公开(公告)号：US06727182B2

公开(公告)日：2004-04-27

申请号：US09101308

申请日：1998-10-15

申请人： Takashi Akahori ,  Shuichi Ishizuka ,  Shunichi Endo ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Shuichi Ishizuka ,  Shunichi Endo ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： H01L21302

CPC分类号： H01L21/31144 ,  H01L21/31138 ,  H01L21/76802 ,  H01L23/5226 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： It is an object of the present invention to provide a process for a fluorine containing carbon film (a CF film), which can put an interlayer insulator film of a fluorine containing carbon film into practice. A conductive film, e.g., a TiN film 41, is formed on a CF film 4. After a pattern of a resist film 42 is formed thereon, the TiN film 41 is etched with, e.g., BCl3 gas. Thereafter, when the surface of the wafer is irradiated with O2 plasma, the CF film is chemically etched, and the resist film 42 is also etched. However, since the TiN film 41 functions as a mask, a predetermined hole can be formed. Although an interconnection layer of aluminum or the like is formed on the surface of the CF film 4, the TiN film 41 functions as an adhesion layer for adhering the interconnection layer to the CF film 4 and serves as a part of the interconnection layer. As the mask, an insulator film of SiO2 or the like may be substituted for the film.

摘要翻译： 本发明的目的是提供一种可以将含氟碳膜的层间绝缘膜实际应用的含氟碳膜（CF膜）的方法。 在CF膜4上形成例如TiN膜41的导电膜。在其上形成抗蚀剂膜42的图案之后，用例如BCl 3气体蚀刻TiN膜41。 此后，当用O 2等离子体照射晶片的表面时，对CF膜进行化学蚀刻，并且还蚀刻抗蚀剂膜42。 然而，由于TiN膜41用作掩模，因此可以形成预定的孔。 尽管在CF膜4的表面上形成了铝等的互连层，但是TiN膜41用作将互连层粘附到CF膜4并用作互连层的一部分的粘附层。 作为掩模，可以用SiO 2等的绝缘膜代替膜。

公开(公告)号：US06355902B2

公开(公告)日：2002-03-12

申请号：US09750683

申请日：2001-01-02

申请人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： B23K1000

CPC分类号： H01L21/0212 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801 ,  H01L21/7682 ,  H01L21/76837

摘要： Microwave is introduced into a plasma chamber of a plasma processing apparatus and magnetic field is applied thereto to allow plasma generation gas to be placed in plasma state by the electron cyclotron resonance. This plasma is introduced into a film forming chamber of the plasma processing apparatus to allow film forming gas including compound gas of carbon and fluorine or compound gas of carbon, fluorine and hydrogen, and hydro carbon gas to be placed in plasma state. In addition, an insulating film consisting of fluorine added carbon film is formed by the film forming gas placed in plasma state.

摘要翻译： 将微波引入到等离子体处理装置的等离子体室中，并施加磁场以使等离子体产生气体通过电子回旋共振被置于等离子体状态。 该等离子体被引入到等离子体处理装置的成膜室中，以允许包括碳和氟的复合气体或碳，氟和氢的复合气体以及碳氢气体的成膜气体处于等离子体状态。 此外，通过以等离子体状态放置的成膜气体形成由氟添加碳膜构成的绝缘膜。

公开(公告)号：US06215087B1

公开(公告)日：2001-04-10

申请号：US09101516

申请日：1998-07-10

申请人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： B23K1000

CPC分类号： H01L21/0212 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801 ,  H01L21/7682 ,  H01L21/76837

摘要： Microwave is introduced into a plasma chamber of a plasma processing apparatus and magnetic field is applied thereto to allow plasma generation gas to be placed in plasma state by the electron cyclotron resonance. This plasma is introduced into a film forming chamber of the plasma processing apparatus to allow film forming gas including compound gas of carbon and fluorine or compound gas of carbon, fluorine and hydrogen, and hydro carbon gas to be placed in plasma state. In addition, an insulating film consisting of fluorine added carbon film is formed by the film forming gas placed in plasma state.

