘膜，第三浮栅，第五绝缘膜 ，第四浮栅，第六绝缘膜和第二控制栅极。

公开(公告)号：US20120080737A1

公开(公告)日：2012-04-05

申请号：US13051834

申请日：2011-03-18

申请人： Koichiro ZAITSU ,  Shinichi Yasuda ,  Shinobu Fujita

发明人： Koichiro ZAITSU ,  Shinichi Yasuda ,  Shinobu Fujita

IPC分类号： H01L29/788

CPC分类号： H01L27/11807 ,  H01L27/11521 ,  H01L27/11526

摘要： According to one embodiment, a semiconductor device is provided. The semiconductor is provided with a MEMS switch element having a control terminal and a pair of signal terminals, and a non-volatile memory unit having first and second non-volatile semiconductor elements. The first non-volatile semiconductor element has a first source, a first drain and a first control gate terminal. The first drain is electrically connected to the control terminal of the MEMS switch element. The second non-volatile semiconductor element has a second source, a second drain and a second control gate terminal. The second drain gate terminal is electrically connected to the control terminal of the MEMS switch element.

摘要翻译： 根据一个实施例，提供一种半导体器件。 半导体设置有具有控制端子和一对信号端子的MEMS开关元件，以及具有第一和第二非易失性半导体元件的非易失性存储器单元。 第一非易失性半导体元件具有第一源极，第一漏极和第一控制栅极端子。 第一漏极电连接到MEMS开关元件的控制端子。 第二非易失性半导体元件具有第二源极，第二漏极和第二控制栅极端子。 第二漏极端子电连接到MEMS开关元件的控制端子。

公开(公告)号：US08307022B2

公开(公告)日：2012-11-06

申请号：US12130567

申请日：2008-05-30

申请人： Mari Matsumoto ,  Ryuji Ohba ,  Shinichi Yasuda ,  Shinobu Fujita

发明人： Mari Matsumoto ,  Ryuji Ohba ,  Shinichi Yasuda ,  Shinobu Fujita

IPC分类号： G06F1/02

CPC分类号： G06F7/588 ,  H03K3/84

摘要： A random number generating device includes: a pulse voltage generator configured to generate a pulse voltage having an amplitude of 26 mV or more; a random noise generating element including source and drain regions formed at a distance from each other on a semiconductor substrate, a tunnel insulating film formed on a portion of the semiconductor substrate located between the source region and the drain region, and a gate electrode formed above the tunnel insulating film and to which the pulse voltage is applied, the random noise generating element configured to generate a random noise contained in a current flowing between the source region and the drain region; and a random number generating unit configured to generate a random number signal based on the random noise.

摘要翻译： 随机数生成装置包括：脉冲电压发生器，被配置为产生具有26mV或更大幅度的脉冲电压; 包括形成在半导体衬底上彼此间隔一定距离的源极和漏极区域的随机噪声产生元件，形成在位于源极区域和漏极区域之间的半导体衬底的一部分上的隧道绝缘膜以及形成在栅极电极上的栅电极 隧道绝缘膜，并且施加脉冲电压，所述随机噪声产生元件被配置为产生包含在源极区域和漏极区域之间的电流中的随机噪声; 以及随机数生成单元，被配置为基于随机噪声生成随机数信号。

公开(公告)号：US20090327379A1

公开(公告)日：2009-12-31

申请号：US12130567

申请日：2008-05-30

申请人： Mari Matsumoto ,  Ryuji Ohba ,  Shinichi Yasuda ,  Shinobu Fujita

发明人： Mari Matsumoto ,  Ryuji Ohba ,  Shinichi Yasuda ,  Shinobu Fujita

IPC分类号： G06F7/58

CPC分类号： G06F7/588 ,  H03K3/84

摘要： A random number generating device includes: a pulse voltage generator configured to generate a pulse voltage having an amplitude of 26 mV or more; a random noise generating element including source and drain regions formed at a distance from each other on a semiconductor substrate, a tunnel insulating film formed on a portion of the semiconductor substrate located between the source region and the drain region, and a gate electrode formed above the tunnel insulating film and to which the pulse voltage is applied, the random noise generating element configured to generate a random noise contained in a current flowing between the source region and the drain region; and a random number generating unit configured to generate a random number signal based on the random noise.

摘要翻译： 随机数生成装置包括：脉冲电压发生器，被配置为产生具有26mV或更大幅度的脉冲电压; 包括形成在半导体衬底上彼此间隔一定距离的源极和漏极区域的随机噪声产生元件，形成在位于源极区域和漏极区域之间的半导体衬底的一部分上的隧道绝缘膜以及形成在栅极电极上的栅电极 隧道绝缘膜，并且施加脉冲电压，所述随机噪声产生元件被配置为产生包含在源极区域和漏极区域之间的电流中的随机噪声; 以及随机数生成单元，被配置为基于随机噪声生成随机数信号。

公开(公告)号：US08437187B2

公开(公告)日：2013-05-07

申请号：US13232550

申请日：2011-09-14

申请人： Shinichi Yasuda ,  Masato Oda ,  Kumiko Nomura ,  Keiko Abe ,  Shinobu Fujita

发明人： Shinichi Yasuda ,  Masato Oda ,  Kumiko Nomura ,  Keiko Abe ,  Shinobu Fujita

IPC分类号： G11C16/04 ,  G11C7/10

CPC分类号： H03K19/17728 ,  G11C13/0002 ,  G11C16/0466 ,  H03K19/17768

摘要： In one embodiment, a semiconductor integrated circuit has memory cells. Each of the memory cells has non-volatile memories and switching elements. The non-volatile memories and switching elements are connected in series between a first power source and a second power source. Output wirings of at least two of the memory cells are connected to each other. Input wirings are connected with control gates of the switching elements included in each of the at least two memory cells. A plurality of the switching elements included in one of the at least two of the memory cells is turned off, when an input signal or an inverted signal is inputted. Further, another plurality of the switching elements included in another one of the at least two of memory cells other than the one of the memory cells is turned on, when the input signal or the inverted signal is inputted.

