Plasma Generator
    1.
    发明申请
    Plasma Generator 审中-公开
    等离子发生器

    公开(公告)号:US20080029030A1

    公开(公告)日:2008-02-07

    申请号:US10589568

    申请日:2005-01-26

    摘要: [Object] To stably generate plasma at atmospheric pressure.[Solving Means] There are provided a tubular casing 10 into which a gas and a microwave are introduced, a hole 30 provided in a bottom surface of this casing, and a columnar conductor 40 which is provided in an axis direction of the casing, a bottom surface of the conductor 40 having a contour placed inside the contour of the hole. A minute gap A formed between the contour of a bottom surface 41 of the conductor 40 and the contour of the hole, a coaxial waveguide formed of the conductor and the casing, and an insulating film 22 formed at least on a contour portion forming the hole at the minute gap are provided. In the structure described above, the microwave is guided to the minute gap by the coaxial waveguide, and the gas is made to pass through the minute gap, so that the gas is placed in a plasma state at the minute gap. The microwave is a pulse wave and is duty-controlled, and the contour portion forming the hole 30 is cooled with a cooling medium from the inside of an electrode 20. Accordingly, the increase in plasma temperature can be prevented, and as a result, stable plasma can be generated.

    摘要翻译: [对象]在大气压下稳定地产生等离子体。 [解决方案]设置有引入气体和微波的管状壳体10,设置在该壳体的底面的孔30和沿壳体的轴线方向设置的柱状导体40, 导体40的底表面具有放置在孔的轮廓内的轮廓。 形成在导体40的底面41的轮廓和孔的轮廓之间的微小间隙A,由导体形成的同轴波导和壳体,以及至少形成在形成孔的轮廓部分上的绝缘膜22 提供了微小间隙。 在上述结构中,通过同轴波导将微波引导到微小间隙,使气体通过微小间隙,使得气体在微小间隙处被置于等离子体状态。 微波是脉冲波并且是负责控制的,并且形成孔30的轮廓部分从电极20的内部用冷却介质冷却。因此,可以防止等离子体温度的升高,结果, 可以产生稳定的等离子体。

    Radical generating method, etching method and apparatus for use in these methods
    2.
    发明授权
    Radical generating method, etching method and apparatus for use in these methods 失效
    自由基产生方法,蚀刻方法和用于这些方法的装置

    公开(公告)号:US07875199B2

    公开(公告)日:2011-01-25

    申请号:US10578835

    申请日:2004-11-09

    IPC分类号: C23C14/34 C23F1/00

    摘要: The method for generating radicals comprises: feeding F2 gas or a mixed gas of F2 gas and an inert gas into a chamber of which the inside is provided with a carbon material, supplying a carbon atom from the carbon material by applying a target bias voltage to the carbon material, and thereby generating high density radicals, wherein the ratio of CF3 radical, CF2 radical and CF radical is arbitrarily regulated by controlling the target bias voltage applied to the carbon material while measuring the infrared absorption spectrum of radicals generated inside the chamber.

    摘要翻译: 产生自由基的方法包括:将F2气体或F2气体和惰性气体的混合气体进料到内部设置有碳材料的室中,通过施加目标偏置电压从碳材料供给碳原子 从而产生高密度自由基,其中CF 3基团,CF 2基团和CF基团的比率通过在测量室内产生的自由基的红外吸收光谱的同时控制施加到碳材料的目标偏压来任意调节。

    Radical generating method, etching method and apparatus for use in these methods
    3.
    发明申请
    Radical generating method, etching method and apparatus for use in these methods 失效
    自由基产生方法,蚀刻方法和用于这些方法的装置

    公开(公告)号:US20070131651A1

    公开(公告)日:2007-06-14

    申请号:US10578835

    申请日:2004-11-09

    IPC分类号: B44C1/22

    摘要: The method for generating radicals comprises: feeding F2 gas or a mixed gas of F2 gas and an inert gas into a chamber of which the inside is provided with a carbon material, supplying a carbon atom from the carbon material by applying a target bias voltage to the carbon material, and thereby generating high density radicals, wherein the ratio of CF3 radical, CF2 radical and CF radical is arbitrarily regulated by controlling the target bias voltage applied to the carbon material while measuring the infrared absorption spectrum of radicals generated inside the chamber.

