公开(公告)号：US5976260A

公开(公告)日：1999-11-02

申请号：US612445

申请日：1996-03-07

申请人： Yoshimi Kinoshita ,  Tomoyuki Kanda ,  Katsuhisa Kitano ,  Kazuo Yoshida ,  Hiroshi Ohnishi ,  Kenichiro Yamanishi ,  Shigeo Sasaki ,  Hideki Komori ,  Taizo Eshima ,  Kouichirou Tsutahara ,  Toshihiko Noguchi ,  Toru Takahama ,  Yoshihiko Kusakabe ,  Takeshi Iwamoto ,  Nobuyuki Kosaka

发明人： Yoshimi Kinoshita ,  Tomoyuki Kanda ,  Katsuhisa Kitano ,  Kazuo Yoshida ,  Hiroshi Ohnishi ,  Kenichiro Yamanishi ,  Shigeo Sasaki ,  Hideki Komori ,  Taizo Eshima ,  Kouichirou Tsutahara ,  Toshihiko Noguchi ,  Toru Takahama ,  Yoshihiko Kusakabe ,  Takeshi Iwamoto ,  Nobuyuki Kosaka

IPC分类号： B23Q3/08 ,  B25B11/00 ,  C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  H01L21/683 ,  C23C16/00

CPC分类号： C23C16/34 ,  B25B11/005 ,  C23C16/4405 ,  C23C16/455 ,  C23C16/4583 ,  C23C16/481 ,  H01L21/6838 ,  Y10T279/11

摘要： It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer (1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.

摘要翻译： 本发明的目的是获得即使在其上附着有灰尘也能真空吸附晶片的真空吸盘。 真空吸盘（101）的主体在其上吸引和固定晶片（1）的表面上具有多个块状凹槽（125），其中各真空抽空路径（105）用于真空抽吸每个块状凹槽（125） ）被设置用于每个块槽（125）。 当晶片（1）在低压下被吸入和固定时，即使一个块状槽（125）中的一个真空度由于吸附表面的一部分上的灰尘等的附着而降低，晶片（1） ）肯定被吸住了。

公开(公告)号：US5534073A

公开(公告)日：1996-07-09

申请号：US116968

申请日：1993-09-07

申请人： Yoshimi Kinoshita ,  Tomoyuki Kanda ,  Katsuhisa Kitano ,  Kazuo Yoshida ,  Hiroshi Ohnishi ,  Kenichiro Yamanishi ,  Shigeo Sasaki ,  Hideki Komori ,  Taizo Eshima ,  Kouichirou Tsutahara ,  Toshihiko Noguchi ,  Toru Takahama ,  Yoshihiko Kusakabe ,  Takeshi Iwamoto ,  Nobuyuki Kosaka

发明人： Yoshimi Kinoshita ,  Tomoyuki Kanda ,  Katsuhisa Kitano ,  Kazuo Yoshida ,  Hiroshi Ohnishi ,  Kenichiro Yamanishi ,  Shigeo Sasaki ,  Hideki Komori ,  Taizo Eshima ,  Kouichirou Tsutahara ,  Toshihiko Noguchi ,  Toru Takahama ,  Yoshihiko Kusakabe ,  Takeshi Iwamoto ,  Nobuyuki Kosaka

IPC分类号： B23Q3/08 ,  B25B11/00 ,  C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  H01L21/683 ,  C23C16/00 ,  B23B5/22 ,  B23B31/30

CPC分类号： C23C16/34 ,  B25B11/005 ,  C23C16/4405 ,  C23C16/455 ,  C23C16/4583 ,  C23C16/481 ,  H01L21/6838 ,  Y10T279/11

摘要： It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer(1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.