摘要翻译： 将微波引入到等离子体处理装置的等离子体室中，并施加磁场以使等离子体产生气体通过电子回旋共振被置于等离子体状态。 该等离子体被引入到等离子体处理装置的成膜室中，以允许包括碳和氟的复合气体或碳，氟和氢的复合气体以及碳氢气体的成膜气体处于等离子体状态。 此外，通过以等离子体状态放置的成膜气体形成由氟添加碳膜构成的绝缘膜。

公开(公告)号：US06468603B1

公开(公告)日：2002-10-22

申请号：US09663715

申请日：2000-09-18

申请人： Shunichi Endo ,  Tadashi Hirata

发明人： Shunichi Endo ,  Tadashi Hirata

IPC分类号： C23C1626

CPC分类号： H01L21/0212 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/3127 ,  H01L21/76837

摘要： This invention is a method of: making a film-forming gas including a compound gas of carbon and fluorine into plasma in a vacuum container 2 including a stage 4 for an object to be processed 10; and applying a bias electric power to the stage 4 in order to draw ions in the plasma toward the object 10 while forming an insulation film consisting of a film of fluorine-added carbon onto the object 10 by the plasma. At first, a first electric power of the bias electric power is applied to the stage 4 and the compound gas of carbon and fluorine is introduced at a first flow rate to form the film of fluorine-added carbon onto the object 10. Then, a second electric power of the bias electric power smaller than the first electric power is applied to the stage 4 and the compound gas of carbon and fluorine is introduced at a second flow rate smaller than the first flow rate to form the film of fluorine-added carbon onto the object 10. According to the invention, in the case of filling up a concave portion having a high aspect ratio with a film of fluorine-added carbon, the film-forming process can be conducted while generating less voids with a raised throughput.

摘要翻译： 本发明是一种在包括用于待处理物体10的台架4的真空容器2中将包括碳和氟的复合气体的成膜气体制成等离子体的方法; 并且为了将等离子体中的离子朝向物体10施加偏置电力，同时通过等离子体将由氟加成碳膜构成的绝缘膜形成在物体10上。 首先，将偏置电力的第一电力施加到载物台4，并以第一流量引入碳氟的复合气体，以在对象10上形成氟加成膜的膜。然后，将 将第一功率小于第一功率的偏置电力的第二电力施加到载物台4，并以比第一流量小的第二流量引入碳氟化合物气体，以形成氟加成膜 根据本发明，在用含氟碳膜填充具有高纵横比的凹部的情况下，可以在产生较少的具有提高的生产量的空隙的同时进行成膜过程。

公开(公告)号：US06218299B1

公开(公告)日：2001-04-17

申请号：US09101244

申请日：1998-07-06

申请人： Takashi Akahori ,  Yoko Naito ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Yoko Naito ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： H01L2144

CPC分类号： H01L21/0212 ,  C23C16/029 ,  C23C16/26 ,  C23C16/325 ,  H01L21/02115 ,  H01L21/02126 ,  H01L21/02167 ,  H01L21/022 ,  H01L21/02274 ,  H01L21/02304 ,  H01L21/3127 ,  H01L21/76801 ,  H01L21/76819 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76834 ,  H01L21/76835 ,  H01L21/7685 ,  H01L21/76856

摘要： For example, in a plasma processing system, C4F8 gas and C2H4 gas are introduced as film-forming gases at flow rates of 60 sccm and 30 sccm, respectively, under the conditions of a pressure of 0.2 Pa, a microwave power of 2.7 kW, a radiofrequency power of 1.5 kW, and a wafer temperature of 350° C. At the same time, a plasma gas is also introduced at a flow rate of 150 sccm to form CF film 13 having an F content of, for example, 22% on silicon substrate 11. This CF film 13 has a relative dielectric constant of 2.4.

