利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

66 条记录 (耗时 0.022 秒)

    X-ray analysis in air
    2.
    发明授权
    X-ray analysis in air 有权

    公开(公告)号：US09704688B2

    公开(公告)日：2017-07-11

    申请号：US15024773

    申请日：2014-09-25

    申请人： Oxford Instruments Nanotechnology Tools Limited

    发明人： Peter Statham

    IPC分类号： H01J37/00 ,  H01J37/244 ,  H01J37/28

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/2608

    摘要： An x-ray analysis apparatus comprises an electron beam assembly for generating a focused electron beam within a first gas pressure environment. A sample assembly is used for retaining a sample within a second gas pressure environment such that the sample receives the electron beam from the electron beam assembly and such that the gas pressure in the second gas pressure environment is greater than the gas pressure within the first gas pressure environment. An x-ray detector is positioned so as to have at least one x-ray sensor element within the first gas pressure environment. The sensor element is mounted to a part of the electron beam assembly which is proximal to the sample assembly and further arranged in use to receive x-rays generated by the interaction between the electron beam and the sample.

    BACK SCATTERED ELECTRON DETECTOR
    3.
    发明申请
    BACK SCATTERED ELECTRON DETECTOR 有权
    返回散射电子探测器

    公开(公告)号：US20140339436A1

    公开(公告)日：2014-11-20

    申请号：US14287016

    申请日：2014-05-24

    申请人： TOTO LTD. ,  Hitachi High-Technologies Corporation

    发明人： Toshihiro Aoshima

    IPC分类号： H01J37/244 ,  H01J37/29

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475

    摘要： It is an object of the present invention to provide a back scattered electron detector suitable for implementing a method for determining beforehand in which region of a sample an X-ray detector can obtain an accurate X-ray detection image and perform an appropriate analysis. A Coax-BSE detector which is a back scattered electron detector includes a BSE element, a support member that supports the BSE element, and a fixing member to fix the support member to the X-ray detector, in which the fixing member fixes the support member by clamping a side portion on the distal end side which is an X-ray receiving side of a housing that covers the X-ray detector.

    摘要翻译： 本发明的目的是提供一种背散射电子检测器，其适用于预先确定X射线检测器可以在哪个区域获得准确的X射线检测图像并进行适当的分析的方法。 作为背散射电子检测器的同轴BSE检测器包括BSE元件，支撑BSE元件的支撑构件和将支撑构件固定到X射线检测器的固定构件，其中固定构件固定支撑件 通过夹持作为覆盖X射线检测器的壳体的X射线接收侧的前端侧的侧部来构成。

    Method and system for tomographic projection correction
    5.
    发明授权
    Method and system for tomographic projection correction 有权
    断层投影校正的方法和系统

    公开(公告)号：US08353628B1

    公开(公告)日：2013-01-15

    申请号：US12631739

    申请日：2009-12-04

    申请人： Wenbing Yun ,  Ying Xu ,  Frederick W. Duewer ,  Mason Freed ,  Chao-chih Hsu

    发明人： Wenbing Yun ,  Ying Xu ,  Frederick W. Duewer ,  Mason Freed ,  Chao-chih Hsu

    IPC分类号： G01D18/00 ,  A61B6/00

    CPC分类号： H01J37/252 ,  H01J37/244 ,  H01J2237/226 ,  H01J2237/24415 ,  H01J2237/2446

    摘要： The position of the sample is measured and used to correct for any off-axis motion during tomography using x-ray projection microscope system with a rotation stage system. The position is sensed using a precision-machined, low-CTE gold-coated cylinder or disc and three to five capacitive distance sensors. The correction can then be performed purely as image processing in software, by applying an appropriate shift in X and Y of the captured x-ray projections. A calibration is often necessary for each system (gold disc plus sensors plus sample stage) to account for any machining errors of the gold disc or positioning errors of the capacitive sensors. This calibration should also be repeated whenever any maintenance is performed on the metrology setup.

    摘要翻译： 使用具有旋转平台系统的X射线投影显微镜系统，测量样品的位置并用于校正层析成像期间的任何离轴运动。 使用精密加工的低CTE镀金圆柱或圆盘和三到五个电容式距离传感器感测位置。 然后，可以通过在捕获的X射线投影的X和Y中应用适当的偏移来纯化地作为软件中的图像处理执行校正。 每个系统（金盘加传感器加样品台）通常需要进行校准，以解决金盘的任何加工误差或电容式传感器的定位误差。 每当在计量设置上执行任何维护时，也应重复此校准。

    Electron microscope with integrated detector(s)
    6.
    发明授权
    Electron microscope with integrated detector(s) 有权
    带集成检测器的电子显微镜

