公开(公告)号：US6153150A

公开(公告)日：2000-11-28

申请号：US5856

申请日：1998-01-12

申请人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

发明人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

IPC分类号： B01D47/06 ,  B01D53/75 ,  F23G7/06 ,  F23J15/02 ,  F23J15/04 ,  F01N3/10 ,  B01D53/34 ,  B01D53/74

CPC分类号： B01D47/14 ,  B01D47/06 ,  B01D53/68 ,  B01D53/75 ,  F23G7/061 ,  F23G7/065 ,  F23J15/022 ,  F23J15/04 ,  B01D2258/0216 ,  F23J2215/30 ,  F23J2217/105 ,  F23J2219/40

摘要： An apparatus is provided for treating pollutants in a gaseous stream. The apparatus employs curved tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by annular heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber employing at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

摘要翻译： 提供了一种用于处理气流中的污染物的装置。 该装置采用弯曲的管状入口，用于将气流与其它氧化惰性气体和惰性气体混合，以在反应室内混合和产生火焰。 反应室由环形加热元件加热并具有带有孔的内壁，加热的空气通过该孔进入中央反应室。 氧化气体也可通过流经填充床进行颗粒去除处理。 填充床被冷却，其上部具有空气入口以增强床中的冷凝和颗粒生长。 处理过的气流也在连续的再生洗涤器中洗涤，采用至少两个垂直分离的床，其中一个床可以再生，而另一个床可操作，使得流可以连续地通过床。

公开(公告)号：US07790120B2

公开(公告)日：2010-09-07

申请号：US11586069

申请日：2006-10-25

申请人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

发明人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

IPC分类号： F01N3/10

CPC分类号： B01D47/14 ,  B01D47/06 ,  B01D53/68 ,  B01D53/75 ,  B01D2258/0216 ,  F23G7/061 ,  F23G7/065 ,  F23J15/022 ,  F23J15/04 ,  F23J2215/30 ,  F23J2217/105 ,  F23J2219/40

摘要： An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

摘要翻译： 提供了一种用于处理气流中的污染物的装置。 该装置包括管状入口，用于将气流与其他氧化惰性气体和惰性气体混合，以在反应室内混合和产生火焰。 反应室被加热元件加热并具有带有孔的内壁，加热的空气通过该孔进入中央反应室。 氧化气体也可通过流经填充床进行颗粒去除处理。 填充床被冷却，其上部具有空气入口以增强床中的冷凝和颗粒生长。 经处理的气流还在连续的再生洗涤器中洗涤，其包括至少两个垂直分离的床，其中一个床可以再生，而另一个床可操作，使得流可以连续地通过床。

公开(公告)号：US06464944B1

公开(公告)日：2002-10-15

申请号：US09228706

申请日：1999-01-12

申请人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

发明人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

IPC分类号： F01N310

CPC分类号： B01D47/14 ,  B01D47/06 ,  B01D53/68 ,  B01D53/75 ,  B01D2258/0216 ,  F23G7/061 ,  F23G7/065 ,  F23J15/022 ,  F23J15/04 ,  F23J2215/30 ,  F23J2217/105 ,  F23J2219/40

摘要： An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

公开(公告)号：US07138096B2

公开(公告)日：2006-11-21

申请号：US09991822

申请日：2001-11-06

申请人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

发明人： Robert R. Moore ,  James D. Getty ,  Ravil Safiullin

IPC分类号： B01D47/00

CPC分类号： B01D47/14 ,  B01D47/06 ,  B01D53/68 ,  B01D53/75 ,  B01D2258/0216 ,  F23G7/061 ,  F23G7/065 ,  F23J15/022 ,  F23J15/04 ,  F23J2215/30 ,  F23J2217/105 ,  F23J2219/40

摘要： An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

摘要翻译： 提供了一种用于处理气流中的污染物的装置。 该装置包括管状入口，用于将气流与其他氧化惰性气体和惰性气体混合，以在反应室内混合和产生火焰。 反应室被加热元件加热并具有带有孔的内壁，加热的空气通过该孔进入中央反应室。 氧化气体也可通过流经填充床进行颗粒去除处理。 填充床被冷却，其上部具有空气入口以增强床中的冷凝和颗粒生长。 经处理的气流还在连续的再生洗涤器中洗涤，其包括至少两个垂直分离的床，其中一个床可以再生，而另一个床可操作，使得流可以连续地通过床。

