公开(公告)号：US06897268B2

公开(公告)日：2005-05-24

申请号：US10252566

申请日：2002-09-24

申请人： Ryouichi Yamamoto ,  Satoru Ohtani ,  Tomohiro Arase ,  Fumio Hattori ,  Yoshiaki Kikuchi ,  Hisayoshi Watanabe ,  Jun Iwama

发明人： Ryouichi Yamamoto ,  Satoru Ohtani ,  Tomohiro Arase ,  Fumio Hattori ,  Yoshiaki Kikuchi ,  Hisayoshi Watanabe ,  Jun Iwama

IPC分类号： B01J8/00 ,  B01J8/24 ,  C08F2/00 ,  C08F2/34 ,  C08F10/00

CPC分类号： B01J8/1809 ,  B01J8/0015 ,  B01J2208/00017 ,  B01J2208/00044 ,  B01J2208/00061 ,  B01J2208/00088 ,  B01J2208/00274 ,  B01J2208/0061 ,  C08F10/00 ,  Y10S526/901 ,  C08F2/01 ,  C08F2/34

摘要： In a gas phase olefin polymerization process using a fluidized bed vessel, an apparatus is employed having a device for measuring temperature or temperature distribution on the external wall surface of the vessel and a controlling means which predicts the progressive state of reaction inside the vessel, calculates the difference between the measured value and a target value determined beforehand and modifies polymerization conditions in relation thereto.

摘要翻译： 在使用流化床容器的气相烯烃聚合方法中，使用具有用于测量容器的外壁表面上的温度或温度分布的装置的装置以及预测容器内反应进行状态的控制装置，计算 测量值与预先确定的目标值之间的差异，并修改与之相关的聚合条件。

公开(公告)号：US06461573B1

公开(公告)日：2002-10-08

申请号：US09165365

申请日：1998-10-02

申请人： Ryouichi Yamamoto ,  Satoru Ohtani ,  Tomohiro Arase ,  Fumio Hattori ,  Yoshiaki Kikuchi ,  Hisayoshi Watanabe ,  Jun Iwama

发明人： Ryouichi Yamamoto ,  Satoru Ohtani ,  Tomohiro Arase ,  Fumio Hattori ,  Yoshiaki Kikuchi ,  Hisayoshi Watanabe ,  Jun Iwama

IPC分类号： G05D2300

CPC分类号： B01J8/1809 ,  B01J8/0015 ,  B01J2208/00017 ,  B01J2208/00044 ,  B01J2208/00061 ,  B01J2208/00088 ,  B01J2208/00274 ,  B01J2208/0061 ,  C08F10/00 ,  Y10S526/901 ,  C08F2/01 ,  C08F2/34

摘要： In a gas phase olefin polymerization process using a fluidized bed vessel, an apparatus is employed having a device for measuring temperature or temperature distribution on the external wall surface of the vessel and a controlling means which predicts the progressive state of reaction inside the vessel, calculates the difference between the measured value and a target value determined beforehand an modifies polymerization conditions.

摘要翻译： 在使用流化床容器的气相烯烃聚合方法中，使用具有用于测量容器的外壁表面上的温度或温度分布的装置的装置以及预测容器内反应进行状态的控制装置，计算 测量值与预先确定的目标值之间的差异修改聚合条件。

公开(公告)号：US08420299B2

公开(公告)日：2013-04-16

申请号：US12187128

申请日：2008-08-06

申请人： Hisayoshi Watanabe ,  Susumu Aoki

发明人： Hisayoshi Watanabe ,  Susumu Aoki

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： G03F7/16 ,  G03F7/0045 ,  G03F7/0392 ,  G11B5/3163

摘要： It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more.A forming method for a resist pattern to reduce a resist residue on a step is provided, the method comprising: forming resist film with coating resist containing photo-acid-generator on a step formed on a substrate, where gradient angle of the step is equal to 90 degrees or more, exposing said resist film and generating acid from said photo-acid-generator.

