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    Charged particle source with integrated energy filter
    12.
    发明公开
    Charged particle source with integrated energy filter 有权
    带集成能量过滤器的带电粒子源

    公开(公告)号：EP2128886A1

    公开(公告)日：2009-12-02

    申请号：EP09160973.5

    申请日：2009-05-25

    Applicant: FEI Company

    Inventor： Henstra, Alexander

    IPC: H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/04

    CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

    Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.
    The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

    Abstract translation: 本发明描述了发生能量选择的粒子源。 能量选择通过透过透镜107偏心地发送一束带电粒子103来发生。其结果是，能量分散将发生在由透镜形成的图像中。 通过将该图像投影到能量选择膜片108中的狭缝109上，可以仅允许能量谱的有限部分中的粒子通过。 结果，通过的光束113将具有降低的能量分布。 偏转单元112将光束偏转到光轴101.也可以选择将穿过透镜中间的光束105朝向光轴偏转并且具有例如更大的电流。 能量色散斑点由偏转器111在狭缝上成像。当将能量色散斑点定位在狭缝上时，中心光束105从轴偏转到被能量选择光阑停止的程度。 因此避免了在隔膜之后的区域中由该射束引起的反射和污染。 还避免了来自中心束的电子与偏转器112的区域中的能量滤波束相互作用所导致的电子 - 电子相互作用。

    ION SOURCE WITH SUBSTANTIALLY PLANAR DESIGN
    20.
    发明授权
    ION SOURCE WITH SUBSTANTIALLY PLANAR DESIGN 有权
    基本上平面结构离子源

    公开(公告)号：EP1825491B1

    公开(公告)日：2008-09-24

    申请号：EP05818170.2

    申请日：2005-11-07

    Applicant: Guardian, Industries Corp.

    Inventor： LUTEN, Henry, A. ,  VEERASAMY, Vijayen, S.

    IPC: H01J27/14 ,  H01J3/04 ,  H01J37/08

    CPC classification number: H01J37/08 ,  H01J3/04 ,  H01J27/143

    Abstract: In certain example embodiments of this invention, there is provide an ion source including an anode (25) and a cathode (5). In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between the anode and cathode, there is less undesirable build-up on the anode and/or cathode during operation of the ion source so that the source can run more efficiently. Moreover, in certain example embodiments, an insulator (35) such as a ceramic or the like is provided between the anode and cathode.

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