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12 条记录 (耗时 0.045 秒)

    Fire resistant resin compositions
    2.
    发明授权
    Fire resistant resin compositions 失效
    耐火树脂组合物

    公开(公告)号：US5618865A

    公开(公告)日：1997-04-08

    申请号：US577357

    申请日：1995-12-22

    申请人： Marvin M. Martens ,  Robert V. Kasowski

    发明人： Marvin M. Martens ,  Robert V. Kasowski

    IPC分类号： C08K5/00 ,  C08K5/3492 ,  C08K5/34

    CPC分类号： C08K5/34928 ,  C08K5/0066

    摘要： This invention relates to flame retardants for polyester and polyamide compositions, and specifically relates to compositions containing (1) about 30 to about 70 weight percent of a polyester or a synthetic, aliphatic polyamide; (2) about 15 to about 40 weight percent of glass or mineral reinforcing agent; and (3) a flame retardant of (a) about 20 to about 30 weight percent of melamine phosphate and up to about 10 weight percent of a charring catalyst; (b) about 15 to about 30 weight percent of melamine phosphate, up to about 10 weight percent of a charring catalyst and up to about 10 weight percent of a char former; (c) about 25 to about 30 weight percent of melamine pyrophosphate; (d) about 15 to about 30 weight percent of melamine pyrophosphate and up to about 10 weight percent of a charring catalyst; or (e) about 15 to about 30 weight percent of melamine pyrophosphate, up to about 10 weight percent of a charring catalyst and up to about 10 weight percent of a char former, wherein all percents by weight are based on the total weight of (1)+(2)+(3) only.

    摘要翻译： 本发明涉及用于聚酯和聚酰胺组合物的阻燃剂，具体涉及含有（1）约30至约70重量％的聚酯或合成的脂族聚酰胺的组合物; （2）约15至约40重量％的玻璃或矿物增强剂; 和（3）阻燃剂（a）约20至约30重量％的磷酸三聚氰胺和至多约10重量％的炭化催化剂; （b）约15至约30重量％的磷酸三聚氰胺，至多约10重量％的炭化催化剂和至多约10重量％的炭化剂; （c）约25至约30重量％的焦磷酸三聚氰胺; （d）约15至约30重量％的焦磷酸三聚氰胺和至多约10重量％的炭化催化剂; 或（e）约15至约30重量％的焦磷酸三聚氰胺，至多约10重量％的炭化催化剂和至多约10重量％的炭形成剂，其中所有百分比均为基于（ 1）+（2）+（3）。

    Electron beam lithography
    5.
    发明授权
    Electron beam lithography 失效
    电子束光刻

    公开(公告)号：US5409801A

    公开(公告)日：1995-04-25

    申请号：US228171

    申请日：1994-04-15

    申请人： Robert V. Kasowski ,  Sau L. Tang

    发明人： Robert V. Kasowski ,  Sau L. Tang

    IPC分类号： G03F7/038 ,  G03F7/09 ,  G03F7/20 ,  G03F7/00

    CPC分类号： G03F7/094 ,  G03F7/038 ,  G03F7/2059 ,  Y10S430/11 ,  Y10S430/112 ,  Y10S430/143

    摘要： A method for improving the resolution of an electron resist pattern on a substrate coated with a polymeric electron resist film is disclosed which provides an external coating layer of dried polymer selected from the group consisting of water-soluble polymers and poly(m-phenylene isophthalamide), or of a mixture consisting essentially of said dried polymer and hexavalent tungsten compounds wherein the weight ratio of the tungsten compounds to polymer is up to about 1:1. Also disclosed are substrates coated with a polymeric resist film wherein the resist film consists essentially of such external layers, or wherein an external coating layer of said polymer-tungsten compound mixture is provided.

    摘要翻译： 公开了一种用于提高涂覆有聚合物电子抗蚀剂膜的基底上的电子抗蚀剂图案的分辨率的方法，其提供了选自水溶性聚合物和聚（间亚苯基间苯二甲酰胺）的干燥聚合物的外部涂层， ，或基本上由所述干燥的聚合物和六价钨化合物组成的混合物，其中钨化合物与聚合物的重量比高达约1:1。 还公开了涂覆有聚合物抗蚀剂膜的基材，其中抗蚀剂膜基本上由这样的外层组成，或者其中提供所述聚合物 - 钨化合物混合物的外涂层。