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    3-dimensional flash memory device, method of fabrication and method of operation
    4.
    发明授权
    3-dimensional flash memory device, method of fabrication and method of operation 失效
    3维闪存器件，制造方法和操作方法

    公开(公告)号：US07960844B2

    公开(公告)日：2011-06-14

    申请号：US12499980

    申请日：2009-07-09

    申请人： Young-Chul Jang ,  Han-Soo Kim ,  Jae-Hun Jeong ,  Soon-Moon Jung

    发明人： Young-Chul Jang ,  Han-Soo Kim ,  Jae-Hun Jeong ,  Soon-Moon Jung

    IPC分类号： H01L23/48

    CPC分类号： H01L27/11578 ,  H01L27/11524 ,  H01L27/11551 ,  H02J2007/0049

    摘要： Disclosed are a flash memory device and method of operation. The flash memory device includes a bottom memory cell array and a top memory cell array disposed over the bottom memory cell array. The bottom memory cell array includes a bottom semiconductor layer, a bottom well, and a plurality of bottom memory cell units. The top memory cell array includes a top semiconductor layer, a top well, and a plurality of top memory cell units. A well bias line is disposed over the top memory cell array and includes a bottom well bias line and a top well bias line, The bottom well bias line is electrically connected to the bottom well, and the top well bias line is electrically connected to the top well.

    摘要翻译： 公开了闪存装置和操作方法。 闪速存储器件包括底部存储单元阵列和设置在底部存储单元阵列上的顶部存储器单元阵列。 底部存储单元阵列包括底部半导体层，底部阱以及多个底部存储单元单元。 顶部存储单元阵列包括顶部半导体层，顶部阱以及多个顶部存储单元。 井顶偏置线设置在顶部存储单元阵列上，并且包括底部阱偏置线和顶部阱偏置线。底部阱偏置线电连接到底部阱，并且顶部阱偏置线电连接到 顶好

    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof
    5.
    发明授权
    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof 有权
    多层非易失性存储器件，采用这种器件的存储器系统及其制造方法

    公开(公告)号：US07936002B2

    公开(公告)日：2011-05-03

    申请号：US12456391

    申请日：2009-06-16

    申请人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    发明人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    IPC分类号： H01L29/76 ,  H01L31/036 ,  H01L31/112 ,  H01L29/94 ,  H01L31/062

    CPC分类号： H01L21/82385 ,  H01L21/8221 ,  H01L21/823425 ,  H01L21/823456 ,  H01L21/823468 ,  H01L23/481 ,  H01L23/485 ,  H01L27/0688 ,  H01L27/11526 ,  H01L27/11551 ,  H01L2224/9202 ,  H01L21/76898

    摘要： In multiple-layered memory devices, memory systems employing the same, and methods of forming such devices, a second memory device layer on a first memory device layer comprises a second substrate including a second memory cell region. The second substrate includes only a single well in the second memory cell region, the single well of the second memory cell region comprising a semiconducting material doped with impurity of one of a first type and second type. The single well defines an active region in the second memory cell region of the second substrate. Multiple second cell strings are arranged on the second substrate in the second active region. Although the second memory cell region includes only a single well, during a programming or erase operation of the memory cells of the second layer, requiring a high voltage to be applied to the single well in the substrate of the second layer, the high voltage will not interfere with the operation of the peripheral transistors of the first layer, second layer, or other layers, since they are isolated from each other. As a result, the substrate of the second layer can be prepared to have a thinner profile, and with fewer processing steps, resulting in devices with higher-density, greater reliability, and reduced fabrication costs.

    摘要翻译： 在多层存储器件中，采用该器件的存储器系统和形成这种器件的方法在第一存储器件层上的第二存储器件层包括包括第二存储单元区域的第二衬底。 第二衬底仅包括第二存储单元区域中的单个阱，第二存储单元区域的单阱包括掺杂有第一类型和第二类型之一杂质的半导体材料。 单阱限定了第二衬底的第二存储单元区域中的有源区。 多个第二电池串被布置在第二有源区域中的第二衬底上。 虽然第二存储单元区域仅包括单个阱，但是在第二层的存储单元的编程或擦除操作期间，需要向第二层的衬底中的单个阱施加高电压，高电压将 不妨碍第一层，第二层或其它层的外围晶体管的操作，因为它们彼此隔离。 结果，第二层的基底可以被制备成具有更薄的轮廓，并且具有更少的加工步骤，导致具有更高密度，更高可靠性和降低制造成本的装置。

    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof
    6.
    发明申请
    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof 有权
    多层非易失性存储器件，采用这种器件的存储器系统及其制造方法

    公开(公告)号：US20090315095A1

    公开(公告)日：2009-12-24

    申请号：US12456391

    申请日：2009-06-16

    申请人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    发明人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    IPC分类号： H01L29/788 ,  H01L21/336