摘要翻译： 例如，在等离子体处理系统中，在压力为0.2Pa，微波功率为2.7kW的条件下，分别以60sccm和30sccm的流量将C4F8气体和C2H4气体作为成膜气体引入， 1.5kW的射频功率和350℃的晶片温度。同时，还以150sccm的流量引入等离子体气体以形成F含量例如为22％的CF膜13， 该硅膜13的相对介电常数为2.4。

公开(公告)号：US08711473B2

公开(公告)日：2014-04-29

申请号：US12206961

申请日：2008-09-09

申请人： Tadashi Hirata

发明人： Tadashi Hirata

IPC分类号： G02B21/00 ,  G02B21/24

CPC分类号： G02B21/241 ,  G02B21/002 ,  G02B21/16

摘要： An optical scanning microscope is presented in which the observation magnification does not significantly change even when the working distance of an objective lens is changed. The optical scanning microscope includes an objective optical system that converts the light from a specimen into a substantially collimated light beam, an imaging optical system that forms an image from the collimated light beam, a pupil projection optical system that substantially collimates the light formed into an image, a lateral scanner that angularly deflects the collimated light beam from the pupil projection optical system to laterally scan the area of the specimen to be observed, and a lens driver that drives the imaging optical system and/or the pupil projection optical system along the optical axis direction. The imaging optical system is disposed such that its front focal point is positioned proximate to the back focal point of the objective optical system.

摘要翻译： 提出了一种光学扫描显微镜，其中即使当物镜的工作距离改变时，观察放大率也不会显着变化。 光学扫描显微镜包括物镜光学系统，其将来自样本的光转换成基本上准直的光束;成像光学系统，其从准直光束形成图像;瞳孔投影光学系统，其基本上准直成形为 图像，横向扫描器，其使来自瞳孔投影光学系统的准直光束成角度地偏转以横向扫描要观察的样本的区域;以及透镜驱动器，其沿着所述第一光学系统和/或瞳孔投影光学系统驱动成像光学系统和/ 光轴方向。 成像光学系统被布置成使得其前焦点位于物镜光学系统的后焦点附近。

公开(公告)号：US07907335B2

公开(公告)日：2011-03-15

申请号：US12389875

申请日：2009-02-20

申请人： Tadashi Hirata

发明人： Tadashi Hirata

IPC分类号： G02B7/04 ,  G02B21/00

CPC分类号： G02B21/244

摘要： It is possible to use the magnification of an objective lens as is, substantially without changing the observation magnification, even when the working distance of the objective lens is changed. The invention provides a focus-adjusting unit disposed on an optical axis between an objective optical system that collects light from a specimen and an image-forming optical system that images the light collected by the objective optical system at a prescribed position, comprising a front optical system and a back optical system, sequentially disposed along the optical axis direction from a front side, with the objective optical system serving at the front side and the image-forming optical system at the back; and a lens driving part that relatively moves these optical systems in the optical axis direction, wherein the front optical system and the back optical system have refractive powers of different sign and focal lengths of substantially equal absolute value.

摘要翻译： 即使当物镜的工作距离改变时，也可以基本上不改变观察倍率来使用物镜的放大率。 本发明提供一种聚焦调节单元，其设置在收集来自试样的光的物镜光学系统和将由物镜光学系统收集的光成像到规定位置的图像形成光学系统之间的光轴上，该光学系统包括前光学 系统和背光学系统，其从前侧沿着光轴方向顺序地设置，物镜光学系统在前侧，后方的成像光学系统; 以及透镜驱动部，其在光轴方向上相对移动这些光学系统，其中前光学系统和后光学系统具有基本相等的绝对值的不同符号和焦距的折射力。

公开(公告)号：US07643208B2

公开(公告)日：2010-01-05

申请号：US11948368

申请日：2007-11-30

申请人： Tadashi Hirata

发明人： Tadashi Hirata

IPC分类号： G02B21/06

CPC分类号： G02B21/002 ,  G02B21/16 ,  G02B21/241 ,  G02B27/1006 ,  G02B27/1066 ,  G02B27/141 ,  G02B27/145

摘要： An optical scanning observation apparatus having an internal focusing mechanism. suitable for in-vivo observation of animals, is provided. The optical scanning observation apparatus includes a light source, an objective optical system for focusing light onto the sample, a detection-light splitting device for splitting off collected detection light, a detector for detecting the focused detection light, a focus scanning device disposed between the detection-light splitting device and the objective optical system, and a lateral-direction scanning device, disposed between the focus scanning device and the objective optical system, for scanning the light in orthogonal directions relative to the optical axis. The focus scanning device further includes a focusing optical system having a positive and negative lens group and a lens driving device for moving one lens group to adjust the working distance of the objective optical system.

