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    3-dimensional flash memory device, method of fabrication and method of operation
    1.
    发明授权
    3-dimensional flash memory device, method of fabrication and method of operation 失效
    3维闪存器件，制造方法和操作方法

    公开(公告)号：US07960844B2

    公开(公告)日：2011-06-14

    申请号：US12499980

    申请日：2009-07-09

    申请人： Young-Chul Jang ,  Han-Soo Kim ,  Jae-Hun Jeong ,  Soon-Moon Jung

    发明人： Young-Chul Jang ,  Han-Soo Kim ,  Jae-Hun Jeong ,  Soon-Moon Jung

    IPC分类号： H01L23/48

    CPC分类号： H01L27/11578 ,  H01L27/11524 ,  H01L27/11551 ,  H02J2007/0049

    摘要： Disclosed are a flash memory device and method of operation. The flash memory device includes a bottom memory cell array and a top memory cell array disposed over the bottom memory cell array. The bottom memory cell array includes a bottom semiconductor layer, a bottom well, and a plurality of bottom memory cell units. The top memory cell array includes a top semiconductor layer, a top well, and a plurality of top memory cell units. A well bias line is disposed over the top memory cell array and includes a bottom well bias line and a top well bias line, The bottom well bias line is electrically connected to the bottom well, and the top well bias line is electrically connected to the top well.

    摘要翻译： 公开了闪存装置和操作方法。 闪速存储器件包括底部存储单元阵列和设置在底部存储单元阵列上的顶部存储器单元阵列。 底部存储单元阵列包括底部半导体层，底部阱以及多个底部存储单元单元。 顶部存储单元阵列包括顶部半导体层，顶部阱以及多个顶部存储单元。 井顶偏置线设置在顶部存储单元阵列上，并且包括底部阱偏置线和顶部阱偏置线。底部阱偏置线电连接到底部阱，并且顶部阱偏置线电连接到 顶好

    Method for forming semiconductor device having metallization comprising select lines, bit lines and word lines
    5.
    发明授权
    Method for forming semiconductor device having metallization comprising select lines, bit lines and word lines 失效
    用于形成具有包括选择线，位线和字线的金属化的半导体器件的方法

    公开(公告)号：US08034668B2

    公开(公告)日：2011-10-11

    申请号：US12588240

    申请日：2009-10-08

    申请人： Young-Chul Jang ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

    发明人： Young-Chul Jang ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

    IPC分类号： H01L21/76

    CPC分类号： H01L27/0688 ,  H01L27/105 ,  H01L27/11519 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

    摘要： A semiconductor device includes a semiconductor substrate including a first region having a cell region and a second region having a peripheral circuit region, first transistors on the semiconductor substrate, a first protective layer covering the first transistors, a first insulation layer on the first protective layer, a semiconductor pattern on the first insulation layer in the first region, second transistors on the semiconductor pattern, a second protective layer covering the second transistors, the second protective layer having a thickness greater than that of the first protective layer, and a second insulation layer on the second protective layer and the first insulation layer of the second region.

    摘要翻译： 半导体器件包括：半导体衬底，包括具有单元区域的第一区域和具有外围电路区域的第二区域;半导体衬底上的第一晶体管;覆盖第一晶体管的第一保护层;第一保护层上的第一绝缘层; ，第一区域中的第一绝缘层上的半导体图案，半导体图案上的第二晶体管，覆盖第二晶体管的第二保护层，第二保护层的厚度大于第一保护层的厚度，第二绝缘层 在第二保护层和第二区域的第一绝缘层上。

    Methods of fabricating multi-layer nonvolatile memory devices
    6.
    发明授权
    Methods of fabricating multi-layer nonvolatile memory devices 有权
    制造多层非易失性存储器件的方法

    公开(公告)号：US07910433B2

    公开(公告)日：2011-03-22

    申请号：US12478538

    申请日：2009-06-04

    申请人： Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

    发明人： Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

    IPC分类号： H01L21/336 ,  H01L21/8234 ,  H01L21/84

    CPC分类号： H01L27/105 ,  H01L21/8221 ,  H01L27/0688 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

    摘要： A nonvolatile memory device includes a semiconductor substrate having a first well region of a first conductivity type, and at least one semiconductor layer formed on the semiconductor substrate. A first cell array is formed on the semiconductor substrate, and a second cell array formed on the semiconductor layer. The semiconductor layer includes a second well region of the first conductivity type having a doping concentration greater than a doping concentration of the first well region of the first conductivity type. As the doping concentration of the second well region is increased, a resistance difference may be reduced between the first and second well regions.

