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    Ion beam device
    3.
    发明申请
    Ion beam device 失效
    离子束装置

    公开(公告)号：US20070114455A1

    公开(公告)日：2007-05-24

    申请号：US10581429

    申请日：2004-12-02

    申请人： Masao Naito ,  Hideki Fujita

    发明人： Masao Naito ,  Hideki Fujita

    IPC分类号： H01J37/08 ,  G21K5/10

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/1477 ,  H01J2237/053 ,  H01J2237/057

    摘要： An ion beam apparatus comprises an ion source 2 which extracts an ion beam 4, a mass separation electromagnet 6 which separates an ion beam 4 of desired mass from the ion beam 4 extracted from the ion source 2, a scanner 12 which scans the injected ion beam 4 with a given scan center as center within a given scan surface, an electrostatic deflector 30 which deflects the ion beam through 90° so that an ion beam of desired energy in said ion beam travels in a direction perpendicular to said scan surface within a circular-arc-shaped deflection zone centered on the scan center, and a scanning mechanism 54 which retains a target 50 and which mechanically, reciprocally moves the target 54 in a direction in which the target crosses the ion beam passed from the electrostatic deflector 30 at a given angle.

    摘要翻译： 离子束装置包括提取离子束4的离子源2，将离子源4与期望质量的离子束4从离子源2提取的离子束4分离的质量分离电磁体6，扫描注入离子 具有给定扫描中心的光束4作为给定扫描表面内的中心;静电偏转器30，其将离子束偏转90°，使得所述离子束中所需能量的离子束在垂直于所述扫描表面的方向上行进， 以扫描中心为中心的圆弧形偏转区，以及一个扫描机构54，该扫描机构54保持目标50，并且机械地使目标物54沿着方向从第一静电偏转器30穿过离子束的方向移动 给定的角度。

    Ion implanting apparatus
    4.
    发明申请
    Ion implanting apparatus 有权
    离子注入装置

    公开(公告)号：US20050253089A1

    公开(公告)日：2005-11-17

    申请号：US10845209

    申请日：2004-05-14

    申请人： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

    发明人： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

    IPC分类号： H01J37/317 ,  G01N21/00 ,  H01L21/265

    CPC分类号： H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/20228 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01L21/26513 ,  H01L21/2658

    摘要： The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slit 72 for selectively making the desired ion species pass through by cooperating with the mass separating magnet 36, and a substrate drive device 86 for reciprocatedly driving the substrate 82 in a direction substantially perpendicular to the sheet face 20s of the ion beam 20 within an irradiating area of the ion beam 20 which has passed through a separating slit 72.

    摘要翻译： 根据本发明的离子注入装置包括：用于产生包括所需离子种类的离子束20的离子源，并且成形为具有比衬底82的窄宽度更长的宽度的片材;质量分离磁体36，用于选择性地导出 通过在与其表面垂直的方向上弯曲离子束来形成期望的离子种类，通过与质量分离磁体36配合选择性地使期望的离子种类通过的分离狭缝72和用于往复驱动的衬底驱动装置86 基板82在离开光束20的已经通过分离狭缝72的照射区域内与离子束20的片表面20s基本垂直的方向。

    ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING
    5.
    发明申请
    ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING 有权
    离子束设备和采用磁性扫描的方法

    公开(公告)号：US20090261248A1

    公开(公告)日：2009-10-22

    申请号：US12301557

    申请日：2007-06-13

    申请人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    发明人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    IPC分类号： H01J49/00 ,  A61N5/00

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

    摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

    摘要翻译： 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单一原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

    Ion implanting apparatus
    6.
    发明授权
    Ion implanting apparatus 有权
    离子注入装置

    公开(公告)号：US07078714B2

    公开(公告)日：2006-07-18

    申请号：US10845209

    申请日：2004-05-14

    申请人： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton F. Glavish

    发明人： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton F. Glavish

    IPC分类号： H01J37/00

    CPC分类号： H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/20228 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01L21/26513 ,  H01L21/2658

    摘要： The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slit 72 for selectively making the desired ion species pass through by cooperating with the mass separating magnet 36, and a substrate drive device 86 for reciprocatedly driving the substrate 82 in a direction substantially perpendicular to the sheet face 20s of the ion beam 20 within an irradiating area of the ion beam 20 which has passed through a separating slit 72.

