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公开(公告)号:US20210384406A1
公开(公告)日:2021-12-09
申请号:US17321819
申请日:2021-05-17
Applicant: D-WAVE SYSTEMS INC.
Inventor: Shuiyuan Huang , Byong H. Oh , Douglas P. Stadtler , Edward G. Sterpka , Paul I. Bunyk , Jed D. Whittaker , Fabio Altomare , Richard G. Harris , Colin C. Enderud , Loren J. Swenson , Nicolas C. Ladizinsky , Jason J. Yao , Eric G. Ladizinsky
IPC: H01L39/24 , H01L21/768 , H01L23/522 , H01L23/528 , H01L23/532 , H01L27/18 , H01L39/12
Abstract: Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include masking with a hard mask and masking with a soft mask. Forming a superconducting stud via in a superconducting integrated circuit may include depositing a dielectric etch stop layer. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by an electrical vernier. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by a chain of electrical verniers and a Wheatstone bridge. A superconducting integrated circuit with three or more metal layers may include an enclosed, matched, on-chip transmission line. A metal wiring layer in a superconducting integrated circuit may be encapsulated.
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2.
公开(公告)号:US20240138268A1
公开(公告)日:2024-04-25
申请号:US18277688
申请日:2022-02-17
Applicant: D-WAVE SYSTEMS INC.
Inventor: Colin C. Enderud , Mohammad H. Amin , Loren J. Swenson
IPC: H10N60/01 , H01L23/522 , H01L23/532 , H01L25/18 , H10N60/12 , H10N60/80 , H10N69/00
CPC classification number: H10N60/0912 , H01L23/5223 , H01L23/5227 , H01L23/53285 , H01L25/18 , H10N60/12 , H10N60/805 , H10N69/00
Abstract: A method of fabrication of a superconducting device includes forming a first portion of the superconducting device on a first chip, a second portion of the superconducting device on a second chip, and bonding the first chip to the second chip, arranged in a flip-chip configuration. The first portion of the superconducting device on the first chip includes a dissipative portion of the superconducting device. A multi-layer superconducting integrated circuit is implemented so that noise-susceptible superconducting devices are positioned in wiring layers formed from a low-noise superconductive material and that underlie wiring layers that are formed from a different superconductive material. A superconducting integrated circuit has a first stack with a first superconducting wiring layer formed from a first high kinetic inductance material and a second superconducting wiring layer communicatively coupled to the first superconducting wiring layer to form a first control circuit, a second stack comprising a third superconducting wiring layer formed from a second high kinetic inductance material and a fourth superconducting wiring layer communicatively coupled the third superconducting wiring layer to form a second control circuit. The superconducting integrated circuit also has a third stack with a controllable device, and at least one of the first control circuit and the second control circuit is communicatively coupled to the controllable device.
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公开(公告)号:US20170178018A1
公开(公告)日:2017-06-22
申请号:US15382278
申请日:2016-12-16
Applicant: D-Wave Systems Inc.
Inventor: Alexandr M. Tcaciuc , Pedro A. de Buen , Peter D. Spear , Sergey V. Uchaykin , Colin C. Enderud , Richard D. Neufeld , Jeremy P. Hilton , J. Craig Petroff , Amar B. Kamdar , Gregory D. Peregrym , Edmond Ho Yin Kan , Loren J. Swenson , George E.G. Sterling , Gregory Citver
IPC: G06N99/00 , H01L39/12 , H01L39/24 , H05K3/34 , H05K9/00 , F25B43/00 , H01L39/18 , H01F41/06 , H01F41/04 , H01F13/00 , F25B9/12 , H03H3/00 , H05K1/02
CPC classification number: G06N10/00 , H01F13/006 , H01F41/048 , H01F41/076 , H01L39/02 , H01L39/14 , H03H3/00 , H03H7/425 , H03H2001/005 , H05K1/0233 , H05K1/0245 , H05K1/16 , H05K2201/10287
Abstract: An electrical filter includes a dielectric substrate with inner and outer coils about a first region and inner and outer coils about a second region, a portion of cladding removed from wires that form the coils and coupled to electrically conductive traces on the dielectric substrate via a solder joint in a switching region. An apparatus to thermally couple a superconductive device to a metal carrier with a through-hole includes a first clamp and a vacuum pump. A composite magnetic shield for use at superconductive temperatures includes an inner layer with magnetic permeability of at least 50,000; and an outer layer with magnetic saturation field greater than 1.2 T, separated from the inner layer by an intermediate layer of dielectric. An apparatus to dissipate heat from a superconducting processor includes a metal carrier with a recess, a post that extends upwards from a base of the recess and a layer of adhesive on top of the post. Various cryogenic refrigeration systems are described.