摘要翻译： 一种具有内部聚焦机构的光学扫描观察装置。 适用于动物的体内观察。 光学扫描观察装置包括光源，用于将光聚焦到样本上的物镜光学系统，用于分离所收集的检测光的检测光分离装置，用于检测聚焦检测光的检测器，设置在所述检测光之间的聚焦扫描装置 检测光分离装置和物镜光学系统以及设置在聚焦扫描装置和物镜光学系统之间的横向扫描装置，用于相对于光轴在正交方向扫描光。 焦点扫描装置还包括具有正和负透镜组的聚焦光学系统和用于移动一个透镜组以调整物镜光学系统的工作距离的透镜驱动装置。

公开(公告)号：US07383000B2

公开(公告)日：2008-06-03

申请号：US11277189

申请日：2006-03-22

申请人： Mitsuhiro Koumoto ,  Tadashi Hirata

发明人： Mitsuhiro Koumoto ,  Tadashi Hirata

IPC分类号： G03G21/16

CPC分类号： G03G21/1832 ,  G03G21/1842 ,  G03G2221/1612

摘要： When the user inserts an insertion end portion of an image forming unit covered with a protective cover into an attachment opening on an apparatus main unit along with a buffer sheet and a blackout sheet, the insertion end portion of an exterior cover sheet touches an exterior wall near the attachment opening for the image forming unit on the apparatus main unit. Thereby, the insertion operation of the image forming unit stops and one end of the image forming unit is held supported on the wall inside the opening.

摘要翻译： 当用户将覆盖有保护盖的图像形成单元的插入端部与缓冲片和遮光片一起插入设备主单元上的附接开口时，外盖片的插入端部接触外壁 靠近设备主单元上的图像形成单元的附接开口。 因此，图像形成单元的插入操作停止，并且图像形成单元的一端被保持支撑在开口内的壁上。

公开(公告)号：US20070255143A1

公开(公告)日：2007-11-01

申请号：US11790377

申请日：2007-04-25

申请人： Ikutoshi Fukushima ,  Tadashi Hirata ,  Masato Fujiwara

发明人： Ikutoshi Fukushima ,  Tadashi Hirata ,  Masato Fujiwara

IPC分类号： A61B6/00

CPC分类号： G02B23/2453 ,  G02B21/06 ,  G02B23/2469

摘要： An imaging apparatus includes an illumination light source emitting illumination light, a small-diameter image-transmitting portion, a distal end of which is placed near a specimen, an objective lens converging the illumination light to a proximal end of the image-transmitting portion, a light-detecting portion that detects light returned from the specimen via the image-transmitting portion and the objective lens, and a shield portion partially blocking the illumination light, the shield portion being disposed at near a pupil position of the objective lens or near a position optically conjugate with the pupil position so as to cover the illumination light path on one side in a radial direction. With this configuration, a sharp image with low noise can be obtained by preventing the occurrence of reflection at the proximal end of the image-transmitting portion and also by avoiding autofluorescene from being produced.

摘要翻译： 一种成像装置，包括发射照明光的照明光源，其远端放置在样本附近的小直径图像透射部分，将照明光会聚到图像传送部分的近端， 经由图像透射部和物镜检测从样本返回的光的光检测部和部分地遮挡照明光的遮蔽部，所述遮蔽部配置在物镜的瞳孔位置附近或靠近物镜 与光瞳位置光学共轭，以便在径向上覆盖一侧的照明光路。 利用这种结构，可以通过防止在图像透射部分的近端处发生反射并且还避免产生自发荧光而获得具有低噪声的清晰图像。