    摘要翻译: 产生自由基的方法包括:将F 2 N 2气体或F 2气体的混合气体和惰性气体进料到其内部设置有碳材料的室中 通过向碳材料施加目标偏置电压从碳材料提供碳原子,从而产生高密度自由基,其中CF 3 3基团CF 2的比例

    Plasma source and plasma processing apparatus
    4.
    发明申请
    Plasma source and plasma processing apparatus 有权
    等离子体源和等离子体处理装置

    公开(公告)号:US20070017636A1

    公开(公告)日:2007-01-25

    申请号:US10558692

    申请日:2004-05-28

    IPC分类号: C23F1/00 H01L21/306

    摘要: A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).

    摘要翻译: 等离子体源(1)由供应气体的室(2)和设置在室(2)的气体流出侧的中空阴极电极构件(4)组成,并且具有多个 的气体可以流过的电极孔(3)。 在这种等离子体源(1)中,可以在中空阴极电极部件(4)的电极孔(3)中进行微阴极等离子体放电。

    Surface treating method and surface-treating apparatus
    5.
    发明申请
    Surface treating method and surface-treating apparatus 审中-公开
    表面处理方法和表面处理装置

    公开(公告)号:US20070034601A1

    公开(公告)日:2007-02-15

    申请号:US10550020

    申请日:2003-09-22

    IPC分类号: C03C15/00 H01L21/302 B44C1/22

    摘要: The surface of a material for an electronic device is flattened by irradiating the surface of the material with at least part of plasma components, while supplying a liquid to the surface of the material for an electronic device. There are provided a method of treating the surfaces for favorably flattening the surface of the material for an electronic device or of the substrate for an electronic device, while suppressing damage to the material or to the substrate, and an apparatus for treating the surfaces.

    摘要翻译: 用于电子设备的材料的表面通过用至少部分等离子体部件照射材料的表面而平坦化,同时将液体供应到用于电子设备的材料的表面。 提供了一种处理表面以有利地平坦化用于电子设备的材料的表面或用于电子设备的基板的方法,同时抑制对材料或基板的损坏,以及用于处理表面的设备。

    Plasma source and plasma processing apparatus
    6.
    发明授权
    Plasma source and plasma processing apparatus 有权
    等离子体源和等离子体处理装置

    公开(公告)号:US07632379B2

    公开(公告)日:2009-12-15

    申请号:US10558692

    申请日:2004-05-28

    IPC分类号: C23F1/00 H01L21/306 C23C16/00

    摘要: A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).

    摘要翻译: 等离子体源(1)由供应气体的室(2)和设置在室(2)的气体流出侧的中空阴极电极构件(4)构成,并且具有多个 的气体可以流过的电极孔(3)。 在这种等离子体源(1)中,可以在中空阴极电极部件(4)的电极孔(3)中进行微阴极等离子体放电。

    Light source
    7.
    发明授权
    Light source 有权
    光源

    公开(公告)号:US08310673B2

    公开(公告)日:2012-11-13

    申请号:US12450402

    申请日:2008-03-24

    IPC分类号: G01J3/30

    摘要: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by thepslens and flows through the hole.

    摘要翻译: 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30,所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45,其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极,绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道,用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面,使得放电气体被透镜反射并流过孔。

    LIGHT SOURCE
    9.
    发明申请
    LIGHT SOURCE 有权
    光源

    公开(公告)号:US20100201978A1

    公开(公告)日:2010-08-12

    申请号:US12450402

    申请日:2008-03-24

    IPC分类号: G01N21/31

    摘要: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by the lens and flows through the hole.

    摘要翻译: 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30,所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45,其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极,绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道,用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面,使得放电气体被透镜反射并流过孔。