摘要:
A method and device for preventing the bridging of adjacent metal traces in a bump-on-trace structure. An embodiment comprises determining the coefficient of thermal expansion (CTE) and process parameters of the package components. The design parameters are then analyzed and the design parameters may be modified based on the CTE and process parameters of the package components.
摘要:
A method and device for preventing the bridging of adjacent metal traces in a bump-on-trace structure. An embodiment comprises determining the coefficient of thermal expansion (CTE) and process parameters of the package components. The design parameters are then analyzed and the design parameters may be modified based on the CTE and process parameters of the package components.
摘要:
A silicon photo-detection module is disclosed, in which a silicon photodiode detection unit and a parasitical vertical bipolar junction transistor amplification unit can be simultaneously formed by a CMOS process. The silicon photo-detection module has a silicon substrate, a silicon photodiode detection unit comprising a positive portion and a negative portion, and a parasitical vertical bipolar junction transistor amplification unit comprising a collector, a base, and an emitter. The silicon photodiode detection unit and the parasitical vertical bipolar junction transistor amplification unit are formed on the silicon substrate by a CMOS process. Besides, the positive and negative portions of the silicon photodiode detection unit are electrically connected respectively with the base and the collector of the parasitical vertical bipolar junction transistor amplification unit.
摘要:
The present invention provides a method for purifying baculovirus comprising: providing a baculovirus mixture containing a baculovirus and a liquid portion; replacing the liquid portion with a binding buffer by an ultrafiltration system to form a virus buffer; and purifying the baculovirus from the virus buffer using glycoprotein specific affinity chromatography. Therefore, use of the method of the present invention in the purification of baculovirus resulted in an enhanced discovery yield and improved purity of virus.
摘要:
A method for forming a porous material is to mix a porous first basic material with a sacrificial material compatible with the first basic material to let the sacrificial material permeate into the pores of the first basic material to form a first finished product. Subsequently, the first finished product is mixed with a second basic material and heated over the vaporization temperature of the sacrificial material to let the ingredients of the second basic material change and increase viscous force and impossible to enter the pores of the first basic material. Simultaneously, the sacrificial material is heated and vaporized to exhaust out of the pores of the first basic material, disabling the second basic material to permeate into the pores of the first basic material and thus forming a second finished product for reserving the ingredients in the pores of the first basic material.
摘要:
A silicon photodiode with symmetry layout and deep well bias in CMOS technology is provided. The silicon photodiode includes a substrate, a deep well, and a PN diode structure. The deep well is disposed on the substrate, where an extra bias is applied to the deep well. The region surrounded by the deep well forms the main body of the silicon photodiode. The PN diode structure is located in the region surrounded by the deep well, where the silicon photodiode has a symmetry layout. The deep well is adopted when fabricating the silicon photodiode, and the extra bias is applied to the deep well to eliminate the interference and effect of the substrate absorbing light, and further greatly improve speed and bandwidth. Furthermore, the silicon photodiode has a symmetry layout, so that uniform electric field distribution is achieved, and the interference of the substrate noise is also reduced.
摘要:
A silicon photodiode with symmetry layout and deep well bias in CMOS technology is provided. The silicon photodiode includes a substrate, a deep well, and a PN diode structure. The deep well is disposed on the substrate, where an extra bias is applied to the deep well. The region surrounded by the deep well forms the main body of the silicon photodiode. The PN diode structure is located in the region surrounded by the deep well, where the silicon photodiode has a symmetry layout. The deep well is adopted when fabricating the silicon photodiode, and the extra bias is applied to the deep well to eliminate the interference and effect of the substrate absorbing light, and further greatly improve speed and bandwidth. Furthermore, the silicon photodiode has a symmetry layout, so that uniform electric field distribution is achieved, and the interference of the substrate noise is also reduced.
摘要:
A heating assembly includes two permanent magnets arranged in a spaced manner to define a path therebetween for passage of a plurality of stainless steel nails, and an inductive coil wound around an extending direction of the path in such a way that the inductive coil has a number of loops arranged along two opposite sides of the permanent magnets. Thus, when the stainless steel nails move through the path, the inductive coil can receive a low-intensity operation current to heat the stainless steel nails to a predetermined temperature.