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    Method and system for noise mitigation in a multi-beam scanning electron microscopy system
    1.
    发明授权
    Method and system for noise mitigation in a multi-beam scanning electron microscopy system 有权

    公开(公告)号：US10366862B2

    公开(公告)日：2019-07-30

    申请号：US15267223

    申请日：2016-09-16

    Applicant: KLA-Tencor Corporation

    Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Mark A. McCord ,  Rainer Knippelmeyer

    IPC: H01J37/22 ,  H01J37/28 ,  H01J37/09

    Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

    Method and system for focus adjustment of a multi-beam scanning electron microscopy system
    2.
    发明授权
    Method and system for focus adjustment of a multi-beam scanning electron microscopy system 有权

    公开(公告)号：US10186396B2

    公开(公告)日：2019-01-22

    申请号：US15272194

    申请日：2016-09-21

    Applicant: KLA-Tencor Corporation

    Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

    IPC: H01J37/153 ,  H01J37/28 ,  H01J37/21

    Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

    Method and system for focus adjustment of a multi-beam scanning electron microscopy system
    7.
    发明授权
    Method and system for focus adjustment of a multi-beam scanning electron microscopy system 有权

    公开(公告)号：US10861671B2

    公开(公告)日：2020-12-08

    申请号：US16253106

    申请日：2019-01-21

    Applicant: KLA-Tencor Corporation

    Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

    IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  G02B21/20

    Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

    Multi-beam dark field imaging
    9.
    发明授权
    Multi-beam dark field imaging 有权

    公开(公告)号：US10192716B2

    公开(公告)日：2019-01-29

    申请号：US15245911

    申请日：2016-08-24

    Applicant: KLA-Tencor Corporation

    Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

    IPC: H01J37/244 ,  H01J37/28

    Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

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