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    PATTERN FORMING METHOD, METHOD FOR FORMING PATTERNED MASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    2.
    发明申请
    PATTERN FORMING METHOD, METHOD FOR FORMING PATTERNED MASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，形成图案掩模的方法，制造电子设备的方法和电子设备

    公开(公告)号：US20160209749A1

    公开(公告)日：2016-07-21

    申请号：US15083389

    申请日：2016-03-29

    Applicant: FUJIFILM Corporation

    Inventor： Hisao YAMAMOTO ,  Shinichi SUGIYAMA

    IPC: G03F7/40 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

    CPC classification number: G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L21/0337

    Abstract: There is provided a pattern forming method which includes (I) a step of forming a first film by applying an active light-sensitive or radiation-sensitive resin composition which contains (A) a resin having a repeating unit having a group that is decomposed by the action of an acid and generates a polar group and (B) a compound that generates an acid by irradiation with active light or radiation to a substrate, (II) a step of exposing the first film, (III) a step of forming a line-and-space pattern by developing the exposed first film, and (IV) a step of coating the line-and-space pattern with a second film, in which the top width of the line pattern of the line-and-space pattern formed in Step (III) is larger than the bottom width thereof.

    Abstract translation: 提供了一种图案形成方法，其包括（I）通过施加主动感光或辐射敏感性树脂组合物形成第一膜的步骤，所述树脂组合物含有（A）具有重复单元的树脂，所述重复单元具有被 酸的作用并产生极性基团，和（B）通过用活性光或辐射照射到基底产生酸的化合物，（II）暴露第一膜的步骤，（III）形成 通过显影曝光的第一薄膜来形成线间距图案，以及（IV）用第二薄膜涂覆线间距图案的步骤，其中线间距图案的线图案的顶部宽度 在步骤（III）中形成的底部宽度大于其底部宽度。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT USED THEREFOR AND METHOD OF MANUFACTURING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    5.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT USED THEREFOR AND METHOD OF MANUFACTURING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，用于其有机溶剂开发的丙烯酸敏感或辐射敏感性树脂组合物及其制造方法，制造电子设备的方法和电子设备

    公开(公告)号：US20160004156A1

    公开(公告)日：2016-01-07

    申请号：US14853119

    申请日：2015-09-14

    Applicant: FUJIFILM CORPORATION

    Inventor： Shinichi SUGIYAMA ,  Sou KAMIMURA ,  Akiyoshi GOTO

    IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

    CPC classification number: G03F7/038 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/12 ,  C08F220/24 ,  C08F220/06 ,  C08F2220/1858

    Abstract: There is provided a pattern forming method including: (1) filtering, by using a filter, a resin solution containing (A) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (C1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition containing the resin (A) obtained from the filtrating (1) and a solvent (C2) different from the solvent (C1); (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition by using a filter; (4) forming a film by using a filtrate obtained by the filtering (3); (5) exposing the film; and (6) performing development using a developer containing an organic solvent to form a negative pattern, wherein an absolute value of the difference between solubility parameter (SPC1) of the solvent (C1) and solubility parameter (SPDEV) of the developer (C1), |SPC1−SPDEV|, is 1.00 (cal/cm3)1/2 or less.

    Abstract translation: 提供了一种图案形成方法，包括：（1）通过使用过滤器过滤包含（A）能够通过酸的作用增加其极性的树脂的树脂溶液，以降低在包含有机溶剂的显影剂中的溶解度， 和（C1）溶剂; （2）制备含有从过滤（1）得到的树脂（A）和不同于溶剂（C1）的溶剂（C2））的光化射线敏感或辐射敏感性树脂组合物; （3）使用过滤器过滤光化学敏感或辐射敏感性树脂组合物; （4）通过使用通过过滤（3）获得的滤液形成膜; （5）曝光胶片; 和（6）使用包含有机溶剂的显影剂进行显影以形成负图案，其中溶剂（C1）的溶解度参数（SPC1）与显影剂（C1）的溶解度参数（SPDEV）之间的差异的绝对值 SPC1-SPDEV |为1.00（cal / cm3）1/2以下。

    INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION
    7.
    发明公开
    INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION 审中-公开

    公开(公告)号：US20230266675A1

    公开(公告)日：2023-08-24

    申请号：US18310573

    申请日：2023-05-02

    Applicant: FUJIFILM Corporation

    Inventor： Shinichi SUGIYAMA ,  Takashi NAKAMURA

    IPC: G03F7/20 ,  G03F7/039 ,  G03F7/00

    CPC classification number: G03F7/70608 ,  G03F7/0397 ,  G03F7/70681 ,  H01L21/0273

    Abstract: Provided is an inspection method for simply measuring an ultra-small foreign substance in a composition selected from the group consisting of an actinic ray-sensitive or radiation-sensitive composition and a thermosetting composition. In addition, provided are a method for producing a composition and a method for verifying a composition, using the inspection method. The inspection method is an inspection method for a composition selected from the group consisting of an actinic ray-sensitive or radiation-sensitive composition and a thermosetting composition, the inspection method including a step X1 for applying the composition to a substrate X to form a coating film, a step X2 for removing the coating film from the substrate X using a removal solvent including an organic solvent, and a step X3 for measuring the number of defects on the substrate X after the removal of the coating film using a defect inspection device. In a case where the composition is the actinic ray-sensitive or radiation-sensitive composition, the step X2 is applied in a state where the coating film has not been subjected to an exposure treatment by irradiation with actinic rays or radiation, and in a case where the composition is the thermosetting composition, the step X2 is applied in a state where the coating film has not been subjected to a thermosetting treatment.

    PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, EACH USING THE SAME
    8.
    发明申请
    PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, EACH USING THE SAME 审中-公开
    图案形成方法，以及使用其制造电子设备和电子设备的方法

    公开(公告)号：US20150160555A1

    公开(公告)日：2015-06-11

    申请号：US14606189

    申请日：2015-01-27

    Applicant: FUJIFILM Corporation

    Inventor： Shinichi SUGIYAMA ,  Tsukasa YAMANAKA ,  Ryosuke UEBA ,  Makoto MOMOTA

    IPC: G03F7/16 ,  G03F7/30

    CPC classification number: G03F7/167 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

    Abstract: The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.

    Abstract translation: 本发明的图案形成方法包括：（i）使用光化射线敏感性或辐射敏感性树脂组合物在基材上形成第一膜的步骤，所述光敏感或辐射敏感性树脂组合物包含能够通过酸的作用而提高极性的树脂（A） 以降低在包含有机溶剂的显影剂中的溶解度; （ii）暴露第一膜的步骤; （iii）使用包含有机溶剂的显影剂显影所述曝光的第一膜以形成负色调图案的步骤; 以及（iv）在第二基板上形成第二膜以覆盖负色调图案的周边的步骤。

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