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公开(公告)号:US20250040454A1
公开(公告)日:2025-01-30
申请号:US18790374
申请日:2024-07-31
Applicant: D-WAVE SYSTEMS INC.
Inventor: Loren J. Swenson , George E.G. Sterling , Mark H. Volkmann , Colin C. Enderud
Abstract: A circuit can include a galvanic coupling of a coupler to a qubit by a segment of kinetic inductance material. The circuit can include a galvanic kinetic inductance coupler having multiple windings. The circuit can include a partially-galvanic coupler having multiple windings. The partially-galvanic coupler can include a magnetic coupling and a galvanic coupling. The circuit can include an asymmetric partially-galvanic coupler having a galvanic coupling and a first magnetic coupling to one qubit and a second magnetic coupling to a second qubit. The circuit can include a compact kinetic inductance qubit having a qubit body loop comprising a kinetic inductance material. A multilayer integrated circuit including a kinetic inductance layer can form a galvanic kinetic inductance coupling. A multilayer integrated circuit including a kinetic inductance layer can form at least a portion of a compact kinetic inductance qubit body loop.
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公开(公告)号:US11957065B2
公开(公告)日:2024-04-09
申请号:US17321819
申请日:2021-05-17
Applicant: D-WAVE SYSTEMS INC.
Inventor: Shuiyuan Huang , Byong H. Oh , Douglas P. Stadtler , Edward G. Sterpka , Paul I. Bunyk , Jed D. Whittaker , Fabio Altomare , Richard G. Harris , Colin C. Enderud , Loren J. Swenson , Nicolas C. Ladizinsky , Jason J. Yao , Eric G. Ladizinsky
IPC: H10N60/01 , H01L21/768 , H01L23/522 , H01L23/528 , H01L23/532 , H10N60/85 , H10N69/00
CPC classification number: H10N60/0156 , H01L21/76891 , H01L23/5223 , H01L23/5226 , H01L23/5227 , H01L23/528 , H01L23/53257 , H01L23/53285 , H10N60/85 , H10N69/00
Abstract: Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include masking with a hard mask and masking with a soft mask. Forming a superconducting stud via in a superconducting integrated circuit may include depositing a dielectric etch stop layer. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by an electrical vernier. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by a chain of electrical verniers and a Wheatstone bridge. A superconducting integrated circuit with three or more metal layers may include an enclosed, matched, on-chip transmission line. A metal wiring layer in a superconducting integrated circuit may be encapsulated.
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公开(公告)号:US11038095B2
公开(公告)日:2021-06-15
申请号:US16481788
申请日:2018-01-31
Applicant: D-WAVE SYSTEMS INC.
Inventor: Shuiyuan Huang , Byong H. Oh , Douglas P. Stadtler , Edward G. Sterpka , Paul I. Bunyk , Jed D. Whittaker , Fabio Altomare , Richard G. Harris , Colin C. Enderud , Loren J. Swenson , Nicolas C. Ladizinsky , Jason J. Yao , Eric G. Ladizinsky
IPC: H01L27/18 , H01L39/24 , H01L21/768 , H01L23/522 , H01L23/528 , H01L23/532 , H01L39/12
Abstract: Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include masking with a hard mask and masking with a soft mask. Forming a superconducting stud via in a superconducting integrated circuit may include depositing a dielectric etch stop layer. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by an electrical vernier. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by a chain of electrical verniers and a Wheatstone bridge. A superconducting integrated circuit with three or more metal layers may include an enclosed, matched, on-chip transmission line. A metal wiring layer in a superconducting integrated circuit may be encapsulated.
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公开(公告)号:US12102017B2
公开(公告)日:2024-09-24
申请号:US17429456
申请日:2020-02-13
Applicant: D-WAVE SYSTEMS INC.
