公开(公告)号：US11982940B2

公开(公告)日：2024-05-14

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US11662662B2

公开(公告)日：2023-05-30

申请号：US16994957

申请日：2020-08-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunji Song ,  Sukkoo Hong ,  Sumin Kim ,  Yechan Kim ,  Juyoung Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Songse Yi

IPC: G03F7/004 ,  G03F7/039 ,  C07D213/68 ,  C07D263/32 ,  C07D233/64 ,  C07D277/26

CPC classification number: G03F7/0045 ,  C07D213/68 ,  C07D233/64 ,  C07D263/32 ,  C07D277/26 ,  G03F7/0392

Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:






wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.

公开(公告)号：US20240241438A1

公开(公告)日：2024-07-18

申请号：US18403927

申请日：2024-01-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung Hwan PARK ,  Hyun-Ji Song ,  Juhyeon Park ,  Sungmin Ko ,  Sounghyun Jun

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/039

Abstract: A photoresist composition that includes a photosensitive polymer that can be cut by a chain scission mechanism due to light, a radical quencher including a phenol-based compound, and a photoactive compound (PAC) are provided.

公开(公告)号：US11693315B2

公开(公告)日：2023-07-04

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US10733959B2

公开(公告)日：2020-08-04

申请号：US16194876

申请日：2018-11-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongjin Lee ,  Hyelin Lee ,  Juhyeon Park ,  Kiwon Kim ,  Youngho Cho ,  Mooyoung Kim

IPC: G09G5/12 ,  G06F3/0488 ,  G06F3/14 ,  H04M1/725 ,  G09G5/00 ,  G06F9/451 ,  G06F3/0481

Abstract: An electronic device for configuring an input interface and a method therefor are provided. The electronic device includes a memory, a display, and at least one processor electrically connected to the memory and the display, wherein the memory includes instructions that, when executed, enable the at least one processor to perform a connection with an external electronic device, transmit information generated in the electronic device to the external electronic device on the basis of the connection so that the generated information is displayed on a display of the external electronic device, and provide an input interface for controlling the information displayed on the external electronic device via the display when the generated information is displayed on the display of the external electronic device.

公开(公告)号：US11681219B2

公开(公告)日：2023-06-20

申请号：US16991281

申请日：2020-08-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yechan Kim ,  Su Min Kim ,  Ju-Young Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Hyunji Song ,  Songse Yi ,  Suk Koo Hong

IPC: G03F7/004 ,  C08L35/00 ,  C07C381/12 ,  C08L25/06

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C08L25/06 ,  C08L35/00

Abstract: A resist composition including a polymer; and a compound represented by Formula 1,






in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,

公开(公告)号：US20240302742A1

公开(公告)日：2024-09-12

申请号：US18527056

申请日：2023-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sung Hwan Park ,  Sungwon Choi ,  Yoonhyun Kwak ,  Jeong Ho Mun ,  Juhyeon Park ,  Songse Yi ,  Hogeun Lee

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C08F230/08 ,  H01L21/027

CPC classification number: G03F7/038 ,  C08F212/30 ,  C08F220/1807 ,  C08F230/08 ,  H01L21/0275

Abstract: A photoresist composition includes a nonionic non-chemically amplified photoresist composition including a photosensitive polymer that includes a first repeating unit having a polarity inversion group and a second repeating unit having a sensitizing group. A method of manufacturing an integrated circuit device includes forming a photoresist film on a feature layer by using the photoresist composition, exposing a first area, which is a portion of the photoresist film, to generate secondary electron from the second repeating unit in the first area and changing a polarity of the first repeating unit by using the secondary electrons in the first area to invert a polarity of the first area, removing a non-exposed area of the photoresist film by using a developer to form a photoresist pattern including the first area, and processing the feature layer by using the photoresist pattern.

公开(公告)号：US11995264B2

公开(公告)日：2024-05-28

申请号：US17857499

申请日：2022-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Youngho Cho ,  Juhyeon Park ,  Kiwon Kim

IPC: G06F3/041 ,  G06F1/16

CPC classification number: G06F3/04166 ,  G06F1/1643 ,  G06F1/1652

Abstract: An electronic device, according to an embodiment of the disclosure, may comprise: a touchscreen including a first portion and a second portion; a memory; and a processor operatively connected to the touchscreen and the memory. The memory may store instructions that, when executed, cause the processor to: recognize a first point at which a touch input is in contact with the second portion, recognize a second point at which the touch input is separated from the touch screen, recognize at least one third point at which the touch input is periodically in contact with the touch screen in a state in which the touch input is in contact with the touch screen, and activate the touch input based on whether at least one of the second point and the at least one third point is located outside a specified area having a specified radius set with respect to the first point.

公开(公告)号：US20230152694A1

公开(公告)日：2023-05-18

申请号：US18056332

申请日：2022-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： HONGGU IM ,  Sumin Kim ,  Yechan Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Sunghwan Park ,  Juhyeon Park ,  Jicheol Park ,  Giyoung Song ,  Sukkoo Hong

IPC: G03F7/038

CPC classification number: G03F7/0384

Abstract: Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.