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公开(公告)号:US07217940B2
公开(公告)日:2007-05-15
申请号:US10798740
申请日:2004-03-10
申请人: William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
发明人: William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
IPC分类号: H01J35/20
CPC分类号: H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要: A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译: 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置,其可以包括反射表面,其包括第一材料,并且所述碎屑包括第二材料和/或第二材料的化合物,所述系统 并且方法可以包括受控的溅射离子源,其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构,所选择的离子化状态具有围绕选择的能量峰的分布,其具有溅射第二材料的可能性很高,并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。
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公开(公告)号:US20100176313A1
公开(公告)日:2010-07-15
申请号:US12653585
申请日:2009-12-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/02
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译: 公开了一种用于产生EUV辐射的装置,其可以包括目标材料,产生用于与靶材料相互作用的激光束的系统和一对电极。 可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。
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公开(公告)号:US06972421B2
公开(公告)日:2005-12-06
申请号:US10409254
申请日:2003-04-08
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号:US07291853B2
公开(公告)日:2007-11-06
申请号:US11493945
申请日:2006-07-26
申请人: Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
发明人: Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
IPC分类号: H01J65/04
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70825 , G03F7/70891 , G03F7/70908 , G03F7/70916 , G21K1/06 , G21K2201/064 , G21K2201/067 , H01S3/005 , H01S3/225 , H05G2/005 , H05H1/06
摘要: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.
摘要翻译: 公开了一种DPP EUV源,其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽,其可以包括多个曲线屏蔽构件,其具有通过与焦点对准的光通道连接的内表面和外表面,该屏蔽构件可以与它们之间的开放空间交替,并且可以具有形成 圆在一个轴或旋转,另一个椭圆。 源可以具有可操作地连接到收集器的温度控制机构,并且可操作地调节相应壳体部件的温度,以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角,或机械定位器 壳成员。
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公开(公告)号:US20100127186A1
公开(公告)日:2010-05-27
申请号:US12655987
申请日:2010-01-11
申请人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
CPC分类号: G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
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公开(公告)号:US07164144B2
公开(公告)日:2007-01-16
申请号:US10900839
申请日:2004-07-27
申请人: William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
发明人: William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
IPC分类号: H01J35/20
CPC分类号: G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
摘要翻译: 激光产生的等离子体(“LPP”)极紫外(“EUV”)光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件,靶 跟踪和反馈系统,包括:至少一个成像装置,其提供目标流轨迹的图像作为输出;以及流轨道误差检测器,其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差 来自与期望的等离子体起始位点相交的所需流道的流轨道。
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公开(公告)号:US07671349B2
公开(公告)日:2010-03-02
申请号:US11786145
申请日:2007-04-10
申请人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
IPC分类号: H04H1/04
CPC分类号: G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译: 公开了一种可以包括在等离子体位置处产生等离子体的系统,等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件,例如多个远离现场的多层反射镜,以及设置在等离子体和光学元件之间的流动气体,该气体建立足以在该距离上操作的气体压力, d,在离子到达光学器件之前,将离子能量降低到预先选定的值以下。 在一个实施方案中,气体可以包含氢气,并且在一个具体实施方案中,气体可以包含大于50体积%的氢气。
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公开(公告)号:US07323703B2
公开(公告)日:2008-01-29
申请号:US11647007
申请日:2006-12-27
申请人: I. Roger Oliver , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Norbert Bowering , John Viatella , David W. Myers
发明人: I. Roger Oliver , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Norbert Bowering , John Viatella , David W. Myers
IPC分类号: H01J35/20
CPC分类号: G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.
摘要翻译: 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外(“EUV”)光源多层收集器的装置和方法; 等离子体形成室内的壳体,具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开,并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅,硅,Zerodur或ULE玻璃,铝,铍,钼,铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器,以将壳体的稳态温度维持在所选择的工作温度范围内。
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公开(公告)号:US20080197297A1
公开(公告)日:2008-08-21
申请号:US11471434
申请日:2006-06-20
申请人: Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人: Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号: G01J3/10
CPC分类号: B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
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公开(公告)号:US07368741B2
公开(公告)日:2008-05-06
申请号:US11107535
申请日:2005-04-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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