摘要翻译： 因此，本发明的目的是提供一种抗蚀剂图案的形成方法，用于在梯度角等于或大于90度的步骤中减少形成抗蚀剂图案中的抗蚀剂残留。 提供了一种用于减少步骤上的抗蚀剂残留物的抗蚀剂图案的形成方法，所述方法包括：在形成在基板上的台阶上形成具有含有光酸产生剂的涂层抗蚀剂的抗蚀剂膜，其中台阶的梯度角相等 至90度以上，露出所述抗蚀剂膜并从所述光酸发生剂产生酸。

公开(公告)号：US20100213163A1

公开(公告)日：2010-08-26

申请号：US12389688

申请日：2009-02-20

申请人： Hisayoshi Watanabe ,  Toshiomi Yokoyama ,  Nobuyuki Mori ,  Akihiro Kaneko ,  Michitaka Nishiyama ,  Kenji Yokoyama

发明人： Hisayoshi Watanabe ,  Toshiomi Yokoyama ,  Nobuyuki Mori ,  Akihiro Kaneko ,  Michitaka Nishiyama ,  Kenji Yokoyama

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49032

摘要： The present invention relates to a shaping method of a thin film layer and a manufacturing method of a perpendicular recording magnetic head using the same. In the thin film layer shaping method according to the present invention, since a second thin film of a lower etching rate is etched by a preliminary etching amount allowing for a difference between the etching rate of the second thin film and an etching rate of a first thin film in side-by-side relationship with each other, both the first and second thin films can be etched by the same etching amount through a subsequent etching step, so that the thin film layer can be shaped into a given shape. Thus, the surface of the thin film layer can be planarized.

摘要翻译： 本发明涉及薄膜层的成形方法和使用该薄膜层的垂直记录磁头的制造方法。 在根据本发明的薄膜层成形方法中，由于通过初步蚀刻量蚀刻蚀刻速率较低的第二薄膜，从而允许第二薄膜的蚀刻速率与第一薄膜的蚀刻速率之间的差异 薄膜彼此并排关系，通过后续的蚀刻步骤可以通过相同的蚀刻量来蚀刻第一和第二薄膜，使得薄膜层可以成形为给定的形状。 因此，可以平坦化薄膜层的表面。

公开(公告)号：US06916597B2

公开(公告)日：2005-07-12

申请号：US09966080

申请日：2001-10-01

申请人： Akifumi Kamijima ,  Hisayoshi Watanabe

发明人： Akifumi Kamijima ,  Hisayoshi Watanabe

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/11 ,  G03F7/26 ,  G03F7/38 ,  G03F7/40 ,  G11B5/31 ,  H01L21/027 ,  H01L21/033 ,  H01L43/12 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  G03F7/36

CPC分类号： H01L21/0334 ,  G03F7/40 ,  H01L21/0331

摘要： A thin film to be milled is formed on a substrate 1, and thereafter, a polymethylglutarimide layer and a photoresist layer are coated. Then, the photoresist layer is exposed and developed via a given mask, to form a pre-resist pattern. Then, ashing treatment is performed for the pre-resist pattern to a narrowed resist pattern. Subsequently, the thin film to be milled is milled via the resist pattern to obtain a patterned thin film.

摘要翻译： 在基板1上形成要研磨的薄膜，然后涂覆聚甲基戊二酰亚胺层和光致抗蚀剂层。 然后，通过给定的掩模曝光和显影光致抗蚀剂层，以形成预抗蚀剂图案。 然后，对抗蚀剂图案进行灰化处理至变窄的抗蚀剂图案。 随后，通过抗蚀剂图案研磨待研磨的薄膜，得到图案化的薄膜。

公开(公告)号：US5835408A

公开(公告)日：1998-11-10

申请号：US985714

申请日：1997-12-05

申请人： Takao Akaogi ,  Yasushige Ogawa ,  Tatsuya Kajita ,  Hisayoshi Watanabe ,  Minoru Yamashita

发明人： Takao Akaogi ,  Yasushige Ogawa ,  Tatsuya Kajita ,  Hisayoshi Watanabe ,  Minoru Yamashita