摘要翻译： 在一个实施例中，半导体集成电路具有存储单元。 每个存储单元具有非易失性存储器和开关元件。 非易失性存储器和开关元件串联连接在第一电源和第二电源之间。 至少两个存储单元的输出布线彼此连接。 输入布线与包括在至少两个存储单元中的每一个中的开关元件的控制栅极连接。 当输入信号或反相信号被输入时，包括在至少两个存储单元之一中的多个开关元件被断开。 此外，当输入信号或反相信号被输入时，包括在存储单元之外的至少两个存储单元中的另一个存储单元中的另外多个开关元件导通。

公开(公告)号：US20120230105A1

公开(公告)日：2012-09-13

申请号：US13232550

申请日：2011-09-14

申请人： Shinichi YASUDA ,  Masato Oda ,  Kumiko Nomura ,  Keiko Abe ,  Shinobu Fujita

发明人： Shinichi YASUDA ,  Masato Oda ,  Kumiko Nomura ,  Keiko Abe ,  Shinobu Fujita

IPC分类号： G11C16/04 ,  G11C5/06

CPC分类号： H03K19/17728 ,  G11C13/0002 ,  G11C16/0466 ,  H03K19/17768

摘要： In one embodiment, a semiconductor integrated circuit has memory cells. Each of the memory cells has non-volatile memories and switching elements. The non-volatile memories and switching elements are connected in series between a first power source and a second power source. Output wirings of at least two of the memory cells are connected to each other. Input wirings are connected with control gates of the switching elements included in each of the at least two memory cells. A plurality of the switching elements included in one of the at least two of the memory cells is turned off, when an input signal or an inverted signal is inputted. Further, another plurality of the switching elements included in another one of the at least two of memory cells other than the one of the memory cells is turned on, when the input signal or the inverted signal is inputted.

摘要翻译： 在一个实施例中，半导体集成电路具有存储单元。 每个存储单元具有非易失性存储器和开关元件。 非易失性存储器和开关元件串联连接在第一电源和第二电源之间。 至少两个存储单元的输出布线彼此连接。 输入布线与包括在至少两个存储单元中的每一个中的开关元件的控制栅极连接。 当输入信号或反相信号被输入时，包括在至少两个存储单元之一中的多个开关元件被断开。 此外，当输入信号或反相信号被输入时，包括在存储单元之外的至少两个存储单元中的另一个存储单元中的另外多个开关元件导通。

公开(公告)号：US08578318B2

公开(公告)日：2013-11-05

申请号：US13561483

申请日：2012-07-30

申请人： Kumiko Nomura ,  Shinichi Yasuda ,  Shinobu Fujita ,  Keiko Abe ,  Tetsufumi Tanamoto ,  Kazutaka Ikegami ,  Masato Oda

发明人： Kumiko Nomura ,  Shinichi Yasuda ,  Shinobu Fujita ,  Keiko Abe ,  Tetsufumi Tanamoto ,  Kazutaka Ikegami ,  Masato Oda

IPC分类号： G06F17/50

CPC分类号： G06F17/5077 ,  G06F17/5031 ,  G06F17/5054 ,  G06F17/5081

摘要： In one embodiment, a method for implementing a circuit design for an integrated circuit includes: (a) obtaining a first wiring to satisfy a given operating frequency; (b) calculating a maximum bypass wiring length based on the given operating frequency and a critical path of the first wiring; (c) obtaining a second wiring by bypassing the first wiring using wires other than wires of the first wiring in a first wiring group, wherein wiring of the integrated circuit is categorized into a plurality of wiring groups, and the first wiring is included in the first wiring group of the categorized wiring groups; and (d) replacing the first wiring with the second wiring, if a difference between the second wiring and the first wiring is not larger than the maximum bypass wiring length, and not replacing the first wiring if said difference is larger than the maximum bypass wiring length.

摘要翻译： 在一个实施例中，一种用于实现集成电路的电路设计的方法包括：（a）获得第一布线以满足给定的工作频率; （b）基于给定的工作频率和第一布线的关键路径计算最大旁路布线长度; （c）通过在第一布线组中使用不同于第一布线的布线的旁路第一布线来获得第二布线，其中集成电路的布线被分类为多个布线组，并且第一布线包括在第一布线中 分类布线组的第一接线组; 以及（d）如果所述第二布线和所述第一布线之间的差不大于所述最大旁路布线长度，则用所述第二布线代替所述第一布线，并且如果所述差大于所述最大旁路布线，则不更换所述第一布线 长度。