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64 条记录 (耗时 0.034 秒)

    Active spacecraft thermal control system and method
    1.
    发明授权
    Active spacecraft thermal control system and method 失效
    主动航天器热控制系统及方法

    公开(公告)号：US5954298A

    公开(公告)日：1999-09-21

    申请号：US842106

    申请日：1997-04-28

    申请人： Sibnath Basuthakur ,  Robert David Allen ,  Daniel David Miller

    发明人： Sibnath Basuthakur ,  Robert David Allen ,  Daniel David Miller

    IPC分类号： B64G1/40 ,  B64G1/50 ,  B64G1/58

    CPC分类号： B64G1/506 ,  B64G1/402 ,  B64G1/50 ,  B64G1/503

    摘要： A spacecraft (10) has combined propulsion and active thermal control systems. A propellant storage tank (20) couples to a pressurant storage tank (18). A working fluid (52) resides in the pressurant storage tank (18) and propels propellant when needed while concurrently acting as a thermal working fluid. The working fluid (52) is expanded then routed to selected cooled components (64). After passing by the cooled components (64), the working fluid (52) is compressed and passed by selected heated components (82). A controller (36) monitors temperature sensors (88) and controls valve assemblies (60, 78) to determine the components (64, 82) to which the working fluid (52) is routed.

    摘要翻译： 航天器（10）组合了推进和主动热控制系统。 推进剂储罐（20）联接到加压储存罐（18）。 工作流体（52）位于加压储存罐（18）中，并且当需要时推进推进剂同时充当热工作流体。 工作流体（52）膨胀然后被路由到选定的冷却部件（64）。 在被冷却的部件（64）通过之后，工作流体（52）被选定的加热部件（82）压缩并通过。 控制器（36）监测温度传感器（88）并且控制阀组件（60,78）以确定工作流体（52）所路由的部件（64,82）。

    Actively controlled thermal panel and method therefor
    2.
    发明授权
    Actively controlled thermal panel and method therefor 失效
    积极控制的热面板及其方法

    公开(公告)号：US6003817A

    公开(公告)日：1999-12-21

    申请号：US746587

    申请日：1996-11-12

    申请人： Sibnath Basuthakur ,  David Paul Bonello ,  Robert David Allen

    发明人： Sibnath Basuthakur ,  David Paul Bonello ,  Robert David Allen

    IPC分类号： B64G1/50 ,  B64G1/22 ,  B64G1/24

    CPC分类号： B64G1/50 ,  B64G1/503

    摘要： One or more deployable thermal panels (24, 28, 70) are actively controlled throughout the orbit of a satellite (20) to provide thermal dissipation. Adjusting the incident angle between the panel (24, 28, 70) and the sun and controlling the flow of fluid through optional flexible heat pipes loads and unloads heat to provide thermal stability for components (62) which have special thermal requirements. An optional antenna panel (70) on a nadir side (64) of the satellite (20) offers an antenna side (74) on one surface and a thermal radiating side (72) on an opposing surface. In addition, thermal panel movements are controlled (96) to provide counter-disturbance torques (140).

    摘要翻译： 在卫星（20）的整个轨道上主动地控制一个或多个可展开的散热板（24,28,70）以提供散热。 调整面板（24,28,70）与太阳之间的入射角度并通过可选的柔性热管来控制流体的流动，加载并卸载热量，以为具有特殊热量要求的部件（62）提供热稳定性。 在卫星（20）的最低侧（64）上的可选的天线面板（70）在一个表面上提供天线侧（74），在对置的表面上提供热辐射侧（72）。 此外，控制热板运动（96）以提供反扰动力矩（140）。

    POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER
    4.
    发明申请
    POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER 有权
    聚偏氟乙烯（POSS）和亲水性聚合物制成的聚合物薄膜

