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    Electric discharge laser with acoustic chirp correction
    2.
    发明授权
    Electric discharge laser with acoustic chirp correction 有权
    具有声啁啾校正的放电激光器

    公开(公告)号：US06317447B1

    公开(公告)日：2001-11-13

    申请号：US09490835

    申请日：2000-01-25

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  G03F7/708 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382

    摘要： Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.

    摘要翻译： 气体放电激光器的方法和结构变化，以最大限度地减少高脉冲波长啁啾。 申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因，因为从反射回到放电区域的放电的压力波与随后的放电一致。 压力波的到达时间由波浪行进的激光气体的温度决定。 在突发模式操作期间，现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。 这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置，导致激光气体的压力变化，这反过来影响放电区域的折射率，导致激光束离开 激光稍微改变方向。 光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域，导致波长啁啾。 解决问题的方法是在激光室结构元件中包括中压或分散压力波，并将激光气体温度保持在尽可能接近的恒定值。

    SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE
    7.
    发明申请
    SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE 有权
    激光产生的等离子体光源中缓冲气体流动稳定的系统和方法

    公开(公告)号：US20120313016A1

    公开(公告)日：2012-12-13

    申请号：US13156188

    申请日：2011-06-08

    申请人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

    发明人： Vladimir B. Fleurov ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov

    IPC分类号： G21K5/00

    CPC分类号： H05G2/005 ,  H05G2/008

    摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

    摘要翻译： 一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。

    ArF laser with low pulse energy and high rep rate
    9.
    发明授权
    ArF laser with low pulse energy and high rep rate 有权
    ArF激光器具有低脉冲能量和高重现率

    公开(公告)号：US06553049B1

    公开(公告)日：2003-04-22

    申请号：US09451750

    申请日：1999-11-30

    申请人： Herve A. Besaucele ,  Jean-Marc Hueber ,  Alexander I. Ershov ,  Thomas Hofmann ,  Vladimir B. Fleurov

    发明人： Herve A. Besaucele ,  Jean-Marc Hueber ,  Alexander I. Ershov ,  Thomas Hofmann ,  Vladimir B. Fleurov

    IPC分类号： H01S322

    CPC分类号： G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1392 ,  H01S3/225

    摘要： A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse energies in the range of about 2 mJ to 5 mJ or greater with a full width half, maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 &mgr;m (100 nm) or less. Replaceable modules include a laser chamber; a modular pulse power system; and a line narrowing module. For a given laser power output, the higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.

    摘要翻译： 可靠的模块化生产质量的ArF准分子激光器，其能够以3,000至4,000Hz或更大的重复频率产生激光脉冲，脉冲能量在约2mJ至5mJ或更大的范围内，具有全宽度的一半，最大带宽 约0.4μm或更小，剂量稳定性小于0.4％。 使用该激光器作为照明源，步进器或扫描仪设备可以产生0.10mum（100nm）或更小的集成电路分辨率。 可更换模块包括激光室; 模块式脉冲电源系统; 和线条缩小模块。 对于给定的激光功率输出，较高的重复率提供了两个重要的优点。 较低的每脉冲能量意味着更少的光学损伤，并且指定照射剂量的较大数量的脉冲表示更好的剂量稳定性。