MICROMINIATURE CONTACT AND METHOD FOR MANUFACTURING SAME, AND ELECTRONIC COMPONENT
    26.
    发明公开
    MICROMINIATURE CONTACT AND METHOD FOR MANUFACTURING SAME, AND ELECTRONIC COMPONENT 有权
    密克罗尼西亚大使馆VERFAHREN ZU DESSEN HERSTELLUNG SOWIE ELEKTRONISCHES BAUTIIL

    公开(公告)号:EP1919031A1

    公开(公告)日:2008-05-07

    申请号:EP06797002.0

    申请日:2006-08-23

    Applicant: DDK Ltd.

    Abstract: A microcontact according to the invention is less than 10 mm in length and composed of a conductive basis material, a base surface treatment layer formed thereon, and an upper surface treatment layer, and includes a contact portion, a terminal portion, and an intermediate portion formed over its entire circumference with exposed oxide surfaces of the base surface treatment layer. The exposed oxide surfaces are formed by irradiating the front and rear surfaces of the contact with laser beams at respective predetermined inclined angles to remove the upper surface treatment layer and simultaneously to oxidize the narrow base surface treatment layer exposed by the removal of the upper surface treatment layer. In this manner, the exposed oxide surfaces can be formed with a high accuracy in a simple manner for stopping solder rise at a predetermined position when the terminal portion of the microcontact is jointed to a substrate by soldering.

    Abstract translation: 根据本发明的微接触体的长度小于10mm,由导电基材,形成在其上的基面处理层和上表面处理层组成,并且包括接触部分,端子部分和中间部分 在其整个圆周上形成有暴露的基底表面处理层的氧化物表面。 暴露的氧化物表面通过以相应的预定倾斜角将激光束的前表面和后表面照射以除去上表面处理层并同时氧化通过去除上表面处理而暴露的窄基面处理层而形成 层。 以这种方式,当通过焊接将微接触体的端子部分接合到基板上时,可以以简单的方式以高精度形成暴露的氧化物表面,以阻止在预定位置处的焊料上升。

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