    公开(公告)号：US20110120940A1

    公开(公告)日：2011-05-26

    申请号：US12624605

    申请日：2009-11-24

    申请人： Robert David Allen ,  Young-Hye Na ,  Ratnam Sooriyakumaran

    发明人： Robert David Allen ,  Young-Hye Na ,  Ratnam Sooriyakumaran

    IPC分类号： B01D71/40 ,  C08J7/04

    CPC分类号： B01D69/12 ,  B01D69/125 ,  B01D71/70 ,  B01D71/82 ,  B01D2323/34 ,  B01D2325/20 ,  C08J7/18

    摘要： A composite membrane includes a filtration membrane and a layer on a surface of the filtration membrane. The layer includes a polymer including a polyhedral oligomeric silsesquioxane (POSS) derivative with a hydrophilic moiety attached to at least one vertex thereof. A method for making a composite membrane includes applying to a surface of a filtration membrane a photopolymerizable composition including a POSS compound, a hydrophilic comonomer, and a photoinitiator. The composition is cured to form a hydrophilic layer on the filtration membrane.

    摘要翻译： 复合膜包括过滤膜和过滤膜表面上的层。 该层包括聚合物，其包括具有连接到其至少一个顶点的亲水部分的多面体低聚倍半硅氧烷（POSS）衍生物。 制造复合膜的方法包括向过滤膜的表面施加包含POSS化合物，亲水性共聚单体和光引发剂的光聚合性组合物。 固化组合物以在过滤膜上形成亲水层。

    Negative resists based on acid-catalyzed elimination of polar molecules
    5.
    发明授权
    Negative resists based on acid-catalyzed elimination of polar molecules 失效
    基于酸催化消除极性分子的负电阻

    公开(公告)号：US07393624B2

    公开(公告)日：2008-07-01

    申请号：US11820862

    申请日：2007-06-20

    申请人： Robert David Allen ,  Gregory Breyta ,  Phillip Joe Brock ,  Richard A. DiPietro ,  David R. Medeiros ,  Ratnam Sooriyakumaran

    发明人： Robert David Allen ,  Gregory Breyta ,  Phillip Joe Brock ,  Richard A. DiPietro ,  David R. Medeiros ,  Ratnam Sooriyakumaran

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0046 ,  C08F220/24 ,  C08F222/06 ,  C08F232/08 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395

    摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

    摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。

    Lithographic photoresist composition and process for its use in the manufacture of integrated circuits
    8.
    发明授权
    Lithographic photoresist composition and process for its use in the manufacture of integrated circuits 失效
    平版光刻胶组合物及其在制造集成电路中的应用

    公开(公告)号：US06165678A

    公开(公告)日：2000-12-26

    申请号：US111558

    申请日：1998-07-08

    申请人： Robert David Allen ,  Richard Anthony DiPietro ,  Ratnam Sooriyakumaran ,  Thomas I. Wallow ,  Gregory Michael Wallraff

    发明人： Robert David Allen ,  Richard Anthony DiPietro ,  Ratnam Sooriyakumaran ,  Thomas I. Wallow ,  Gregory Michael Wallraff

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A novel radiation-sensitive lithographic photoresist composition is provided which has improved sensitivity and resolution. The composition comprises a photosensitive acid generator and an acrylate or methacrylate copolymer. The copolymer contains first monomeric units having polar pendant groups and second monomeric units containing photoacid-cleavable ester groups. The polar pendant groups preferably comprise C.sub.6 -C.sub.12 alicyclic substituents containing a polar moiety R*, wherein the alicyclic substituents are bound through a linker moiety to the polymer backbone. Other monomeric units may be included as well. A process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like.

    摘要翻译： 提供了一种具有改进的灵敏度和分辨率的新型辐射敏感平版印刷光刻胶组合物。 该组合物包含光敏酸产生剂和丙烯酸酯或甲基丙烯酸酯共聚物。 共聚物含有具有极性侧基的第一单体单元和含有光可酸裂解酯基的第二单体单元。 极性侧基优选包含含有极性部分R *的C6-C12脂环族取代基，其中脂环取代基通过连接体部分结合至聚合物主链。 也可以包括其它单体单元。 一种使用该组合物在基板上生成抗蚀剂图像，即集成电路等的制造方法。