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    High resolution spectral measurement device
    7.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号：US06713770B2

    公开(公告)日：2004-03-30

    申请号：US10098975

    申请日：2002-03-15

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    IPC分类号： G01J314

    CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    摘要翻译： 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

    High resolution etalon-grating monochromator
    8.
    发明授权
    High resolution etalon-grating monochromator 有权
    高分辨率标准光栅单色仪

    公开(公告)号：US06480275B2

    公开(公告)日：2002-11-12

    申请号：US09772293

    申请日：2001-01-29

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

    IPC分类号： G01J318

    CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

    摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

    摘要翻译： 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

    Line narrowed laser with bidirection beam expansion
    9.
    发明授权
    Line narrowed laser with bidirection beam expansion 有权
    线变窄的激光器具有双向光束扩展

    公开(公告)号：US06738410B2

    公开(公告)日：2004-05-18

    申请号：US09738042

    申请日：2000-12-15

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Scott T. Smith

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Scott T. Smith

    IPC分类号： H01S308

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/0401 ,  H01S3/10 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

    摘要： A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.

    摘要翻译： 一种基于光栅的线窄化单元，具有用于线窄激光器的双向光束扩展。 在优选实施例中，来自激光室的光束在水平方向上用三棱镜光束扩展器扩展，并且在垂直方向上用单个棱镜扩展。 扩展光束中的窄带波长从Littrow配置中的光栅经由两个光束扩展器反射到激光室中以进行放大。

    BAYER SYMMETRIC INTERLEAVED HIGH DYNAMIC RANGE IMAGE SENSOR
    10.
    发明申请
    BAYER SYMMETRIC INTERLEAVED HIGH DYNAMIC RANGE IMAGE SENSOR 有权
    贝叶尔对称交互式高动态范围图像传感器

    公开(公告)号：US20140027613A1

    公开(公告)日：2014-01-30

    申请号：US13560205

    申请日：2012-07-27

    申请人： Scott T. Smith

    发明人： Scott T. Smith

    IPC分类号： H01L27/146

    CPC分类号： H01L27/14621 ,  G03B7/083 ,  H01L27/14643 ,  H04N5/2352 ,  H04N5/2353 ,  H04N5/35536

    摘要： To generate data for color pixels in an image, Bayer symmetric interleaved exposures can more evenly spread the long exposure pixels in the vertical direction and produce a higher dynamic range by having pixels with different exposure times interleaved within different rows. Long and short exposure pixels can be interleaved across two adjacent rows to form 4 pixel wide by 2 pixel tall blocks that are repeated across a Bayer pattern color array. In each block, the first row can be three long and one short exposure pixel; and the second row can be three short and one long exposure pixel. The long exposure pixels can form an “L” shaped pattern rotated 90 degrees clockwise; and the short exposure pixels can form an “L” shaped pattern rotated 90 degrees counter-clockwise. Subsequent rows of the blocks may be offset horizontally to form diagonal bands of long and short exposure pixels.

    摘要翻译： 为了生成图像中的彩色像素的数据，拜耳对称交错曝光可以在垂直方向上更均匀地展开长曝光像素，并通过在不同的行内具有交错的不同曝光时间的像素产生更高的动态范围。 长和短曝光像素可跨越两个相邻的行进行交织以形成跨越Bayer图案颜色阵列重复的4像素×2像素高的块。 在每个块中，第一行可以是三个长和一个短曝光像素; 并且第二行可以是三个短和一个长曝光像素。 长曝光像素可以形成顺时针旋转90度的“L”形图案; 并且短曝光像素可以形成逆时针旋转90度的“L”形图案。 块的后续行可以被水平偏移以形成长和短曝光像素的对角线。