Semiconductor device and semiconductor device manufacturing method
    4.
    发明专利
    Semiconductor device and semiconductor device manufacturing method 有权
    半导体器件和半导体器件制造方法

    公开(公告)号:JP2013033786A

    公开(公告)日:2013-02-14

    申请号:JP2011168021

    申请日:2011-08-01

    发明人: AOYANAGI KENICHI

    摘要: PROBLEM TO BE SOLVED: To provide a semiconductor device having a three-dimensional structure, which ensures a bonding force with preventing diffusion of an electrode material in a configuration where electrodes are bonded by bonding of two substrates thereby to achieve improvement of reliability.SOLUTION: A semiconductor device comprises: a first substrate 2 including a first electrode 33, and a first insulation film 35 composed of a diffusion prevention material of the first electrode 33 and covering around the first electrode 33, in which a bonding surface 41 is composed of the first electrode 33 and the first insulation film 35; and a second substrate 7 bonded to the first substrate 2 and including a second electrode 67 bonded to the first electrode 33, and a second insulation film 69 composed of a diffusion prevention material of the second electrode 67 and covering around the second electrode 67, in which a bonding surface 71 opposed to the first substrate 2 is composed of the second electrode 67 and the second insulation film 69.

    摘要翻译: 解决的问题:提供一种具有三维结构的半导体器件,其确保了通过两个基板的接合来结合电极的结构中的电极材料的扩散的结合力,从而实现可靠性的提高 。 解决方案:半导体器件包括:包括第一电极33的第一基板2和由第一电极33的防扩散材料构成并围绕第一电极33覆盖的第一绝缘膜35,其中接合表面 41由第一电极33和第一绝缘膜35构成; 以及第二基板7,其接合到第一基板2并且包括接合到第一电极33的第二电极67,以及由第二电极67的防扩散材料构成并围绕第二电极67覆盖的第二绝缘膜69 与第一基板2相对的接合面71由第二电极67和第二绝缘膜69构成。版权所有(C)2013,JPO&INPIT