    CPC分类号： H01L21/82385 ,  H01L21/8221 ,  H01L21/823425 ,  H01L21/823456 ,  H01L21/823468 ,  H01L23/481 ,  H01L23/485 ,  H01L27/0688 ,  H01L27/11526 ,  H01L27/11551 ,  H01L2224/9202 ,  H01L21/76898

    摘要： In multiple-layered memory devices, memory systems employing the same, and methods of forming such devices, a second memory device layer on a first memory device layer comprises a second substrate including a second memory cell region. The second substrate includes only a single well in the second memory cell region, the single well of the second memory cell region comprising a semiconducting material doped with impurity of one of a first type and second type. The single well defines an active region in the second memory cell region of the second substrate. Multiple second cell strings are arranged on the second substrate in the second active region. Although the second memory cell region includes only a single well, during a programming or erase operation of the memory cells of the second layer, requiring a high voltage to be applied to the single well in the substrate of the second layer, the high voltage will not interfere with the operation of the peripheral transistors of the first layer, second layer, or other layers, since they are isolated from each other. As a result, the substrate of the second layer can be prepared to have a thinner profile, and with fewer processing steps, resulting in devices with higher-density, greater reliability, and reduced fabrication costs.

    摘要翻译： 在多层存储器件中，采用该器件的存储器系统和形成这种器件的方法在第一存储器件层上的第二存储器件层包括包括第二存储单元区域的第二衬底。 第二衬底仅包括第二存储单元区域中的单个阱，第二存储单元区域的单阱包括掺杂有第一类型和第二类型之一杂质的半导体材料。 单阱限定了第二衬底的第二存储单元区域中的有源区。 多个第二电池串被布置在第二有源区域中的第二衬底上。 虽然第二存储单元区域仅包括单个阱，但是在第二层的存储单元的编程或擦除操作期间，需要向第二层的衬底中的单个阱施加高电压，高电压将 不妨碍第一层，第二层或其它层的外围晶体管的操作，因为它们彼此隔离。 结果，第二层的基底可以被制备成具有更薄的轮廓，并且具有更少的加工步骤，导致具有更高密度，更高可靠性和降低制造成本的装置。

    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof
    7.
    发明授权
    Multiple-layer non-volatile memory devices, memory systems employing such devices, and methods of fabrication thereof 有权
    多层非易失性存储器件，采用这种器件的存储器系统及其制造方法

    公开(公告)号：US08227306B2

    公开(公告)日：2012-07-24

    申请号：US13069869

    申请日：2011-03-23

    申请人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    发明人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    IPC分类号： H01L21/336 ,  H01L21/8234 ,  H01L21/3205 ,  H01L21/4763

    CPC分类号： H01L21/82385 ,  H01L21/8221 ,  H01L21/823425 ,  H01L21/823456 ,  H01L21/823468 ,  H01L23/481 ,  H01L23/485 ,  H01L27/0688 ,  H01L27/11526 ,  H01L27/11551 ,  H01L2224/9202 ,  H01L21/76898

    摘要： In multiple-layered memory devices, memory systems employing the same, and methods of forming such devices, a second memory device layer on a first memory device layer comprises a second substrate including a second memory cell region. The second substrate includes only a single well in the second memory cell region, the single well of the second memory cell region comprising a semiconducting material doped with impurity of one of a first type and second type. The single well defines an active region in the second memory cell region of the second substrate. Multiple second cell strings are arranged on the second substrate in the second active region. Although the second memory cell region includes only a single well, during a programming or erase operation of the memory cells of the second layer, requiring a high voltage to be applied to the single well in the substrate of the second layer, the high voltage will not interfere with the operation of the peripheral transistors of the first layer, second layer, or other layers, since they are isolated from each other. As a result, the substrate of the second layer can be prepared to have a thinner profile, and with fewer processing steps, resulting in devices with higher-density, greater reliability, and reduced fabrication costs.

    摘要翻译： 在多层存储器件中，采用该器件的存储器系统和形成这种器件的方法在第一存储器件层上的第二存储器件层包括包括第二存储单元区域的第二衬底。 第二衬底仅包括第二存储单元区域中的单个阱，第二存储单元区域的单阱包括掺杂有第一类型和第二类型之一杂质的半导体材料。 单阱限定了第二衬底的第二存储单元区域中的有源区。 多个第二电池串被布置在第二有源区域中的第二衬底上。 虽然第二存储单元区域仅包括单个阱，但是在第二层的存储单元的编程或擦除操作期间，需要向第二层的衬底中的单个阱施加高电压，高电压将 不妨碍第一层，第二层或其它层的外围晶体管的操作，因为它们彼此隔离。 结果，第二层的基底可以被制备成具有更薄的轮廓，并且具有更少的加工步骤，导致具有更高密度，更高可靠性和降低制造成本的装置。