IPC分类号： G11C16/08 ,  G11C16/10 ,  G11C16/16 ,  G11C16/30 ,  G11C16/32 ,  G11C29/00 ,  H01L21/8247 ,  H01L27/105 ,  H01L27/115 ,  G11C16/06

CPC分类号： H01L27/11526 ,  G11C16/08 ,  G11C16/10 ,  G11C16/16 ,  G11C16/30 ,  G11C16/32 ,  G11C29/846 ,  H01L27/105 ,  H01L27/115 ,  H01L27/11543

摘要： A flash-erasable semiconductor memory device has a memory cell array including a plurality of memory cell transistors each having an insulated floating gate for storing information and a control electrode provided on the floating gate, wherein the flash-erasable semiconductor memory device includes a write control circuit supplied with a write control signal, when writing information. The write control circuit produces a control signal such that a leading edge of the drain control signal appears after a leading edge of the gate control signal. Further, the gate control circuit shuts off the gate control signal such that a trailing edge of the gate control signal appears after a trailing edge of the drain control signal.

公开(公告)号：US08654479B2

公开(公告)日：2014-02-18

申请号：US13535858

申请日：2012-06-28

申请人： Masashi Sano ,  Hiromichi Umehara ,  Mutsumi Fujita ,  Isamu Toba ,  Tatsuhiro Nojima ,  Hitoshi Hatate ,  Hisayoshi Watanabe

发明人： Masashi Sano ,  Hiromichi Umehara ,  Mutsumi Fujita ,  Isamu Toba ,  Tatsuhiro Nojima ,  Hitoshi Hatate ,  Hisayoshi Watanabe

IPC分类号： G11B5/127

CPC分类号： G11B5/607

摘要： A thin film magnetic recording head having a multilayer structure in which plural thin films are laminated and being a perpendicular recording type that applies a magnetic field perpendicularly to a magnetic recording medium and performs recording, includes a main magnetic pole exposed on an air bearing surface facing the magnetic recording medium and guiding a magnetic flux toward the magnetic recording medium, a thin film positioned beneath the main magnetic pole from a perspective of a lamination direction and configuring a sensor or a heater configured to determine a distance from the magnetic recording medium of the thin film magnetic recording head, and a light-absorbing portion positioned between the main magnetic pole and the thin film.

摘要翻译： 一种薄膜磁记录头，其具有层叠多个薄膜的多层结构，并且是垂直记录方式，其垂直于磁记录介质施加磁场并进行记录，该磁记录头包括暴露在空气轴承表面 磁记录介质，并向磁记录介质引导磁通量，从层叠方向的角度定位在主磁极下方的薄膜，以及配置传感器或加热器，该传感器或加热器被配置为确定与磁记录介质的距离 薄膜磁记录头和位于主磁极和薄膜之间的光吸收部分。

公开(公告)号：US08472137B2

公开(公告)日：2013-06-25

申请号：US12845349

申请日：2010-07-28

申请人： Kei Hirata ,  Kenkichi Anagawa ,  Michitaka Nishiyama ,  Hideyuki Yatsu ,  Shin Narushima ,  Hisayoshi Watanabe ,  Tatsuhiro Nojima

发明人： Kei Hirata ,  Kenkichi Anagawa ,  Michitaka Nishiyama ,  Hideyuki Yatsu ,  Shin Narushima ,  Hisayoshi Watanabe ,  Tatsuhiro Nojima

IPC分类号： G11B5/187 ,  G11B5/23

CPC分类号： G11B5/6082 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： The present invention relates to a magnetic head, a manufacturing method therefor, a head assembly, and a magnetic recording/reproducing apparatus. According to the present invention, it includes a magnetic pole layer, a non-magnetic layer, a trailing gap layer, and a trailing shield layer. The magnetic pole layer has a pole tip exposed on a magnetic medium-facing surface. The non-magnetic layer is laid on the magnetic pole layer. The trailing shield layer is exposed on the magnetic medium-facing surface and laid over the magnetic pole layer and the non-magnetic layer with the trailing gap layer between. The magnetic pole layer and the non-magnetic layer have a continuous tapered face opposed to a lower side of the trailing shield layer. Moreover, the tapered face extends from a trailing edge of the pole tip at a constant inclination angle.