公开(公告)号：US06635228B1

公开(公告)日：2003-10-21

申请号：US09703478

申请日：2000-10-31

申请人： Robert R. Moore ,  James D. Getty

发明人： Robert R. Moore ,  James D. Getty

IPC分类号： B01J1908

CPC分类号： H01L21/6719 ,  B01D53/323 ,  B01D53/75 ,  B01D2259/818 ,  B01J6/008 ,  B01J10/02 ,  B01J19/088 ,  B01J2219/00013 ,  B01J2219/0002 ,  B01J2219/0875 ,  B01J2219/0879 ,  B01J2219/0884 ,  B01J2219/0894 ,  C10B53/00 ,  F23G2204/201 ,  F23G2209/14 ,  F23J15/006 ,  H01J37/32009 ,  H01J37/32348 ,  H01J37/32532 ,  H01L21/6708 ,  H01L21/67196 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245

摘要： A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

摘要翻译： 降膜等离子体反应器（FFPR）为处理工艺气体提供了许多益处。 降膜等离子体反应器使用施加到径向分离的电极的高压交流电或脉冲直流电，从而产生在两个电极之间的大径向间隙内流动的工艺气体的电介质击穿。 典型的等离子体反应器通常采用固定的介电结构，这可能导致器件在电介质之间的电弧失效的电弧故障。 通过使用不断地流过电极的电介质液体，或在电极上方的固定电介质阻挡层上，可以防止这种故障。

公开(公告)号：US08597982B2

公开(公告)日：2013-12-03

申请号：US13285547

申请日：2011-10-31

申请人： David K. Foote ,  James D. Getty ,  Jiangang Zhao

发明人： David K. Foote ,  James D. Getty ,  Jiangang Zhao

IPC分类号： H01L21/00

CPC分类号： H01L21/563 ,  H01L23/49894 ,  H01L24/13 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L25/0655 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16225 ,  H01L2224/16245 ,  H01L2224/26175 ,  H01L2224/2929 ,  H01L2224/29388 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/451 ,  H01L2224/48227 ,  H01L2224/48247 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/81207 ,  H01L2224/81815 ,  H01L2224/83102 ,  H01L2224/83192 ,  H01L2224/83862 ,  H01L2224/83865 ,  H01L2224/92125 ,  H01L2224/92247 ,  H01L2924/00014 ,  H01L2924/1306 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

摘要： In an embodiment of the present invention, a method is provided for fabricating an electronics assembly having a substrate and a plurality of circuit elements. The method includes forming a liquid barrier on the substrate, placing a first circuit element on one side of the liquid barrier, and placing a second circuit element on the opposite side of the liquid barrier. A liquid is applied to the first circuit element. The method further includes using the liquid barrier to prevent the liquid applied to the first circuit element from contaminating the second circuit element so that the spacing between the first and second circuit elements can be minimized.

摘要翻译： 在本发明的实施例中，提供了一种用于制造具有基板和多个电路元件的电子组件的方法。 该方法包括在衬底上形成液体阻挡层，将第一电路元件放置在液体屏障的一侧，并将第二电路元件放置在液体屏障的相反侧。 液体被施加到第一电路元件。 该方法还包括使用液体屏障来防止施加到第一电路元件的液体污染第二电路元件，使得可以使第一和第二电路元件之间的间隔最小化。

公开(公告)号：US08333166B2

公开(公告)日：2012-12-18

申请号：US13100605

申请日：2011-05-04

申请人： Thomas V. Bolden, II ,  Elmer M. Calica ,  Robert S. Condrashoff ,  Louis Fierro ,  James D. Getty

发明人： Thomas V. Bolden, II ,  Elmer M. Calica ,  Robert S. Condrashoff ,  Louis Fierro ,  James D. Getty

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J7/24 ,  H05B31/26

CPC分类号： H01J37/32082 ,  H01J37/32174 ,  H01J37/32532 ,  H01J37/32568 ,  H01J37/32577

摘要： Plasma treatment systems and methods for distributing RF energy to electrodes in a plasma treatment system. The plasma treatment system includes power and ground busses, positive and negative phase primary electrode busses, and positive and negative phase secondary electrode busses. The power and ground busses are coupled to the secondary electrode busses by isolation transformers so that the negative phase secondary electrode buss is provided with an RF signal that is 180 degrees out of phase with the RF signal supplied to the positive phase secondary electrode buss. The secondary electrode busses are coupled to respective positive and negative phase primary electrode busses by capacitors. The primary electrode busses are each coupled to electrodes in the vacuum chamber. Load coils coupling the primary electrode busses to an RF ground may cooperative with the capacitors to adjust the input impedance at the power buss.

