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    Poly-phased inductively coupled plasma source
    1.
    发明授权
    Poly-phased inductively coupled plasma source 有权

    公开(公告)号：US10431425B2

    公开(公告)日：2019-10-01

    申请号：US15084143

    申请日：2016-03-29

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka

    IPC: H01J37/32

    Abstract: Embodiments of systems and methods for a poly-phased inductively coupled plasma source are described. In an embodiment, a system may include a metal source configured to supply a metal for ionized physical vapor deposition on a substrate in a process chamber. The system may also include a high-density plasma source configured to generate a dense plasma, the high-density plasma source comprising a plurality of inductively coupled antennas. Additionally, the system may include a substrate bias source configured to provide a potential necessary to thermalize and ionize the plasma. In such embodiments, each antenna is configured to receive power at a phase orientation determined according to a phase arrangement.

    Poly-phased Inductively Coupled Plasma Source
    3.
    发明申请
    Poly-phased Inductively Coupled Plasma Source 审中-公开

    公开(公告)号：US20170243720A1

    公开(公告)日：2017-08-24

    申请号：US15084143

    申请日：2016-03-29

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka

    IPC: H01J37/32

    CPC classification number: H01J37/3211 ,  H01J37/32128 ,  H01J37/32183

    Abstract: Embodiments of systems and methods for a poly-phased inductively coupled plasma source are described. In an embodiment, a system may include a metal source configured to supply a metal for ionized physical vapor deposition on a substrate in a process chamber. The system may also include a high-density plasma source configured to generate a dense plasma, the high-density plasma source comprising a plurality of inductively coupled antennas. Additionally, the system may include a substrate bias source configured to provide a potential necessary to thermalize and ionize the plasma. In such embodiments, each antenna is configured to receive power at a phase orientation determined according to a phase arrangement.

    METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD
    5.
    发明申请
    METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD 审中-公开
    清洁FACVD中的纤维和反应器内部的方法

    公开(公告)号：US20150044390A1

    公开(公告)日：2015-02-12

    申请号：US14525902

    申请日：2014-10-28

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka ,  Osayuki Akiyama

    IPC: C23C16/44 ,  C23C16/52 ,  H01J37/32 ,  C23C16/503

    CPC classification number: C23C16/4405 ,  B08B7/0035 ,  C23C16/46 ,  C23C16/503 ,  C23C16/52 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32449 ,  H01J37/32862 ,  H01J37/32889

    Abstract: A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film forming material. The method also includes cleaning the heater assembly, or an interior surface of the reactor, or both. During the cleaning, an alternating current is supplied to the heater assembly to energize a cleaning media into a plasma.

    Abstract translation: 一种操作细丝辅助化学气相沉积（FACVD）系统的方法。 该方法包括在FACVD系统的反应器中的衬底上沉积膜。 在沉积期间，向加热器组件供应直流电力以热分解成膜材料。 该方法还包括清洁加热器组件或反应器的内表面，或两者。 在清洁期间，向加热器组件供应交流电，以将清洁介质激励到等离子体中。

    Methods and systems for dielectrophoresis (DEP) separation
    6.
    发明授权
    Methods and systems for dielectrophoresis (DEP) separation 有权

    公开(公告)号：US10413913B2

    公开(公告)日：2019-09-17

    申请号：US15433633

    申请日：2017-02-15

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka

    IPC: B03C5/02 ,  C12M1/00 ,  B03C5/00

    Abstract: One or more electrodes are attached to an electrically permeable substrate attached to an incubator and energized with A.C. signals, D.C. signals or both A.C. and D.C signals. E-fields emitted from the electrodes pass through the substrate and into the incubator. The e-fields generate or apply dielectrophoresis (DEP) forces on small particles suspended in a liquid inside the incubator. The strength and direction of the DEP forces are controlled and manipulated by the manipulating the signals and can manipulate the motion of the suspended particles. The shapes of the electrodes help shape the generated e-fields and facilitate complex movements of the suspended particles. The suspended particles can be stem cells in a nutrient rich solution.