    MULTIPLE-LAYER NON-VOLATILE MEMORY DEVICES, MEMORY SYSTEMS EMPLOYING SUCH DEVICES, AND METHODS OF FABRICATION THEREOF
    8.
    发明申请
    MULTIPLE-LAYER NON-VOLATILE MEMORY DEVICES, MEMORY SYSTEMS EMPLOYING SUCH DEVICES, AND METHODS OF FABRICATION THEREOF 有权
    多层非易失性存储器件，使用这种器件的存储器系统及其制造方法

    公开(公告)号：US20110171787A1

    公开(公告)日：2011-07-14

    申请号：US13069869

    申请日：2011-03-23

    申请人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    发明人： Jonghyuk Kim ,  Han-Soo Kim ,  YoungSeop Rah ,  Min-sung Song ,  Jang Young Chul ,  Soon-Moon Jung ,  Wonseok Cho

    IPC分类号： H01L21/8246

    CPC分类号： H01L21/82385 ,  H01L21/8221 ,  H01L21/823425 ,  H01L21/823456 ,  H01L21/823468 ,  H01L23/481 ,  H01L23/485 ,  H01L27/0688 ,  H01L27/11526 ,  H01L27/11551 ,  H01L2224/9202 ,  H01L21/76898

    摘要： In multiple-layered memory devices, memory systems employing the same, and methods of forming such devices, a second memory device layer on a first memory device layer comprises a second substrate including a second memory cell region. The second substrate includes only a single well in the second memory cell region, the single well of the second memory cell region comprising a semiconducting material doped with impurity of one of a first type and second type. The single well defines an active region in the second memory cell region of the second substrate. Multiple second cell strings are arranged on the second substrate in the second active region. Although the second memory cell region includes only a single well, during a programming or erase operation of the memory cells of the second layer, requiring a high voltage to be applied to the single well in the substrate of the second layer, the high voltage will not interfere with the operation of the peripheral transistors of the first layer, second layer, or other layers, since they are isolated from each other. As a result, the substrate of the second layer can be prepared to have a thinner profile, and with fewer processing steps, resulting in devices with higher-density, greater reliability, and reduced fabrication costs.

    摘要翻译： 在多层存储器件中，采用该器件的存储器系统和形成这种器件的方法在第一存储器件层上的第二存储器件层包括包括第二存储单元区域的第二衬底。 第二衬底仅包括第二存储单元区域中的单个阱，第二存储单元区域的单阱包括掺杂有第一类型和第二类型之一杂质的半导体材料。 单阱限定了第二衬底的第二存储单元区域中的有源区。 多个第二电池串被布置在第二有源区域中的第二衬底上。 虽然第二存储单元区域仅包括单个阱，但是在第二层的存储单元的编程或擦除操作期间，需要向第二层的衬底中的单个阱施加高电压，高电压将 不妨碍第一层，第二层或其它层的外围晶体管的操作，因为它们彼此隔离。 结果，第二层的基底可以被制备成具有更薄的轮廓，并且具有更少的加工步骤，导致具有更高密度，更高可靠性和降低制造成本的装置。

    Semiconductor device having driving transistors
    10.
    发明授权
    Semiconductor device having driving transistors 有权
    具有驱动晶体管的半导体器件

    公开(公告)号：US08258517B2

    公开(公告)日：2012-09-04

    申请号：US12473055

    申请日：2009-05-27

    申请人： Jong-In Yun ,  Soon-Moon Jung ,  Han-Soo Kim ,  Hoo-Sung Cho ,  Jun-Beom Park ,  Jae-Hun Jeong

    发明人： Jong-In Yun ,  Soon-Moon Jung ,  Han-Soo Kim ,  Hoo-Sung Cho ,  Jun-Beom Park ,  Jae-Hun Jeong

    IPC分类号： H01L29/08

    CPC分类号： H01L21/76224 ,  H01L21/8221 ,  H01L27/0688 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

    摘要： One embodiment exemplarily described herein can be generally characterized as a semiconductor device that includes a lower level device layer located over a semiconductor substrate, an interlayer insulating film located over the lower level device layer and an upper level device layer located over the interlayer insulating film. The lower level device layer may include a plurality of devices formed in the substrate. The upper level device layer may include a plurality of semiconductor patterns and at least one device formed in each of the plurality of semiconductor patterns. The plurality of semiconductor patterns may be electrically isolated from each other. Each of the plurality of semiconductor patterns may include at least one active portion and at least one body contact portion electrically connected to the at least one active portion.

    摘要翻译： 本文示例性描述的一个实施方案通常可以表征为半导体器件，其包括位于半导体衬底上方的较低级器件层，位于下级器件层上的层间绝缘膜和位于层间绝缘膜上方的上位器件层。 下层器件层可以包括形成在衬底中的多个器件。 上级器件层可以包括多个半导体图案和形成在多个半导体图案中的每一个中的至少一个器件。 多个半导体图案可以彼此电隔离。 多个半导体图案中的每一个可以包括至少一个有效部分和至少一个电连接到该至少一个有效部分的主体接触部分。