    公开(公告)号：US08334511B2

    公开(公告)日：2012-12-18

    申请号：US12735499

    申请日：2010-05-14

    申请人： Frederick H. Schamber ,  Cornelis G. Van Beek

    发明人： Frederick H. Schamber ,  Cornelis G. Van Beek

    IPC分类号： G01N23/00

    CPC分类号： H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/24415 ,  H01J2237/2807

    摘要： An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and an x-ray detector positioned within the vacuum chamber. The x-ray detector includes an x-ray sensitive solid-state sensor and a mechanical support system for supporting and positioning the detector, including the sensor, within the vacuum chamber. The entirety of the mechanical support system is contained within the vacuum chamber. Multiple detectors of different types may be supported within the vacuum chamber on the mechanical support system. The mechanical support system may also include at least one thermoelectric cooler element for thermo-electrically cooling the x-ray sensors.

    摘要翻译： 一种电子显微镜，包括用于容纳要分析的试样的真空室，包括电子源和最终探针形成透镜的光学柱，用于聚焦从电子源发射的电子，位于探针下方的真空室中的样品台 用于保持样本的成像透镜和位于真空室内的x射线检测器。 X射线检测器包括一个x射线敏感固态传感器和一个用于在真空室内支撑和定位包括传感器的检测器的机械支撑系统。 整个机械支撑系统被包含在真空室内。 可以在机械支撑系统上的真空室内支撑不同类型的多个检测器。 机械支撑系统还可以包括用于热电冷却x射线传感器的至少一个热电冷却器元件。

    Film thickness measurement using electron-beam induced x-ray microanalysis
    7.
    发明授权
    Film thickness measurement using electron-beam induced x-ray microanalysis 失效
    使用电子束诱导X射线微量分析的膜厚度测量

    公开(公告)号：US06787773B1

    公开(公告)日：2004-09-07

    申请号：US09695726

    申请日：2000-10-23

    申请人： Shing M. Lee

    发明人： Shing M. Lee

    IPC分类号： G21K700

    CPC分类号： G01B15/02 ,  G01N23/22 ,  H01J37/252 ,  H01J2237/24415 ,  H01J2237/2814

    摘要： An X-ray micoanalysis test system comprising a beam generator which induces X-rays to emanate from a semiconductor device containing film stacks. The charged particle beam will penetrate at least two layers of a film stack on a semiconductor device so that these layers may be tested. The X-rays will be detected using multiple X-ray detectors that detect X-ray photons having a specific energy level. The X-rays will then be used to analyze the characteristics of the semiconductor device. Each of the multiple X-ray detectors may be wavelength dispersive system (WDS) detectors. The present invention also provides a method for measuring film stack characteristics on a semiconductor device. The method for measuring includes directing an electron beam towards the semiconductor device so that the electron beam penetrates at least a conductive film layer and a liner layer, detecting the X-rays which are caused to emanate from the device with multiple X-ray detectors that detect X-ray photons having a specific energy level. The present invention also provides a method and a computer-readable medium which determines a film stack's properties using the data collected with the test system of the present invention. The method and computer-readable medium includes selecting a set of values which estimate the film stack characteristics, using the estimated values to generate predicted data by solving equations which model the film stack, and selecting a new set of estimated film stack characteristic values when the difference between the predicted data and the raw data is larger than a certain margin of error.

    摘要翻译： 一种X射线微分析测试系统，包括一个光束发生器，其诱发从包含膜堆的半导体器件发出的X射线。 带电粒子束将穿透半导体器件上的至少两层薄膜叠层，以便可以对这些层进行测试。 将使用检测具有特定能级的X射线光子的多个X射线检测器检测X射线。 然后将X射线用于分析半导体器件的特性。 多个X射线检测器中的每一个可以是波长色散系统（WDS）检测器。 本发明还提供了一种用于测量半导体器件上的膜叠层特性的方法。 测量方法包括将电子束引向半导体器件，使得电子束至少穿透导电膜层和衬垫层，检测由多个X射线检测器从器件发出的X射线 检测具有特定能级的X射线光子。 本发明还提供一种方法和计算机可读介质，其使用利用本发明的测试系统收集的数据来确定薄膜叠层的性质。 该方法和计算机可读介质包括选择一组估计胶片堆叠特性的值，使用估计值通过求解建模胶片堆叠的方程来生成预测数据，以及当 预测数据与原始数据之间的差异大于一定的误差范围。

    Radiation detector provided with an absorption chamber and a plurality of avalanche chambers
    8.
    发明授权
    Radiation detector provided with an absorption chamber and a plurality of avalanche chambers 失效
    辐射检测器具有吸收室和多个雪崩室