    Methods and Systems for Dielectrophoresis (DEP) Separation
    8.
    发明申请
    Methods and Systems for Dielectrophoresis (DEP) Separation 审中-公开

    公开(公告)号：US20180229246A1

    公开(公告)日：2018-08-16

    申请号：US15433633

    申请日：2017-02-15

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka

    IPC: B03C5/02 ,  C12M1/00

    CPC classification number: B03C5/028 ,  B03C5/005 ,  B03C5/026 ,  B03C2201/26 ,  C12M47/04

    Abstract: One or more electrodes are attached to an electrically permeable substrate attached to an incubator and energized with A.C. signals, D.C. signals or both A.C. and D.C signals. E-fields emitted from the electrodes pass through the substrate and into the incubator. The e-fields generate or apply dielectrophoresis (DEP) forces on small particles suspended in a liquid inside the incubator. The strength and direction of the DEP forces are controlled and manipulated by the manipulating the signals and can manipulate the motion of the suspended particles. The shapes of the electrodes help shape the generated e-fields and facilitate complex movements of the suspended particles. The suspended particles can be stem cells in a nutrient rich solution.

    METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION BY AN ELECTRIC FIELD
    9.
    发明申请
    METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION BY AN ELECTRIC FIELD 审中-公开
    用于控制电场的图案和结构形成的方法和装置

    公开(公告)号：US20150152556A1

    公开(公告)日：2015-06-04

    申请号：US14577013

    申请日：2014-12-19

    Applicant: Tokyo Electron Limited

    Inventor： Jozef Brcka ,  Eric M. Lee ,  Jacques Faguet ,  Hongyu Henry Yue

    IPC: C23C16/50 ,  C23C16/04 ,  C23C16/48

    CPC classification number: C23C16/50 ,  A61F2/00 ,  B03C5/005 ,  B03C5/026 ,  C12M3/00 ,  C12M21/08 ,  C12M33/00 ,  C23C16/04 ,  C23C16/48 ,  H01J37/32009 ,  H01J37/32697 ,  H01L21/02612 ,  H01L21/67011

    Abstract: A processing method and apparatus uses at least one electric field applicator (34) biased to produce a spatial-temporal electric field to affect a processing medium (26), suspended nano-objects (28) or the substrate (30) in processing, interacting with the dipole properties of the medium (26) or particles to construct structure on the substrate (30). The apparatus may include a magnetic field, an acoustic field, an optical force, or other generation device. The processing may affect selective localized layers on the substrate (30) or may control orientation of particles in the layers, control movement of dielectrophoretic particles or media, or cause suspended particles of different properties to follow different paths in the processing medium (26). Depositing or modifying a layer on the substrate (30) may be carried out. Further, the processing medium (26) and electrical bias may be selected to prepare at least one layer on the substrate (30) for bonding the substrate (30) to a second substrate, or to deposit carbon nanotubes (CNTs) with a controlled orientation on the substrate.

    Abstract translation: 处理方法和装置使用至少一个电场施加器（34），其被偏置以产生空间 - 时间电场，以影响处理介质（26），悬浮的纳米物体（28）或基板（30）在处理中相互作用 其中介质（26）或颗粒的偶极子性质在衬底（30）上构造结构。 该装置可以包括磁场，声场，光学力或其他生成装置。 处理可能影响基底（30）上的选择性局部层，或者可以控制层中的颗粒的取向，控制介电电泳颗粒或介质的移动，或引起不同性质的悬浮颗粒遵循处理介质（26）中的不同路径。 可以在衬底（30）上沉积或修饰一层。 此外，可以选择处理介质（26）和电偏压以在衬底（30）上制备用于将衬底（30）结合到第二衬底的至少一个层，或者以受控的方向沉积碳纳米管（CNT） 在基板上。

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