Nano-wire growth
    1.
    发明授权

    公开(公告)号:US11618970B2

    公开(公告)日:2023-04-04

    申请号:US17115238

    申请日:2020-12-08

    Applicant: SILCOTEK CORP.

    Inventor: Min Yuan

    Abstract: Nano-wire growth processes, nano-wires, and articles having nano-wires are disclosed. The nano-wire growth process includes trapping growth-inducing particles on a substrate, positioning the substrate within a chamber, closing the chamber, applying a vacuum to the chamber, introducing a precursor gas to the chamber, and thermally decomposing the precursor gas. The thermally decomposing of the precursor gas grows nano-wires from the growth-inducing particles. The nano-wires and the articles having the nano-wires are produced by the nano-wire growth process.

    LIQUID CHROMATOGRAPHY SYSTEM AND COMPONENT

    公开(公告)号:US20210381105A1

    公开(公告)日:2021-12-09

    申请号:US17411545

    申请日:2021-08-25

    Applicant: SILCOTEK CORP.

    Inventor: Gary A. BARONE

    Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.

    Silicon-nitride-containing thermal chemical vapor deposition coating

    公开(公告)号:US10087521B2

    公开(公告)日:2018-10-02

    申请号:US14970015

    申请日:2015-12-15

    Applicant: SILCOTEK CORP.

    Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.

    LIQUID CHROMATOGRAPHY SYSTEM AND COMPONENT
    7.
    发明公开

    公开(公告)号:US20240327981A1

    公开(公告)日:2024-10-03

    申请号:US18743370

    申请日:2024-06-14

    Applicant: SILCOTEK CORP.

    Inventor: Gary A. BARONE

    CPC classification number: C23C16/45523 C23C16/24 C23C16/045

    Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.

    HEAT EXCHANGER PROCESS
    9.
    发明公开

    公开(公告)号:US20230258418A1

    公开(公告)日:2023-08-17

    申请号:US18018416

    申请日:2021-06-16

    Applicant: SILCOTEK CORP.

    Inventor: Gary A. BARONE

    CPC classification number: F28F19/02 F28F2265/20

    Abstract: Heat exchanger processes are disclosed. A heat exchanger process uses a heat exchanger. The heat exchanger has a surface positioned to be contacted by a fluid. The heat exchanger process includes contacting the surface with the fluid by transporting the fluid through the heat exchanger and transferring heat between the surface and the fluid. The transporting is at a rate of less than 2 meters per second, the surface includes a fouling-resistant coating, the fluid includes particles known to cause fouling, or a combination thereof.

    FLUID CONTACT PROCESS, COATED ARTICLE, AND COATING PROCESS

    公开(公告)号:US20220025512A1

    公开(公告)日:2022-01-27

    申请号:US17297123

    申请日:2019-11-29

    Applicant: SILCOTEK CORP.

    Inventor: Min YUAN

    Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethyl silane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.

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