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1.发明授权公开(公告)号：US08581975B2
公开(公告)日：2013-11-12
申请号：US12304520
申请日：2007-06-18
IPC分类号： H04N7/18
CPC分类号： G06T7/0004 , G06T2207/30164
摘要： A pulsed thermography defect detection apparatus including active and passive infrared (IR) thermography for non-destructive testing (NDT) of powdermetallic (P/M) components for on-line and off-line inspection.
摘要翻译： 一种脉冲热成像缺陷检测装置，包括用于在线和离线检查的粉末金属（P / M）部件的无损检测（NDT）的主动和被动红外（IR）热成像。
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2.发明申请公开(公告)号：US20100033565A1
公开(公告)日：2010-02-11
申请号：US12304520
申请日：2007-06-18
CPC分类号： G06T7/0004 , G06T2207/30164
摘要： A pulsed thermography defect detection apparatus including active and passive infrared (IR) thermography for non-destructive testing (NDT) of powdermetallic (P/M) components for on-line and off-line inspection.
摘要翻译： 一种脉冲热成像缺陷检测装置，包括用于在线和离线检查的粉末金属（P / M）组分的无损检测（NDT）的主动和被动红外（IR）热成像。
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公开(公告)号：US20120035766A1
公开(公告)日：2012-02-09
申请号：US12852375
申请日：2010-08-06
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01L21/3065 , H05B31/26 , G05B13/02 , H01J61/28
CPC分类号： H01J37/32174 , H01J37/321 , H01J37/3244 , H01J37/32467 , H01J37/32642 , H01J37/3266 , H01J2237/334
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.
摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组，多个铁氧体，其中环等离子体室穿过将等离子体室耦合到处理室的每个铁氧体和多个等离子体室出口。 每个等离子体室出口具有相应的等离子体限制。 还描述了用于产生等离子体的系统和方法。
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4.发明申请公开(公告)号：US20140096908A1
公开(公告)日：2014-04-10
申请号：US13649103
申请日：2012-10-10
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01J37/32
CPC分类号： H01J37/32431 , H01J37/321 , H01J37/32669
摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
摘要翻译： 处理室包括处理室顶部中的多个等离子体源。 每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。 还描述了等离子体处理系统。 还描述了等离子体处理的方法。
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公开(公告)号：US08659335B2
公开(公告)日：2014-02-25
申请号：US12491538
申请日：2009-06-25
申请人： Siddharth Nagarkatti , Feng Tian , David Lam , Abdul Rashid , Souheil Benzerrouk , Ilya Bystryak , David Menzer , Jack J. Schuss , Jesse E. Ambrosina
发明人： Siddharth Nagarkatti , Feng Tian , David Lam , Abdul Rashid , Souheil Benzerrouk , Ilya Bystryak , David Menzer , Jack J. Schuss , Jesse E. Ambrosina
IPC分类号： H03K3/00
CPC分类号： H03K5/01 , H03F3/189 , H03F3/217 , H03F2200/105 , H03F2200/375 , H03F2200/387 , H03G3/3047
摘要： A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.
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公开(公告)号：US09155181B2
公开(公告)日：2015-10-06
申请号：US12852352
申请日：2010-08-06
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01L21/306 , C23C16/00 , H05H1/46 , H01J37/32
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H2001/4652 , H05H2001/4682
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。
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公开(公告)号：US08999104B2
公开(公告)日：2015-04-07
申请号：US12852364
申请日：2010-08-06
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
CPC分类号： H01J37/32449 , H01J37/32422 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334
摘要： A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
摘要翻译： 等离子体源包括多个环等离子体室，多个初级绕组，多个铁氧体和一个控制系统。 每个初级绕组缠绕在环形等离子体室的外部一个周围。 多个环形等离子体室中的每一个穿过多个铁氧体的相应部分。 控制系统耦合到每个环形等离子体室。 还描述了用于产生和使用等离子体的系统和方法。
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公开(公告)号：US10283325B2
公开(公告)日：2019-05-07
申请号：US13649103
申请日：2012-10-10
申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号： H01J37/32
摘要： A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
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9.发明授权Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator 有权提供功率以在反应性气体发生器中点燃和维持等离子体的方法和装置公开(公告)号：US08692466B2
公开(公告)日：2014-04-08
申请号：US12394904
申请日：2009-02-27
申请人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
发明人： Souheil Benzerrouk , Siddharth P. Nagarkatti , Andrew Cowe , Ali Shajii , Jesse E. Ambrosina , Ken Tran , Xing Chen
IPC分类号： H01J7/24
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译： 描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。 从点火电源向等离子体点火电路供电。 测量等离子体点火电路的预点火信号。 基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。 经过一段时间后，调节可调节点火控制信号。
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公开(公告)号：US08624501B2
公开(公告)日：2014-01-07
申请号：US12963209
申请日：2010-12-08
IPC分类号： H01J7/24
CPC分类号： H01J37/32935 , H01J37/321 , H01J37/32174
摘要： Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.
摘要翻译： 描述了用于测量和控制等离子体发生器参数的方法，系统和计算机程序产品。 测量产生等离子体的变压器或电感元件的初级绕组中的电流。 测量变压器或电感元件的次级绕组两端的电压。 基于初级绕组的电流和次级绕组两端的电压，确定等离子体的参数。 该参数包括与等离子体相关联的电阻值，与等离子体相关联的功率值或两者。
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