摘要翻译： 本发明的目的是获得即使在其上附着有灰尘也能真空吸附晶片的真空吸盘。 真空吸盘（101）的主体在其上吸引和固定晶片（1）的表面上具有多个块状凹槽（125），其中各真空抽空路径（105）用于真空抽吸每个块状凹槽（125） ）被设置用于每个块槽（125）。 当晶片（1）在低压下被吸入和固定时，即使一个块状槽（125）中的一个真空度由于吸附表面的一部分上的灰尘等的附着而降低，晶片（1） ）肯定被吸住了。

公开(公告)号：US5252132A

公开(公告)日：1993-10-12

申请号：US796618

申请日：1991-11-22

申请人： Masao Oda ,  Yoshiyuki Goto ,  Toyomi Osige ,  Tatsuya Iwasa ,  Yoshimi Kinoshita ,  Katsuhisa Kitano ,  Kazuo Yoshida

发明人： Masao Oda ,  Yoshiyuki Goto ,  Toyomi Osige ,  Tatsuya Iwasa ,  Yoshimi Kinoshita ,  Katsuhisa Kitano ,  Kazuo Yoshida

IPC分类号： C23C16/48 ,  C30B25/10 ,  C30B25/14 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67115 ,  C23C16/481 ,  C23C16/488 ,  C30B25/105 ,  C30B25/14

摘要： A semiconductor film production apparatus includes a reaction vessel for containing a substrate and including a gas supply port for supplying a reaction gas to the vessel, a gas discharge port for discharging the reaction gas from the vessel after reaction, and a light-transmitting glass window; a light source disposed outside the reaction vessel for irradiating a substrate in the reaction vessel through the light-transmitting glass window to heat the substrate; a cylindrical substrate holder disposed in the reaction vessel for holding the substrate with a first surface facing the light source and a second surface, opposed to the first surface, exposed to the reaction gas; a ring plate having a central opening with an area smaller than the substrate and an outside diameter dividing the reaction vessel into two compartments, the ring plate contacting the first surface of the substrate; a carrier gas supply port for introducing a carrier gas between the substrate and the light-transmitting glass window; and a reaction gas supply nozzle disposed in the substrate holder connected to said gas supply port and opposing the second surface of the substrate.

摘要翻译： 半导体膜制造装置包括：容纳基板的反应容器，具有用于向容器供给反应气体的气体供给口;反应后从反应容器排出反应气体的气体排出口;透光性玻璃窗 ; 设置在所述反应容器的外部的光源，用于通过所述透光玻璃窗照射反应容器中的基板以加热所述基板; 设置在所述反应容器中的圆柱形衬底保持器，用于保持所述衬底具有面向所述光源的第一表面和与所述第一表面相对的暴露于所述反应气体的第二表面; 环形板，具有中心开口，面积小于基板，外径将反应容器分成两个隔室，环板接触基板的第一表面; 用于在基板和透光玻璃窗之间引入载气的载气供给口; 以及反应气体供给喷嘴，其设置在与所述气体供给口连接并与所述基板的第二表面相对的所述基板保持件中。

公开(公告)号：US06266123B1

公开(公告)日：2001-07-24

申请号：US09338429

申请日：1999-06-23

申请人： Taro Maejima ,  Isao Sakata ,  Ikuo Ogo ,  Kazuo Yoshida ,  Yoshimi Kinoshita

发明人： Taro Maejima ,  Isao Sakata ,  Ikuo Ogo ,  Kazuo Yoshida ,  Yoshimi Kinoshita

IPC分类号： G02F11333

CPC分类号： G02F1/1333 ,  G02F1/133615 ,  G02F2001/133302

摘要： A liquid crystal display device comprising a liquid crystal display panel and a light guide plate arranged in a rear side of the liquid crystal display panel. The liquid crystal display panel is of a substantially spherical shape, and the liquid crystal display panel is fitted at a front side of the light guide plate such that a proximity of a central portion of the liquid crystal display panel is outwardly bulged. There can be prevented display deficiencies (paddling) owing to interference between the liquid crystal display panel and the backlighting unit or between the former and the casing. Moreover, since no interference exists between the liquid crystal display panel and the backlighting unit or between the former and the casing, sheets such as the diffusing sheet will not be wrinkled, and the brightness of the backlighting unit can be maintained to be uniform.

