SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
    1.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20090121323A1

    公开(公告)日:2009-05-14

    申请号:US12266748

    申请日:2008-11-07

    IPC分类号: H01L23/48

    摘要: A semiconductor device and a method of fabricating the same. The semiconductor device includes a semiconductor substrate including an active surface and an inactive surface which faces the active surface, a device isolation layer and a pad stacked on the active surface; and a through electrode disposed in a first via hole and a second via hole and including a protruding part that protrudes from the pad, the first via hole penetrating the semiconductor substrate, the second via hole penetrating the device insulation layer and the pad continuously, wherein at least a surface of the protruding part of the through electrode is formed of an oxidation resistance-conductive material.

    摘要翻译: 一种半导体器件及其制造方法。 半导体器件包括:半导体衬底,其包括活性表面和面向有源表面的无活性表面;器件隔离层和堆叠在有源表面上的焊盘; 以及设置在第一通孔中的贯通电极和第二通孔,并且包括从所述焊盘突出的突出部分,所述第一通孔贯穿所述半导体基板,所述第二通孔贯穿所述器件绝缘层和所述焊盘,其中, 贯通电极的突出部分的至少一个表面由抗氧化传导材料形成。