    摘要翻译： 根据本发明的离子注入装置包括：用于产生包括所需离子种类的离子束20的离子源，并且成形为具有比衬底82的窄宽度更长的宽度的片材;质量分离磁体36，用于选择性地导出 通过在与其表面垂直的方向上弯曲离子束来形成期望的离子种类，通过与质量分离磁体36配合选择性地使期望的离子种类通过的分离狭缝72和用于往复驱动的衬底驱动装置86 基板82在离开光束20的已经通过分离狭缝72的照射区域内与离子束20的片表面20s基本垂直的方向。

    Ion beam apparatus and method employing magnetic scanning
    8.
    发明授权
    Ion beam apparatus and method employing magnetic scanning 失效
    离子束装置和采用磁扫描的方法

    公开(公告)号：US08436326B2

    公开(公告)日：2013-05-07

    申请号：US12948298

    申请日：2010-11-17

    申请人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    发明人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    IPC分类号： H01J37/317 ,  H01J37/28 ,  H01L21/265

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

    摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

    摘要翻译： 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

    ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING
    9.
    发明申请
    ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING 失效
    离子束设备和采用磁性扫描的方法

    公开(公告)号：US20110089321A1

    公开(公告)日：2011-04-21

    申请号：US12948298

    申请日：2010-11-17

    申请人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    发明人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    IPC分类号： H01J49/00 ,  H01L21/265 ,  H01J37/317

    CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

    摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

    摘要翻译： 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

    Apparatus for shaping an metallic pull ring and simultaneously connecting it to a container closure
    10.
    发明授权
    Apparatus for shaping an metallic pull ring and simultaneously connecting it to a container closure 失效
    用于成形金属拉环并同时将其连接到容器封闭件的装置

    公开(公告)号：US4586863A

    公开(公告)日：1986-05-06

    申请号：US599666

    申请日：1984-04-12

    申请人： Kenji Morimoto ,  Tamotsu Ikegami ,  Masao Naito ,  Tateo Kubo ,  Shinichi Kizawa

    发明人： Kenji Morimoto ,  Tamotsu Ikegami ,  Masao Naito ,  Tateo Kubo ,  Shinichi Kizawa

    IPC分类号： B21D51/38 ,  B21D51/44

    CPC分类号： B21D51/383 ,  B21D51/44

    摘要： An apparatus for shaping a metallic pull ring and simultaneously connecting it to a container closure is disclosed. The apparatus includes a pre-shaped article former for shearing with a rotary shearing blade a rectangular metal blank from the end portion of a thin metal strip and simultaneously blending it to form an annular pre-shaped article having overlapped opposite ends, a closure feeder as well as a pre-shaped article feeder for continuously positioning a container closure and the pre-shaped article to a rotating support member in such a relation that the free end portion of a tear-off tab of the closure and a part of the pre-shaped article overlap each other and a pull ring shaper and connecter for curling the peripheral edge of the pre-shaped article in the radial direction to form it into a ring and simultaneously rolling the tear-off tab into said ring and connecting them to each other.

    摘要翻译： 公开了一种用于成形金属拉环并同时将其连接到容器封闭件的装置。 该装置包括预成形制品成形器，用于从旋转剪切刀片切割成薄金属条的端部的矩形金属坯料，并同时混合以形成具有重叠相对端的环形预成型制品，封闭进料器 以及用于将容器封闭件和预成形制品连续地定位到旋转的支撑构件的预成形制品馈送器，使得封闭件的撕开突片的自由端部分和预制件的一部分， 成形制品彼此重叠，以及拉环整形器和连接器，用于在径向方向上卷曲预成形制品的周边边缘以形成环，同时将撕开突片卷入所述环并将它们彼此连接 。