摘要翻译： 一种液晶显示装置，包括液晶显示面板和布置在液晶显示面板后侧的导光板。 液晶显示面板为大致球状，液晶显示面板配置在导光板的前侧，使得液晶显示面板的中央部分的附近向外凸出。 由于液晶显示面板和背光单元之间或者前者与外壳之间的干涉，可以防止显示不足（划片）。 此外，由于在液晶显示面板和背光单元之间或者前者与壳体之间不存在干涉，因此扩散片等片材不会起皱，并且能够将背光单元的亮度保持均匀。

公开(公告)号：US5393255A

公开(公告)日：1995-02-28

申请号：US202773

申请日：1994-02-28

申请人： Yasushi Hisaoka ,  Yoshio Yamane ,  Hidenobu Murakami ,  Yoshimi Kinoshita ,  Hiroaki Tobuse ,  Kazuo Yoshida ,  Takashi Ishii ,  Hiroshi Koizumi

发明人： Yasushi Hisaoka ,  Yoshio Yamane ,  Hidenobu Murakami ,  Yoshimi Kinoshita ,  Hiroaki Tobuse ,  Kazuo Yoshida ,  Takashi Ishii ,  Hiroshi Koizumi

IPC分类号： H01J9/42 ,  H01J9/20

CPC分类号： H01J9/42

摘要： An inspection method and an inspection apparatus for the component members of the cathode-ray tube are disclosed. An inspection apparatus composed of normal members other than an object of inspection is prepared at the time of inspecting the phosphor screen of the screen panel, the electron gun or the shadow-mask constituting the cathode-ray tube. In advanced to assembling the cathode-ray tube, the object of inspection is mounted on the inspection apparatus, so that the conformance or rejection of the object of inspection is decided from the illuminated condition of the phosphor screen by irradiating electron beams thereon.

摘要翻译： 公开了一种用于阴极射线管的部件的检查方法和检查装置。 在检查构成阴极射线管的屏幕面板，电子枪或阴罩的荧光屏时，准备由除了检查对象以外的普通部件构成的检查装置。 在组装阴极射线管的过程中，将检查对象安装在检查装置上，从而通过在其上照射电子束从荧光屏的照明状态来确定检查对象的一致性或拒绝。

公开(公告)号：US06461465B2

公开(公告)日：2002-10-08

申请号：US09766980

申请日：2001-01-23

申请人： Masahiko Tada ,  Kohei Adachi ,  Hiroki Toyoshima ,  Susumu Kono ,  Kazuo Yoshida ,  Yoshihiro Kashiba ,  Yoshimi Kinoshita

发明人： Masahiko Tada ,  Kohei Adachi ,  Hiroki Toyoshima ,  Susumu Kono ,  Kazuo Yoshida ,  Yoshihiro Kashiba ,  Yoshimi Kinoshita

IPC分类号： B30B1506

CPC分类号： B32B37/1009 ,  B32B37/10 ,  B32B37/12

摘要： An apparatus for manufacturing a liquid crystal panel in which two substrates are faced to each other with spacers interposed therebetween, applied with heat pressure in an overlapped condition, and adhesive arranged between the two substrates is cured for fixing, characterized in that at least of a pair of pressurizing plates for applying pressure to the two substrates is a graphite plate and in that upper and lower pressurizing plates are made to be of different rigidity. The graphite plate of low rigidity is made to stick to the substrate, and shifts between substrate can be prevented while securing uniformity in gap between substrates.