摘要翻译： 磁头及其制造方法技术领域本发明涉及一种磁头及其制造方法，磁头组件以及磁记录/重放装置。 根据本发明，它包括磁极层，非磁性层，后隙层和后屏蔽层。 磁极层具有暴露在面向磁介质的表面上的极尖。 非磁性层铺设在磁极层上。 后屏蔽层暴露在面向磁介质的表面上，并铺设在磁极层和非磁性层之间，后隙间隔在其间。 磁极层和非磁性层具有与后屏蔽层的下侧相对的连续锥形面。 此外，锥形面从极尖的后缘以恒定的倾斜角度延伸。

公开(公告)号：US20120026629A1

公开(公告)日：2012-02-02

申请号：US12845349

申请日：2010-07-28

申请人： Kei HIRATA ,  Kenkichi Anagawa ,  Michitaka Nishiyama ,  Hideyuki Yatsu ,  Shin Narushima ,  Hisayoshi Watanabe ,  Tatsuhiro Nojima

发明人： Kei HIRATA ,  Kenkichi Anagawa ,  Michitaka Nishiyama ,  Hideyuki Yatsu ,  Shin Narushima ,  Hisayoshi Watanabe ,  Tatsuhiro Nojima

IPC分类号： G11B5/23 ,  G11B5/187 ,  G11B5/56

CPC分类号： G11B5/6082 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： The present invention relates to a magnetic head, a manufacturing method therefor, a head assembly, and a magnetic recording/reproducing apparatus. According to the present invention, it includes a magnetic pole layer, a non-magnetic layer, a trailing gap layer, and a trailing shield layer. The magnetic pole layer has a pole tip exposed on a magnetic medium-facing surface. The non-magnetic layer is laid on the magnetic pole layer. The trailing shield layer is exposed on the magnetic medium-facing surface and laid over the magnetic pole layer and the non-magnetic layer with the trailing gap layer between. The magnetic pole layer and the non-magnetic layer have a continuous tapered face opposed to a lower side of the trailing shield layer. Moreover, the tapered face extends from a trailing edge of the pole tip at a constant inclination angle.

摘要翻译： 磁头及其制造方法技术领域本发明涉及一种磁头及其制造方法，磁头组件以及磁记录/重放装置。 根据本发明，它包括磁极层，非磁性层，后隙层和后屏蔽层。 磁极层具有暴露在面向磁介质的表面上的极尖。 非磁性层铺设在磁极层上。 后屏蔽层暴露在面向磁介质的表面上，并铺设在磁极层和非磁性层之间，后隙间隔在其间。 磁极层和非磁性层具有与后屏蔽层的下侧相对的连续锥形面。 此外，锥形面从极尖的后缘以恒定的倾斜角度延伸。

公开(公告)号：US20110090595A1

公开(公告)日：2011-04-21

申请号：US12588440

申请日：2009-10-15

申请人： Kei Hirata ,  Hideyuki Ukita ,  Shin Narushima ,  Isamu Toba ,  Hiromichi Umehara ,  Hisayoshi Watanabe ,  Hideyuki Yatsu

发明人： Kei Hirata ,  Hideyuki Ukita ,  Shin Narushima ,  Isamu Toba ,  Hiromichi Umehara ,  Hisayoshi Watanabe ,  Hideyuki Yatsu

IPC分类号： G11B5/127

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

摘要： A main magnetic pole includes a first part extending from a medium facing surface to a point at a predetermined distance from the medium facing surface, and a second part other than the first part. An accommodation part for accommodating the main magnetic pole includes: a first layer having a groove; a second layer lying between the first layer and the main magnetic pole in the first layer's groove; and a third layer interposed in part between the second layer and the main magnetic pole in the first layer's groove. The second layer is formed of a metal material different from a material used to form the first layer. The third layer is formed of an inorganic insulating material. The second and third layers lie between the first layer and the first part. The second layer lies between the bottom of the first layer's groove and the second part, but the third layer does not. The distance between the bottom of the first layer's groove and the second part is smaller than that between the bottom and the first part.