Inventor: Loren J. Swenson , George E. G. Sterling , Mark H. Volkmann , Colin C. Enderud
CPC classification number: H10N69/00 , G06N10/40 , H10N60/12 , H10N60/805
Abstract: A circuit can include a galvanic coupling of a coupler to a qubit by a segment of kinetic inductance material. The circuit can include a galvanic kinetic inductance coupler having multiple windings. The circuit can include a partially-galvanic coupler having multiple windings. The partially-galvanic coupler can include a magnetic coupling and a galvanic coupling. The circuit can include an asymmetric partially-galvanic coupler having a galvanic coupling and a first magnetic coupling to one qubit and a second magnetic coupling to a second qubit. The circuit can include a compact kinetic inductance qubit having a qubit body loop comprising a kinetic inductance material. A multilayer integrated circuit including a kinetic inductance layer can form a galvanic kinetic inductance coupling. A multilayer integrated circuit including a kinetic inductance layer can form at least a portion of a compact kinetic inductance qubit body loop.
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8.
公开(公告)号:US20240237555A9
公开(公告)日:2024-07-11
申请号:US18277688
申请日:2022-02-17
Applicant: D-WAVE SYSTEMS INC.
Inventor: Colin C. Enderud , Mohammad H. Amin , Loren J. Swenson
IPC: H10N60/01 , H01L23/522 , H01L23/532 , H01L25/18 , H10N60/12 , H10N60/80 , H10N69/00
CPC classification number: H10N60/0912 , H01L23/5223 , H01L23/5227 , H01L23/53285 , H01L25/18 , H10N60/12 , H10N60/805 , H10N69/00
Abstract: A method of fabrication of a superconducting device includes forming a first portion of the superconducting device on a first chip, a second portion of the superconducting device on a second chip, and bonding the first chip to the second chip, arranged in a flip-chip configuration. The first portion of the superconducting device on the first chip includes a dissipative portion of the superconducting device. A multi-layer superconducting integrated circuit is implemented so that noise-susceptible superconducting devices are positioned in wiring layers formed from a low-noise superconductive material and that underlie wiring layers that are formed from a different superconductive material. A superconducting integrated circuit has a first stack with a first superconducting wiring layer formed from a first high kinetic inductance material and a second superconducting wiring layer communicatively coupled to the first superconducting wiring layer to form a first control circuit, a second stack comprising a third superconducting wiring layer formed from a second high kinetic inductance material and a fourth superconducting wiring layer communicatively coupled the third superconducting wiring layer to form a second control circuit. The superconducting integrated circuit also has a third stack with a controllable device, and at least one of the first control circuit and the second control circuit is communicatively coupled to the controllable device.
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公开(公告)号:US20240070510A1
公开(公告)日:2024-02-29
申请号:US18272235
申请日:2022-01-11
Applicant: D-WAVE SYSTEMS INC.
Inventor: Min Jan Tsai , Colin C. Enderud , Reza Molavi , Paul I. Bunyk
Abstract: Programmable components of a quantum processor may be selectively programmed using digital to analog converters (DACs). A DAC with a first stage and a second stage and first and second quantum flux parametron (OFF) loops galvanically coupled to and extending from a respective one of the first stage and the second stage is discussed. The first stage has a first storage loop interrupted by a first Josephson junction and an interface for communicating with an external component. The second stage has a second storage loop interrupted by a second Josephson junction, the second storage loop galvanically coupled to the first storage loop, the first Josephson junction and the second Josephson junction coupled in series to a first control line. A method of loading flux quanta into targeted DAC stages is also discussed.
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公开(公告)号:US20220123048A1
公开(公告)日:2022-04-21
申请号:US17429456
申请日:2020-02-13
Applicant: D-WAVE SYSTEMS INC.
Inventor: Loren J. Swenson , George E.G. Sterling , Mark H. Volkmann , Colin C. Enderud
Abstract: A circuit can include a galvanic coupling of a coupler to a qubit by a segment of kinetic inductance material. The circuit can include a galvanic kinetic inductance coupler having multiple windings. The circuit can include a partially-galvanic coupler having multiple windings. The partially-galvanic coupler can include a magnetic coupling and a galvanic coupling. The circuit can include an asymmetric partially-galvanic coupler having a galvanic coupling and a first magnetic coupling to one qubit and a second magnetic coupling to a second qubit. The circuit can include a compact kinetic inductance qubit having a qubit body loop comprising a kinetic inductance material. A multilayer integrated circuit including a kinetic inductance layer can form a galvanic kinetic inductance coupling. A multilayer integrated circuit including a kinetic inductance layer can form at least a portion of a compact kinetic inductance qubit body loop.
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