摘要翻译： 一种用于制造液晶面板的装置，其中两个基板彼此面对并具有间隔件，以重叠的状态施加热压，并且布置在两个基板之间的粘合剂固化固化，其特征在于，至少一个 一对用于向两个基板施加压力的加压板是石墨板，并且使上，下加压板具有不同的刚性。 使刚性低的石墨板粘附到基板上，并且可以在确保基板之间的间隙的均匀性的同时防止基板之间的移动。

公开(公告)号：US06190488B1

公开(公告)日：2001-02-20

申请号：US09301722

申请日：1999-04-29

申请人： Masahiko Tada ,  Kohei Adachi ,  Hiroki Toyoshima ,  Susumu Kono ,  Kazuo Yoshida ,  Yoshihiro Kashiba ,  Yoshimi Kinoshita

发明人： Masahiko Tada ,  Kohei Adachi ,  Hiroki Toyoshima ,  Susumu Kono ,  Kazuo Yoshida ,  Yoshihiro Kashiba ,  Yoshimi Kinoshita

IPC分类号： B30B1506

CPC分类号： B32B37/1009 ,  B32B37/10 ,  B32B37/12

摘要： An apparatus for manufacturing a liquid crystal panel in which two substrates are faced to each other with spacers interposed therebetween, applied with heat and pressure in an overlapped condition, and adhesive arranged between two substrates is cured for fixing, characterized in that at least one of a pair of pressurizing plates for applying pressure to the two substrates is a graphite plate and in that upper and lower pressurizing plates are made to be of different rigidity. The graphite plate of low rigidity is made to stick to the substrate, and shifts between substrates can be prevented while securing uniformity in gaps between substrates.

摘要翻译： 一种用于制造液晶面板的装置，其中两个基板彼此面对并具有隔着间隔件，以重叠的状态施加热和压力，并且将布置在两个基板之间的粘合剂固化固化，其特征在于，至少一个 用于向两个基板施加压力的一对加压板是石墨板，并且使上下加压板具有不同的刚性。 使刚性低的石墨板粘附到基板上，同时确保基板之间的间隙的均匀性，可以防止基板之间的移动。

公开(公告)号：US5024182A

公开(公告)日：1991-06-18

申请号：US376015

申请日：1989-07-06

申请人： Toshiyuki Kobayashi ,  Masao Koshinaka ,  Yoshimi Kinoshita ,  Masao Oda ,  Kenji Yoshizawa

发明人： Toshiyuki Kobayashi ,  Masao Koshinaka ,  Yoshimi Kinoshita ,  Masao Oda ,  Kenji Yoshizawa

IPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/511 ,  H01L21/205 ,  H01L21/31

CPC分类号： C23C16/45502 ,  C23C16/452 ,  C23C16/455

摘要： An apparatus for forming a thin film on a substrate by bringing a first gas and a second gas into reaction with each other in a reaction chamber near the surface of the substrate in the reaction chamber. The apparatus has a plasma generating chamber disposed adjacent to the reaction chamber for generating a plasma of the first gas in a predetermined direction. A first gas inlet is provided at the boundary between the plasma generating chamber and the reaction chamber and formed to extend in the predetermined direction, while a second gas inlet is provided in the vicinity of the first gas inlet and extended in the predetermined direction. The apparatus further has a first gas supplying device for introducing the first gas into the plasma generating chamber and for introducing the first gas activated by a plasma in the plasma generating chamber into the reaction chamber through the first gas inlet, and second gas supplying device for supplying the second gas into the reaction chamber through the second gas inlet. A first flow settling device having plates disposed transverse to the flow of the first gas is positioned between the first gas inlet and plasma chamber. A second flow settling device may be located between the second gas supplying device and second gas inlet.

摘要翻译： 一种用于在反应室中的基板表面附近的反应室中使第一气体和第二气体彼此反应而在基板上形成薄膜的装置。 该装置具有邻近反应室设置的等离子体产生室，用于沿预定方向产生第一气体的等离子体。 第一气体入口设置在等离子体产生室和反应室之间的边界处并形成为沿预定方向延伸，而第二气体入口设置在第一气体入口附近并沿预定方向延伸。 该装置还具有：第一气体供给装置，其用于将第一气体引入等离子体发生室，并且通过第一气体入口将等离子体产生室中的等离子体激活的第一气体引入反应室;第二气体供给装置， 通过第二气体入口将第二气体供应到反应室中。 具有横向于第一气体的流动设置的板的第一流动沉降装置位于第一气体入口和等离子体室之间。 第二流动沉降装置可以位于第二气体供给装置和第二气体入口之间。

