LIGHT-EMITTING DIODE (LED) DEVICE
    2.
    发明申请

    公开(公告)号:US20190067257A1

    公开(公告)日:2019-02-28

    申请号:US16178025

    申请日:2018-11-01

    Abstract: A light-emitting diode (LED) device configured to provide a multi-color display includes a plurality of light-emitting cells at least partially defined by a partition layer. The LED device may be configured to reduce optical interferences between the light-emitting cells. The LED device includes a plurality of light-emitting structures spaced apart from one another; a plurality of electrode layers on respective first surfaces of the light-emitting structures, a separation layer configured to electrically insulate the light-emitting structures from each other; phosphor layers on respective second surfaces of the light-emitting structures and associated with different colors, and a partition layer between the phosphor layers to separate the phosphor layers from one another. Each light-emitting cell may include a separate light-emitting structure, a separate set of one or more electrodes, and a separate phosphor layer.

    LIGHT-EMITTING DIODE (LED) DEVICE
    3.
    发明申请

    公开(公告)号:US20200066689A1

    公开(公告)日:2020-02-27

    申请号:US16662714

    申请日:2019-10-24

    Abstract: A light-emitting diode (LED) device configured to provide a multi-color display includes a plurality of light-emitting cells at least partially defined by a partition layer. The LED device may be configured to reduce optical interferences between the light-emitting cells. The LED device includes a plurality of light-emitting structures spaced apart from one another; a plurality of electrode layers on respective first surfaces of the light-emitting structures, a separation layer configured to electrically insulate the light-emitting structures from each other; phosphor layers on respective second surfaces of the light-emitting structures and associated with different colors, and a partition layer between the phosphor layers to separate the phosphor layers from one another. Each light-emitting cell may include a separate light-emitting structure, a separate set of one or more electrodes, and a separate phosphor layer.

    NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE
    4.
    发明申请
    NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE 有权
    基于氮化物的半导体发光器件

    公开(公告)号:US20140183546A1

    公开(公告)日:2014-07-03

    申请号:US13973720

    申请日:2013-08-22

    CPC classification number: H01L33/38 H01L33/405

    Abstract: A nitride-based semiconductor light-emitting device includes an n-type nitride-based semiconductor layer, an active layer, a p-type nitride-based semiconductor layer, an ohmic contact layer covering a portion of the p-type nitride-based semiconductor layer upper surface, and a p electrode including a first portion contacting the p-type nitride-based semiconductor layer and a second portion contacting the ohmic contact layer.

    Abstract translation: 氮化物系半导体发光元件包括n型氮化物系半导体层,有源层,p型氮化物系半导体层,覆盖p型氮化物系半导体的一部分的欧姆接触层 以及包括与p型氮化物类半导体层接触的第一部分和与欧姆接触层接触的第二部分的p电极。

    SEMICONDUCTOR LIGHT EMITTING DEVICE WITH DOPED BUFFER LAYER AND METHOD OF MANUFACTURING THE SAME
    5.
    发明申请
    SEMICONDUCTOR LIGHT EMITTING DEVICE WITH DOPED BUFFER LAYER AND METHOD OF MANUFACTURING THE SAME 审中-公开
    具有二极管缓冲层的半导体发光器件及其制造方法

    公开(公告)号:US20140014897A1

    公开(公告)日:2014-01-16

    申请号:US13923048

    申请日:2013-06-20

    CPC classification number: H01L33/06 H01L33/12 H01L33/32

    Abstract: According to example embodiments, a semiconductor light emitting device including a doped buffer layer includes a substrate and a buffer layer on the substrate. The doping layer may include aluminum nitride (AlN) and the buffer layer may include a doping layer. An n-type nitride semiconductor layer, an active layer, and a p-type nitride semiconductor layer may be on the buffer layer. An n-side electrode may be on the n-type nitride semiconductor layer. A p-side electrode may be on the p-type nitride semiconductor layer.

    Abstract translation: 根据示例性实施例,包括掺杂缓冲层的半导体发光器件包括衬底和衬底上的缓冲层。 掺杂层可以包括氮化铝(AlN),并且缓冲层可以包括掺杂层。 n型氮化物半导体层,有源层和p型氮化物半导体层可以在缓冲层上。 n侧电极可以在n型氮化物半导体层上。 p侧电极可以在p型氮化物半导体层上。

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