摘要:
A catalyst composition for use in manufacturing methacrolein by reacting with one of isobutene and t-butanol, the catalyst composition being represented by the formula of: x (Mo12BiaFebCocAdBeOf)/y Z. Mo12BiaFebCocAdBeOf is an oxide compound. Z is a catalyst carrier is one of graphite, boron, silicon, germanium powder, and a mixture thereof. Mo, Bi, Fe, Co, and O are chemical symbols of molybdenum, bismuth, iron, cobalt, and oxygen respectively. A is one of W, V, Ti, Zr, Nb, Ni, and Re. B is one of K, Rb, Cs, Sr, and Ba. The catalyst is adapted to not only enhance the production of methacrolein with high activeness and high selectivity but also effectively control the heat point of the catalyst during the methacrolein manufacturing process to prolong the catalyst life.
摘要:
A catalyst composition for use in manufacturing methacrolein by reacting with one of isobutene and t-butanol, the catalyst composition being represented by the formula of: x (Mo12Bi8FebCocAdBeOf)/y Z. Mo12BiaFebCocAdBeOf is an oxide compound. Z is a catalyst carrier is one of graphite, boron, silicon, germanium powder, and a mixture thereof Mo, Bi, Fe, Co, and O are chemical symbols of molybdenum, bismuth, iron, cobalt, and oxygen respectively. A is one of W, V, Ti, Zr, Nb, Ni, and Re. B is one of K, Rb, Cs, Sr, and Ba. The catalyst is adapted to not only enhance the production of methacrolein with high activeness and high selectivity but also effectively control the heat point of the catalyst during the methacrolein manufacturing process to prolong the catalyst life.
摘要翻译:一种用于通过与异丁烯和叔丁醇中的一种反应制备异丁烯醛的催化剂组合物,该催化剂组合物由下式表示:x(Mo 12 B 16 BrBeCeBeOf)/ y Z.Mo12BiaFebCocAdBeOf是一种氧化物。 Z是催化剂载体,分别是石墨,硼,硅,锗粉末及其混合物,Mo,Bi,Fe,Co和O分别是钼,铋,铁,钴和氧的化学符号。 A是W,V,Ti,Zr,Nb,Ni和Re中的一种。 B是K,Rb,Cs,Sr和Ba之一。 该催化剂不仅可以增强高活性和高选择性的甲基丙烯醛的生产,而且可有效控制甲基丙烯醛制造过程中催化剂的热点,延长催化剂的使用寿命。
摘要:
A method of methacrylate production includes the steps of providing methacrylate gas mixture; absorbing said gas mixture by water to form a solution mixture; introducing said solution mixture into a distillation column, separating impure methacrylate from said solution mixture in said distillation column that solution of said impure methacrylate is collected at said stripping section of said distillation column; and removing acetic acid from said impure methacrylate to produce methacrylate. It effectively enhances the separation capacity of the distillation column, lowers the whole column pressure drop and operation temperature, avoids the polymerization tendency of the methacrylate under high temperature, to make the water content of the bottom discharging decreases to 0.6%, acetic acid content reduces to below 2%, methyl acrylic content of the top column water phase decreases to 0.5%, thereby reduces the methacrylate products unit consumption and improves the product quality.
摘要:
The application introduces the technology of Internet of Things into field of attire design, and creates a communicative and sensitive device: the composite and convertible attire with network communication and intelligent sensitive features, referred to as COMS Attire, its purpose is to liberate mobile devices from “hand-held” mode, and use the convertibility of attire to protect and enhance intelligent elements. Attire is big in size, large in capacity, deformable in shape, attachable and detachable in structure, and its carried items can be exposed and concealed at will. Attire is a daily necessity in people's lives, and the most suitable place for development of new generation of mobile intelligent device to replace the miniaturized traditional mobile one; the technical achievements of hardware “miniaturization” make COMS attire more intelligent, more fashionable and popular with users. COMS attire increases the choice of chip types, and expands the installation space of intelligent components.
摘要:
An impedance match at an RF generator output of a plasma reactor includes plural minimum-seeking loop controllers having respective feedback input ports coupled to receive a reflected RF power signal from a reflected power sensing circuit and respective control output ports. The output ports are coupled to variable reactances of an impedance match circuit that is connected between the RF generator and an RF power applicator of the reactor.
摘要:
A method and apparatus for measuring gas flow are provided. In one embodiment, a calibration circuit for gas control may be utilized to verify and/or calibrate gas flows utilized for backside cooling, process gas delivery, purge gas delivery, cleaning agent delivery, carrier gases delivery and remediation gas delivery, among others.
摘要:
An advanced temperature control system and method are described for a wafer carrier in a plasma processing chamber. In one example a heat exchanger provides a temperature controlled thermal fluid to a fluid channel of a workpiece carrier and receives the thermal fluid from the fluid channel. A proportional valve is between the heat exchanger and the fluid channel to control the rate of flow of thermal fluid from the heat exchanger to the fluid channel. A pneumatic valve is also between the heat exchanger and the fluid channel also to control the rate of flow of thermal fluid from the heat exchanger and the fluid channel. A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve and the pneumatic valve in response to the measured temperature to adjust the rate of flow of the thermal fluid.
摘要:
The present invention provides a method and system for determining whether a genomic abnormality exists. The method for determining whether a genomic abnormality exists includes the steps of: separating fetal nucleated red blood cells from a sample from a pregnant woman; sequencing at least a part of the genome of the nucleated red blood cells, so as to obtain a sequencing result; and on the basis of the sequencing result, determining whether a genomic abnormality exists in the nucleated red blood cells.
摘要:
A method, a system and a computer readable medium for integrated in-vacuo repair of low-k dielectric thin films damaged by etch and/or strip processing. A repair chamber is integrated onto a same platform as a plasma etch and/or strip chamber to repair a low-k dielectric thin film without breaking vacuum between the damage event and the repair event. UV radiation may be provided on the integrated etch/repair platform in any combination of before, after, or during the low-k repair treatment to increase efficacy of the repair treatment and/or stability of repair.
摘要:
A method and apparatus for measuring gas flow are provided. In one embodiment, a calibration circuit for gas control may be utilized to verify and/or calibrate gas flows utilized for backside cooling, process gas delivery, purge gas delivery, cleaning agent delivery, carrier gases delivery and remediation gas delivery, among others.