公开(公告)号：US06593921B2

公开(公告)日：2003-07-15

申请号：US09759368

申请日：2001-01-16

申请人： Kunifumi Nakanishi ,  Shuji Nishizaki ,  Akitoshi Miyaoka ,  Yoshimi Kinoshita ,  Yoshikazu Ikuta

发明人： Kunifumi Nakanishi ,  Shuji Nishizaki ,  Akitoshi Miyaoka ,  Yoshimi Kinoshita ,  Yoshikazu Ikuta

IPC分类号： G09G500

CPC分类号： G09G3/36 ,  G09G2320/02 ,  G09G2320/0247

摘要： With the prior art image-adjusting system for a liquid crystal display, flicker is adjusted by operator's visual examination and so human factors vary the potential-adjusting value applied to the common electrode. The invention provides an image-adjusting system and method free of this problem. The image-adjusting method starts with placing optical sensors opposite to a given location on a liquid crystal display. The output waveform from the optical sensors is observed on an oscilloscope in synchronism with the vertical synchronizing signal that is synchronized to odd frames or even frames. The potential applied to the common electrode of the liquid crystal display is shifted upward from the optimum potential to observe a first waveform. The potential on the common electrode is shifted downward from the optimum potential to observe a second waveform. The potential Vcom applied to a liquid crystal display to be adjusted is so adjusted that the waveform derived from the liquid crystal display to be adjusted has a phase midway between the phases of the previously obtained first and second waveforms.

摘要翻译： 利用用于液晶显示器的现有技术的图像调整系统，通过操作者的视觉检查来调整闪烁，因此人为因素改变施加到公共电极的电位调整值。 本发明提供了一种没有这个问题的图像调整系统和方法。 图像调整方法首先将与给定位置相对的光学传感器放置在液晶显示器上。 来自光学传感器的输出波形与示波器同步于与奇数帧或偶数帧同步的垂直同步信号同步。 施加到液晶显示器的公共电极的电位从最佳电位向上移动以观察第一波形。 公共电极上的电位从最佳电位向下移动以观察第二波形。 适用于要调节的液晶显示器的电位Vcom被调整为使得从要调节的液晶显示器得到的波形在先前获得的第一和第二波形的相位之间具有相位的相位。

公开(公告)号：US5010842A

公开(公告)日：1991-04-30

申请号：US362745

申请日：1989-06-07

申请人： Masao Oda ,  Yoshimi Kinoshita ,  Masahiro Hayama

发明人： Masao Oda ,  Yoshimi Kinoshita ,  Masahiro Hayama

IPC分类号： H01L21/205 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  H01L21/31

CPC分类号： C23C16/45565 ,  C23C16/452 ,  C23C16/455 ,  C23C16/45578

摘要： Apparatus for forming a thin film on a substrate surface by a CVD (Chemical Vapor Deposition) method which includes diffusing pipes for diffusing and supplying a first reactive gas, and uniformizing plates for supplying uniformly an active species formed through excitation of a second reactive gas. The first reactive gas and the active species are mixed uniformly with each other, and the resultant uniform mixture is supplied uniformly to the substrate surface, whereby a uniform film deposition rate is obtained in a reaction zone in which the thin film is formed, and a uniform thin film is formed over the entire substrate surface even when the area of the substrate surface is large.

摘要翻译： 用于通过CVD（化学气相沉积）方法在衬底表面上形成薄膜的装置，其包括用于扩散和供应第一反应气体的扩散管，以及均匀地均匀地供给通过激发第二反应气体形成的活性物质的板。 将第一反应气体和活性物质彼此均匀地混合，将所得到的均匀混合物均匀地供给到基板表面，由此在形成有薄膜的反应区域中获得均匀的膜沉积速率， 即使当基板表面的面积大时，也在整个基板表面上形成均匀的薄膜。