Process for producing silicon single crystal
    1.
    发明申请
    Process for producing silicon single crystal 有权
    硅单晶生产工艺

    公开(公告)号:US20070017434A1

    公开(公告)日:2007-01-25

    申请号:US11486508

    申请日:2006-07-14

    CPC分类号: C30B15/04 C30B29/06

    摘要: A process for producing a silicon single crystal includes the steps of bringing a seed crystal into contact with a silicon melt, gradually pulling the seed crystal from the melt so as to form a neck having a tapered portion and a constant diameter portion, then pulling a silicon single crystal. The atmosphere used during neck formation is a hydrogen-containing atmosphere prepared by adding a hydrogen-containing substance to an inert gas. The hydrogen-containing substance has a hydrogen gas equivalent concentration in the hydrogen-containing atmosphere of 3 to 20%.

    摘要翻译: 制造硅单晶的方法包括使晶种与硅熔体接触的步骤,从熔体中逐渐拉晶晶,以形成具有锥形部分和恒定直径部分的颈部,然后拉动 硅单晶。 在颈部形成期间使用的气氛是通过向惰性气体中加入含氢物质制备的含氢气氛。 含氢物质在含氢气氛中的氢气当量浓度为3〜20%。

    Process for producing silicon single crystal
    2.
    发明授权
    Process for producing silicon single crystal 有权
    硅单晶生产工艺

    公开(公告)号:US07628854B2

    公开(公告)日:2009-12-08

    申请号:US11486508

    申请日:2006-07-14

    IPC分类号: C30B15/20

    CPC分类号: C30B15/04 C30B29/06

    摘要: A process for producing a silicon single crystal includes the steps of bringing a seed crystal into contact with a silicon melt, gradually pulling the seed crystal from the melt so as to form a neck having a tapered portion and a constant diameter portion, then pulling a silicon single crystal. The atmosphere used during neck formation is a hydrogen-containing atmosphere prepared by adding a hydrogen-containing substance to an inert gas. The hydrogen-containing substance has a hydrogen gas equivalent concentration in the hydrogen-containing atmosphere of 3 to 20%.

    摘要翻译: 制造硅单晶的方法包括使晶种与硅熔体接触的步骤,从熔体中逐渐拉晶晶,以形成具有锥形部分和恒定直径部分的颈部,然后拉动 硅单晶。 在颈部形成期间使用的气氛是通过向惰性气体中加入含氢物质制备的含氢气氛。 含氢物质在含氢气氛中的氢气当量浓度为3〜20%。

    Drug transferring needle and drug transferring method
    3.
    发明授权
    Drug transferring needle and drug transferring method 有权
    药物转移针和药物转移方法

    公开(公告)号:US09254243B2

    公开(公告)日:2016-02-09

    申请号:US14008808

    申请日:2012-03-14

    IPC分类号: A61J1/20 A61M5/162

    CPC分类号: A61J1/2096 A61M5/162

    摘要: A drug transferring needle includes a needle base portion, a first needle portion having therein an air passage, and a second needle portion longer than the first needle portion and arranged parallel to the first needle portion. In the first needle portion, a first air vent being one end of the air passage is provided on a distal end side of the second needle portion from a second air vent being the other end of the air passage. In the second needle portion, one end of a liquid passage is connected to the inside of the needle base portion, and the other end thereof is a liquid pass opening of the second needle portion. The second needle portion has a distal end having the liquid pass opening, a base portion connected to the needle base portion, and an intermediate portion connecting the distal end and the base portion.

    摘要翻译: 药物传送针包括针基部,其中具有空气通道的第一针部分和比第一针部长并且平行于第一针部分布置的第二针部分。 在第一针部中,作为空气通路的另一端的第二排气口在第二针部的前端侧设置有作为空气通路一端的第一排气口。 在第二针部中,液体通路的一端与针基部的内侧连接,另一端为第二针部的液体通过口。 第二针部具有具有液体通过口的远端,与针基部连接的基部,以及连接前端和基部的中间部。

    Waveguide structure and optical device
    4.
    发明授权
    Waveguide structure and optical device 有权
    波导结构和光学器件

    公开(公告)号:US07787735B2

    公开(公告)日:2010-08-31

    申请号:US11822542

    申请日:2007-07-06

    IPC分类号: G02B6/10

    CPC分类号: G02B6/1226 B82Y20/00

    摘要: There is disclosed a waveguide structure that propagates surface plasmon waves, comprising: a quantum well structure, disposed on a semiconductor substrate; wherein the quantum well structure has a quantum well layer, in turn having an intersecting region that intersects a hypothetical plane substantially orthogonal to an alignment direction of the quantum well structure with respect to the semiconductor substrate, and a real part of a dielectric constant of the quantum well structure is negative for THz waves of a predetermined wavelength.