    公开(公告)号：US06452190B1

    公开(公告)日：2002-09-17

    申请号：US09621523

    申请日：2000-07-21

    申请人： Hendrik Johannes Jan Bolk ,  Klaus Bethke

    发明人： Hendrik Johannes Jan Bolk ,  Klaus Bethke

    IPC分类号： G01T118

    CPC分类号： G01N23/20 ,  G01T1/185 ,  H01J47/02 ,  H01J2237/24415

    摘要： In order to obtain suitable absorption of the radiation to be detected in the detector gas of a radiation detector, in particular an X-ray detector, the detector is constructed in such a way that the radiation enters the detector parallel to the counting wire, thus offering an absorption path having any desired length. According to the invention, a number of avalanche chambers 50 is arranged adjacent the absorption chamber 46, said avalanche chambers having a comparatively small cross-section. The avalanche chambers are provided with grids 54 in such a way that charge multiplication by the grid voltage can occur only in the avalanche chamber. Due to the comparatively small cross-section of the avalanche chambers, broadening of the current impulses to be detected is prevented. Moreover, the comparatively long absorption chamber offers good radiation absorption and the presence of several avalanche chambers enables a favourable detection rate.

    摘要翻译： 为了在放射线检测器，特别是X射线检测器的检测器气体中获得对待检测的辐射的适当吸收，检测器被构造成使得辐射与计数线平行地进入检测器，因此 提供具有任何期望长度的吸收路径。 根据本发明，多个雪崩室50邻近吸收室46设置，所述雪崩室具有较小的横截面。 雪崩室设置有栅格54，使得电网电压的充电只能在雪崩室中发生。 由于雪崩室的相对较小的横截面，防止了要检测的电流脉冲的变宽。 此外，相对较长的吸收室提供良好的辐射吸收，并且几个雪崩室的存在使得能够获得良好的检测率。

    Surface analysis method and apparatus for carrying out the same
    10.
    发明授权
    Surface analysis method and apparatus for carrying out the same 失效
    表面分析方法及其执行装置

    公开(公告)号：US5481109A

    公开(公告)日：1996-01-02

    申请号：US211575

    申请日：1994-04-11

    申请人： Ken Ninomiya ,  Hideo Todokoro ,  Tokuo Kure ,  Yasuhiro Mitsui ,  Katsuhiro Kuroda ,  Hiroyasu Shichi

    发明人： Ken Ninomiya ,  Hideo Todokoro ,  Tokuo Kure ,  Yasuhiro Mitsui ,  Katsuhiro Kuroda ,  Hiroyasu Shichi

    IPC分类号： G01N23/225 ,  H01J37/252 ,  G01N23/223

    CPC分类号： G01N23/2252 ,  H01J37/252 ,  G01N2223/076 ,  H01J2237/24415

    摘要： A surface analysis method and an apparatus for carrying out the samein which the method involves the detection of fluorescence X-rays emitted from the surface of a sample in response to a finely focused electron beam irradiated thereto, whereby residues on the sample surface are analyzed qualitatively and quantitatively. An electron beam (1) is irradiated through a hole (9) at the center of an X-ray detector (8) into a fine hole (h) on the surface of a sample (2). In response, fluorescence X-rays are emitted from inside the fine hole (h) and are detected by an annular X-ray detector (8) having an energy analysis function near the axis of the electron beam (1) (preferably within 20 degrees with respect to the center axis of the electron beam). This arrangement allows the fluorescence X-rays from the fine hole (h) to reach the X-ray detector (8) without being absorbed by the substance of the material. That in turn ensures qualitative and quantitative analysis of high accuracy about residues in fine holes of large aspect ratios. Since the method is of non-destructive nature, the analyzed sample may be placed unscathed back into the fabrication process.

    摘要翻译： PCT No.PCT / JP93 / 01373 Sec。 371日期1994年04月11日 102（e）日期1994年4月11日PCT提交1993年9月27日PCT公布。 出版物WO94 / 08232 日期1994年4月14日。表面分析方法及其实施方法涉及检测从样品表面发射的荧光X射线，其响应于照射到其上的精细聚焦的电子束，由此残留物 对样品表面进行定性和定量分析。 电子束（1）通过X射线检测器（8）的中心的孔（9）照射到样品（2）的表面上的细孔（h）中。 作为响应，从细孔（h）内部发射荧光X射线，并且通过在电子束（1）的轴附近具有能量分析功能的环形X射线检测器（8）来检测（优选在20度以内） 相对于电子束的中心轴）。 这种布置允许来自细孔（h）的荧光X射线到达X射线检测器（8）而不被材料的物质吸收。 这反过来又确保了对大长宽比的细孔中残留物的高精度的定性和定量分析。 由于该方法具有非破坏性，所以分析的样品可以无损地放置在制造过程中。