摘要翻译： 用于在等离子体处理系统中将RF能量分配到电极的等离子体处理系统和方法。 等离子体处理系统包括电源和接地总线，正负相母线总线以及正负相辅助电机总线。 功率和接地总线通过隔离变压器耦合到次级电池总线，使得负相位二次电池总线上提供与提供给正相二次电极母线的RF信号相差180度的RF信号。 二次电极总线通过电容器耦合到相应的正相和主相母线总线。 主电极总线各自耦合到真空室中的电极。 将主电极母线耦合到RF地的负载线圈可以与电容器协调以调节功率总线处的输入阻抗。

公开(公告)号：US20100194505A1

公开(公告)日：2010-08-05

申请号：US12364888

申请日：2009-02-03

申请人： William J. Brass ,  Louis Fierro ,  James D. Getty

发明人： William J. Brass ,  Louis Fierro ,  James D. Getty

IPC分类号： H01F7/20

CPC分类号： H01F7/0252 ,  H01J37/20 ,  H01J2237/2007 ,  H01L21/68728 ,  H01L21/68771 ,  H01L21/68778

摘要： Magnetic clips for use with a substrate holder for holding a substrate in a processing chamber of a plasma treatment system. The clip includes first and second body members each having a clamping surface and a magnet. The first body member is configured to be mechanically connected with the substrate holder. The second body member is pivotally connected by a hinge with the first body member for movement relative to the first body member between closed and opened positions. In the closed position, an edge region of the substrate is positioned between the clamping surfaces. In the opened position, the edge region is released. The magnet on the second body member magnetically attracts the magnet on the first body member, when the second body member is in the closed position, to apply a force that restrains movement of the edge region of the substrate relative to the clamping surfaces.

摘要翻译： 用于将衬底保持在等离子体处理系统的处理室中的衬底保持器使用的磁性夹具。 夹具包括每个具有夹紧表面和磁体的第一和第二主体构件。 第一本体构件被构造成与衬底保持器机械连接。 第二主体构件通过铰链枢转地连接有第一主体构件，用于相对于第一主体构件在关闭位置和打开位置之间移动。 在关闭位置，衬底的边缘区域位于夹紧表面之间。 在打开位置，边缘区域被释放。 当第二主体构件处于关闭位置时，第二主体构件上的磁体磁吸引第一主体构件上的磁体，以施加限制基板的边缘区域相对于夹紧表面的移动的力。

公开(公告)号：US20090288773A1

公开(公告)日：2009-11-26

申请号：US12123954

申请日：2008-05-20

申请人： Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

发明人： Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

IPC分类号： C23F1/08 ,  C23C14/22

CPC分类号： H01J15/02 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32577

摘要： Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

摘要翻译： 用于从源气体产生的等离子体处理产品的装置。 该装置包括真空室，在真空室内相邻布置的多个并置电极以及与电极电耦合的等离子体激发源。 该装置可以包括延伸到每个电极内部的导电构件，以与等离子体激发源建立相应的电连接。 该装置可以包括气体分配歧管和与气体分配歧管连接的多个气体输送管。 每个气体输送管具有被配置为在每个相邻的一对电极之间注入源气体的注入口。 该装置还可以包括流动限制构件，其操作以部分地阻塞每对相邻的电极对之间的周边间隙，其限制源气体从每个相邻的一对电极之间的处理室逸出。

公开(公告)号：US06852169B2

公开(公告)日：2005-02-08

申请号：US10145518

申请日：2002-05-14

申请人： James P. Fazio ,  James D. Getty ,  Leslie D. Wood

发明人： James P. Fazio ,  James D. Getty ,  Leslie D. Wood

IPC分类号： C03C25/62 ,  C03C25/68 ,  C23C16/00 ,  B65G49/07 ,  C23C14/00

CPC分类号： C03C25/68 ,  C03C25/6293 ,  Y10S414/139

摘要： Plasma processing system and methods for stripping the buffer and, optionally, removing the cladding from an optical fiber. The plasma processing system includes a holder capable of holding one or more optical fibers such that a mid-span portion of each optical fiber is exposed to a plasma generated within a processing chamber of the system and the ends of each optical fiber are unaffected by the plasma treatment. Tapered transition zones are created between the plasma-treated portion of the optical fiber and the shielded ends. Treatment may be accomplished using a plasma containing atomic and molecular radicals and ions of fluorine and oxygen.

摘要翻译： 等离子体处理系统和用于剥离缓冲器的方法，以及可选地从光纤去除包层。 等离子体处理系统包括能够保持一个或多个光纤的保持器，使得每个光纤的中跨部分暴露于在系统的处理室内产生的等离子体，并且每个光纤的端部不受 等离子体处理。 在光纤的等离子体处理部分和屏蔽端之间产生锥形过渡区。 可以使用含有原子和分子自由基以及氟和氧的离子的等离子体进行处理。