SEQUENTIALLY ETCHED AND PLATED LEAD FRAME STRUCTURE WITH ISLAND PREPACKED MOLDING COMPOUND AND MANUFACTURING METHOD THEREOF
    4.
    发明申请
    SEQUENTIALLY ETCHED AND PLATED LEAD FRAME STRUCTURE WITH ISLAND PREPACKED MOLDING COMPOUND AND MANUFACTURING METHOD THEREOF 审中-公开
    具有岛屿预处理模塑化合物的顺序蚀刻和制备的铅框架结构及其制造方法

    公开(公告)号:WO2013037183A1

    公开(公告)日:2013-03-21

    申请号:PCT/CN2012/001157

    申请日:2012-08-28

    Abstract: A method for manufacturing a lead frame structure(lOO) for semiconductor packaging includes providing a metal substrate and performing an etching process on the top surface and the back surface of the metal substrate simultaneously using a top surface etching pattern and a back surface etching pattern as the respective masks to form etched regions in the metal substrate, an island(l), and a plurality of leads(2). Further, the method includes placing the etched metal substrate in a mold, and encapsulating the etched metal substrate using the mold such that a molding compound(4) is filled in the etched regions, areas between the island and the plurality of leads, and areas between the plurality of leads, while exposing the top surfaces and the back surfaces of the island and the plurality of leads. The method also includes performing a plating process on the encapsulated metal substrate to form a first metal layer(5) on the exposed top surfaces of the island and the plurality of leads, and a second metal layer(6) on the exposed back surfaces of the island and the plurality of leads.

    Abstract translation: 制造用于半导体封装的引线框架结构(100)的方法包括:使用顶表面刻蚀图案和背面蚀刻图案同时使用金属基板并在金属基板的顶表面和背面上进行蚀刻处理 各个掩模在金属基板,岛(1)和多个引线(2)中形成蚀刻区域。 此外,该方法包括将蚀刻的金属基板放置在模具中,并且使用模具封装蚀刻的金属基板,使得模制化合物(4)填充在蚀刻区域中,岛和多个引线之间的区域以及区域 在多个引线之间,同时暴露岛和多个引线的顶表面和后表面。 该方法还包括对封装的金属基板执行电镀处理以在岛和多个引线的暴露的顶表面上形成第一金属层(5),以及在暴露的背面上的第二金属层(6) 岛和多个线索。

    ISLANDLESS PRE-ENCAPSULATED PLATING-THEN-ETCHING LEAD FRAME STRUCTURES AND MANUFACTURING METHOD
    7.
    发明申请
    ISLANDLESS PRE-ENCAPSULATED PLATING-THEN-ETCHING LEAD FRAME STRUCTURES AND MANUFACTURING METHOD 审中-公开
    不间断的预浸涂层导线框架结构和制造方法

    公开(公告)号:WO2013037186A1

    公开(公告)日:2013-03-21

    申请号:PCT/CN2012/001160

    申请日:2012-08-28

    Abstract: A method for manufacturing an islandless lead frame structure (100) for semiconductor packaging includes providing a metal substrate, forming a first photoresist film on the top surface of the metal substrate, and forming a top surface plating pattern in the first photoresist film using photolithography. The metal also includes performing a plating process on the top surface and the back surface of the metal substrate to form a first metal layer (5) on the top surface and a second metal layer (6) on the back surface. Further, the method includes performing an etching process on the top surface and the back surface of the metal substrate simultaneously using a top surface etching pattern and a back surface etching pattern as the respective masks to form etched regions in the metal substrate and a plurality of leads (2), without forming any island. Further, the method includes removing the third photoresist film and the fourth photoresist film, and pre-encapsulating the etched metal substrate using a molding compound (4) to form the pre-encapsulated lead frame structure.

    Abstract translation: 一种用于半导体封装的无岛引线框架结构(100)的制造方法包括提供金属基板,在金属基板的顶表面上形成第一光致抗蚀剂膜,以及使用光刻法在第一光致抗蚀剂膜中形成顶表面电镀图案。 金属还包括在金属基板的顶表面和背表面上进行电镀处理,以在顶表面上形成第一金属层(5),并在后表面上形成第二金属层(6)。 此外,该方法包括使用顶表面刻蚀图案和背面蚀刻图案同时对金属基板的顶表面和背表面进行蚀刻处理,以在金属基板中形成蚀刻区域,并且多个 引线(2),不形成岛。 此外,该方法包括去除第三光致抗蚀剂膜和第四光致抗蚀剂膜,并使用模塑料(4)预先封装蚀刻的金属基板以形成预封装引线框架结构。

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