    摘要翻译： 非易失性存储器件包括具有第一导电类型的第一阱区和形成在半导体衬底上的至少一个半导体层的半导体衬底。 第一单元阵列形成在半导体衬底上，第二单元阵列形成在半导体层上。 半导体层包括第一导电类型的第二阱区，其具有大于第一导电类型的第一阱区的掺杂浓度的掺杂浓度。 随着第二阱区域的掺杂浓度增加，可以在第一和第二阱区域之间减小电阻差。

    MULTI-LAYER MEMORY DEVICES
    8.
    发明申请
    MULTI-LAYER MEMORY DEVICES 有权
    多层存储器件

    公开(公告)号：US20110163411A1

    公开(公告)日：2011-07-07

    申请号：US13049495

    申请日：2011-03-16

    申请人： Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

    发明人： Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

    IPC分类号： H01L27/08

    CPC分类号： H01L27/105 ,  H01L21/8221 ,  H01L27/0688 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

    摘要： A nonvolatile memory device includes a semiconductor substrate having a first well region of a first conductivity type, and at least one semiconductor layer formed on the semiconductor substrate. A first cell array is formed on the semiconductor substrate, and a second cell array formed on the semiconductor layer. The semiconductor layer includes a second well region of the first conductivity type having a doping concentration greater than a doping concentration of the first well region of the first conductivity type. As the doping concentration of the second well region is increased, a resistance difference may be reduced between the first and second well regions.

    摘要翻译： 非易失性存储器件包括具有第一导电类型的第一阱区和形成在半导体衬底上的至少一个半导体层的半导体衬底。 第一单元阵列形成在半导体衬底上，第二单元阵列形成在半导体层上。 半导体层包括第一导电类型的第二阱区，其具有大于第一导电类型的第一阱区的掺杂浓度的掺杂浓度。 随着第二阱区域的掺杂浓度增加，可以在第一和第二阱区域之间减小电阻差。

    Semiconductor device and method for forming the same
    9.
    发明申请
    Semiconductor device and method for forming the same 有权
    半导体装置及其形成方法

    公开(公告)号：US20080067517A1

    公开(公告)日：2008-03-20

    申请号：US11655115

    申请日：2007-01-19

    申请人： Young-Chul Jang ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

    发明人： Young-Chul Jang ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

    IPC分类号： H01L29/772 ,  H01L21/8234

    CPC分类号： H01L27/0688 ,  H01L27/105 ,  H01L27/11519 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

    摘要： A semiconductor device includes a semiconductor substrate including a first region having a cell region and a second region having a peripheral circuit region, first transistors on the semiconductor substrate, a first protective layer covering the first transistors, a first insulation layer on the first protective layer, a semiconductor pattern on the first insulation layer in the first region, second transistors on the semiconductor pattern, a second protective layer covering the second transistors, the second protective layer having a thickness greater than that of the first protective layer, and a second insulation layer on the second protective layer and the first insulation layer of the second region.

    摘要翻译： 半导体器件包括：半导体衬底，包括具有单元区域的第一区域和具有外围电路区域的第二区域;半导体衬底上的第一晶体管;覆盖第一晶体管的第一保护层;第一保护层上的第一绝缘层; ，第一区域中的第一绝缘层上的半导体图案，半导体图案上的第二晶体管，覆盖第二晶体管的第二保护层，第二保护层的厚度大于第一保护层的厚度，第二绝缘层 在第二保护层和第二区域的第一绝缘层上。

    Transistor and method of fabricating the same
    10.
    发明授权
    Transistor and method of fabricating the same 有权
    晶体管及其制造方法

    公开(公告)号：US07170133B2

    公开(公告)日：2007-01-30

    申请号：US10977036

    申请日：2004-10-28

    申请人： Young-Chul Jang ,  Won-Seok Cho ,  Soon-Moon Jung

    发明人： Young-Chul Jang ,  Won-Seok Cho ,  Soon-Moon Jung

    IPC分类号： H01L29/76 ,  H01L29/94 ,  H01L31/062 ,  H01L31/113 ,  H01L31/119

    CPC分类号： H01L29/66787 ,  H01L21/76224 ,  H01L27/10876

    摘要： A transistor and a method of fabricating the same: The transistor includes an isolation layer disposed in a semiconductor substrate to define an active region. A pair of source/drain regions is disposed in the active region, spaced apart from each other. A channel region is interposed between the pair of the source/drain regions. The active region has a mesa disposed across the channel region. The mesa extends to the source/drain regions. A gate electrode is disposed to cross the active region along the direction across the mesa.

    摘要翻译： 晶体管及其制造方法：晶体管包括设置在半导体衬底中以限定有源区的隔离层。 一对源极/漏极区域设置在有源区域中，彼此间隔开。 沟道区域插入在一对源极/漏极区域之间。 有源区域具有穿过沟道区域设置的台面。 台面延伸到源极/漏极区域。 栅电极设置成跨过台面的方向跨越有源区。