    摘要翻译: 公开了传播表面等离子体波的波导结构,包括:量子阱结构,设置在半导体衬底上; 其中所述量子阱结构具有量子阱层,其又具有与基本上正交于所述量子阱结构相对于所述半导体衬底的取向方向的假想平面相交的交叉区域,以及所述量子阱结构的介电常数的实部 量子阱结构对于预定波长的THz波是负的。

    MICRO-LIQUID TRANSFER APPARATUS AND MICRO-LIQUID TRANSFER METHOD
    5.
    发明申请
    MICRO-LIQUID TRANSFER APPARATUS AND MICRO-LIQUID TRANSFER METHOD 失效
    微液体转移装置和微液体转移方法

    公开(公告)号:US20090241699A1

    公开(公告)日:2009-10-01

    申请号:US12403448

    申请日:2009-03-13

    IPC分类号: G01N1/00

    CPC分类号: G01N35/1004 G01N2035/1037

    摘要: In a micro-liquid transfer apparatus including two washing tanks (first washing tanks A and B), operations to transfer a sample are carried out using two pin tools (pin tools A and B) alternately. While one pin tool A is being mounted on a pin tool holder and is being used to transfer a liquid, the other pin tool B is waiting in a state where the lower end portions of their associated pins are immersed in the first washing tank B. While one pin tool A is being mounted on a pin tool holder and is being used to transfer a very small amount of liquid, the lower end portions of the respective pins of the other pin tool are washed, whereby the liquid transfer operations can be made in progress with no interruption and thus the generation of the operation waiting time can be prevented.

    摘要翻译: 在包括两个洗涤槽(第一洗涤槽A和B)的微液体传送设备中,传送样品的操作使用两个针工具(针工具A和B)交替进行。 当一个针工具A被安装在销刀架上并用于传送液体时,另一个销工具B在其相关销的下端部浸入第一洗涤槽B的状态下等待。 当一个针工具A被安装在销刀架上并被用于传送非常少量的液体时,另一个针工具的各个销的下端部被洗涤,从而可以进行液体转移操作 正在进行而不中断,从而可以防止产生操作等待时间。

    Micro plate treating device and micro plate carrying method
    6.
    发明授权
    Micro plate treating device and micro plate carrying method 有权
    微板处理装置和微板承载方法

    公开(公告)号:US07485465B2

    公开(公告)日:2009-02-03

    申请号:US10549149

    申请日:2005-04-05

    IPC分类号: G01N35/02 G01N35/04

    摘要: In a microplate processing apparatus that removes lid (11) of microplate (10) conveyed by microplate conveying mechanism (3) to perform a dispensing process by dispensing head (8), and that attaches lid (11) after the dispensing process is completed, lid (11) removed by lid removing mechanism (6) at first position (P1) is conveyed to third position (P3) located downstream, by microplate conveying mechanism (3), to be held by lid attaching mechanism (9), and then lid (11) is attached to microplate (10) having been conveyed to third position (P3), after the dispensing process is completed, while microplate (10) with this lid (11) having been attached is being lifted to processing position (P4) above microplate conveying mechanism (3), by microplate stage (12).

    摘要翻译: 在微孔板处理装置中,除去由微孔板输送机构(3)输送的微板(10)的盖(11),以通过分配头(8)进行分配处理,并且在分配过程完成之后附着盖(11) 通过盖板拆卸机构(6)在第一位置(P1)移除的盖子(11)通过微孔板输送机构(3)输送到位于下游的第三位置(P3),由盖子安装机构(9)保持,然后 在分配过程完成之后,将具有已经被附接的盖子(11)的微孔板(10)提升到处理位置(P4),将盖子(11)连接到已经被输送到第三位置(P3)的微孔板(10) )微孔板输送机构(3),微板台(12)。

    IC card and method of manufacturing the same
    7.
    发明授权
    IC card and method of manufacturing the same 有权
    IC卡及其制造方法

    公开(公告)号:US07120029B2

    公开(公告)日:2006-10-10

    申请号:US10668187

    申请日:2003-09-24

    IPC分类号: H05K1/14

    摘要: The productivity of an IC card is to be improved. In a memory card of the type in which a memory body having a wiring substrate and a semiconductor chip mounted on a main surface of the wiring substrate is held so as to be sandwiched in between a first case and a second case, a planar outline of the memory body is smaller than half of a planar outline of the memory card. The memory body is disposed so as to be positioned closer to a first end side as one short side of the memory card with respect to a midline between the first end side and a second end side as an opposite short side of the memory card positioned on the side opposite to the first end side. The other area than the memory body-disposed area in the first and the second case is used as another functional area.

    摘要翻译: 提高IC卡的生产率。 在其中具有布线基板的存储体和安装在布线基板的主表面上的半导体芯片被夹持在第一壳体和第二壳体之间的类型的存储卡中,平面轮廓 存储器体小于存储卡的平面轮廓的一半。 存储体被布置成相对于位于第一端侧和第二端侧之间的中线的位置,更靠近作为存储卡的一个短边的第一端侧,作为位于存储卡的相对的短边 与第一端侧相对的一侧。 将第一和第二种情况下的存储体配置区域以外的区域用作另一功能区域。

    Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus

    公开(公告)号:US06624430B2

    公开(公告)日:2003-09-23

    申请号:US10152343

    申请日:2002-05-22

    申请人: Akira Higuchi

    发明人: Akira Higuchi

    IPC分类号: G21K510

    摘要: A calibration mask having a plurality of marks previously formed thereon is loaded, and a deflector is used to control deflection of electron beams so that the electron beams are incident on a mark of the calibration mask. The electron beams, having passed through the mark, impinge on a first Faraday cup having a first mark and on a second Faraday cup having a second mark. Then, positional coordinates on an XY stage are detected when electrical quantities detected by the Faraday cups are largest. The positional coordinates on the above mentioned XY stage are detected for each of the marks of the calibration mask. Then, according to the positional coordinates on the XY stage detected in this manner and a difference in height between the marks, the inclination of the electron beams is calculated for the position input to each mark of the calibration mask. Thus, the inclination of electron beams can be accurately measured.