Nanowire transistor and method for fabricating the same
    2.
    发明授权
    Nanowire transistor and method for fabricating the same 有权
    纳米线晶体管及其制造方法

    公开(公告)号:US08368049B2

    公开(公告)日:2013-02-05

    申请号:US13399521

    申请日:2012-02-17

    IPC分类号: H01L29/06 H01L31/00

    摘要: A nanowire transistor according to the present invention includes: at least one nanowire 13 including a core portion 13a that functions as a channel region and an insulating shell portion 13b that covers the surface of the core portion 13a; source and drain electrodes 14 and 15, which are connected to the nanowire 13; and a gate electrode 21 for controlling conductivity in at least a part of the core portion 13a of the nanowire 13. The core portion 13a is made of semiconductor single crystals including Si and has a cross section with a curved profile on a plane that intersects with the longitudinal axis thereof. The insulating shell portion 13b is made of an insulator including Si and functions as at least a portion of a gate insulating film.

    摘要翻译: 根据本发明的纳米线晶体管包括:至少一个纳米线13,其包括用作沟道区的芯部13a和覆盖芯部13a的表面的绝缘壳部13b; 源极和漏极14和15,其连接到纳米线13; 以及用于控制纳米线13的芯部13a的至少一部分的导电性的栅电极21.芯部13a由包含Si的半导体单晶制成,并且在与 其纵轴。 绝缘外壳部分13b由包括Si的绝缘体制成,并且起到至少一部分栅极绝缘膜的作用。

    NANOWIRE TRANSISTOR AND METHOD FOR FABRICATING THE SAME
    3.
    发明申请
    NANOWIRE TRANSISTOR AND METHOD FOR FABRICATING THE SAME 有权
    纳米晶体管及其制造方法

    公开(公告)号:US20120156833A1

    公开(公告)日:2012-06-21

    申请号:US13399521

    申请日:2012-02-17

    IPC分类号: H01L21/336

    摘要: A nanowire transistor according to the present invention includes: at least one nanowire 13 including a core portion 13a that functions as a channel region and an insulating shell portion 13b that covers the surface of the core portion 13a; source and drain electrodes 14 and 15, which are connected to the nanowire 13; and a gate electrode 21 for controlling conductivity in at least a part of the core portion 13a of the nanowire 13. The core portion 13a is made of semiconductor single crystals including Si and has a cross section with a curved profile on a plane that intersects with the longitudinal axis thereof. The insulating shell portion 13b is made of an insulator including Si and functions as at least a portion of a gate insulating film.

    摘要翻译: 根据本发明的纳米线晶体管包括:至少一个纳米线13,其包括用作沟道区的芯部13a和覆盖芯部13a的表面的绝缘壳部13b; 源极和漏极14和15,其连接到纳米线13; 以及用于控制纳米线13的芯部13a的至少一部分的导电性的栅电极21.芯部13a由包含Si的半导体单晶制成,并且在与 其纵轴。 绝缘外壳部分13b由包括Si的绝缘体制成,并且起到至少一部分栅极绝缘膜的作用。

    Vertical field effect transistor using linear structure as a channel region and method for fabricating the same
    7.
    发明授权
    Vertical field effect transistor using linear structure as a channel region and method for fabricating the same 有权
    使用线性结构作为沟道区域的垂直场效应晶体管及其制造方法

    公开(公告)号:US07586130B2

    公开(公告)日:2009-09-08

    申请号:US11344574

    申请日:2006-02-01

    IPC分类号: H01L29/732

    摘要: A vertical field effect transistor includes: an active region with a bundle of linear structures functioning as a channel region; a lower electrode, functioning as one of source and drain regions; an upper electrode, functioning as the other of the source and drain regions; a gate electrode for controlling the electric conductivity of at least a portion of the bundle of linear structures included in the active region; and a gate insulating film arranged between the active region and the gate electrode to electrically isolate the gate electrode from the bundle of linear structures. The transistor further includes a dielectric portion between the upper and lower electrodes. The upper electrode is located over the lower electrode with the dielectric portion interposed and includes an overhanging portion sticking out laterally from over the dielectric portion. The active region is located right under the overhanging portion of the upper electrode.

    摘要翻译: 垂直场效应晶体管包括:具有用作沟道区的线性结构束的有源区; 用作源极和漏极区之一的下电极; 上电极,用作源极和漏极区域中的另一个; 用于控制所述有源区域中包括的所述线性结构束的至少一部分的电导率的栅电极; 以及栅极绝缘膜,其布置在所述有源区和所述栅电极之间,以将所述栅电极与所述线结构的束电隔离。 晶体管还包括在上电极和下电极之间的电介质部分。 上电极位于下电极的上方,电介质部分插入,并且包括从电介质部分的上方横向突出的突出部分。 有源区域位于上电极的伸出部分正下方。

    Bipolar transistor and method for fabricating the same
    8.
    发明授权
    Bipolar transistor and method for fabricating the same 有权
    双极晶体管及其制造方法

    公开(公告)号:US07091099B2

    公开(公告)日:2006-08-15

    申请号:US10807307

    申请日:2004-03-24

    IPC分类号: H01L21/331

    CPC分类号: H01L29/66242 H01L29/7378

    摘要: A bipolar transistor includes a Si single crystalline layer serving as a collector, a single crystalline Si/SiGeC layer and a polycrystalline Si/SiGeC layer which are formed on the Si single crystalline layer, an oxide film having an emitter opening portion, an emitter electrode, and an emitter layer. An intrinsic base layer is formed on the single crystalline Si/SiGeC layer, part of the single crystalline Si/SiGeC layer, the polycrystalline Si/SiGeC layer and the Co silicide layer together form an external base layer. The thickness of the emitter electrode is set so that boron ions implanted into the emitter electrode and diffused therein do not reach an emitter-base junction portion.

    摘要翻译: 双极晶体管包括形成在Si单晶层上的Si单结晶层,单晶Si / SiGeC层和多晶Si / SiGeC层,具有发射极开口部分的氧化膜,发射极 ,和发射极层。 在单晶Si / SiGeC层上形成本征基层,单晶Si / SiGeC层的一部分,多晶Si / SiGeC层和Co硅化物层一起形成外部基极层。 发射电极的厚度被设定为使得注入发射电极并在其中扩散的硼离子不会到达发射极 - 基极接合部分。