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    Exposure apparatus and method thereof
    1.
    发明授权
    Exposure apparatus and method thereof 有权
    曝光装置及其方法

    公开(公告)号：US09594307B2

    公开(公告)日：2017-03-14

    申请号：US14226621

    申请日：2014-03-26

    Applicant: Samsung Display Co., Ltd.

    Inventor： Cha-Dong Kim ,  Hoon Kang ,  Chang-Hoon Kim ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Yong Sung ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Jae-Hyuk Chang

    IPC: G03B27/68 ,  G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

    Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

    MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
    5.
    发明申请
    MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权
    无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法

    公开(公告)号：US20160116847A1

    公开(公告)日：2016-04-28

    申请号：US14745366

    申请日：2015-06-19

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

    IPC: G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

    Abstract translation: 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。

    Method of measuring uniformity of exposing light and exposure system for performing the same
    9.
    发明授权
    Method of measuring uniformity of exposing light and exposure system for performing the same 有权
    测量曝光光的均匀性和进行曝光系统的方法

    公开(公告)号：US08902414B2

    公开(公告)日：2014-12-02

    申请号：US13669751

    申请日：2012-11-06

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jung-In Park ,  Cha-Dong Kim ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Hi-Kuk Lee

    IPC: G01J1/00 ,  G03F7/20

    CPC classification number: G01J1/00 ,  G03F7/20 ,  G03F7/70133

    Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

    Abstract translation: 曝光系统包括曝光装置，掩模，测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。

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