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    Collector for EUV light source
    1.
    发明授权
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号：US07217940B2

    公开(公告)日：2007-05-15

    申请号：US10798740

    申请日：2004-03-10

    申请人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

    发明人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

    IPC分类号： H01J35/20

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    High repetition rate laser produced plasma EUV light source
    2.
    发明申请
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US20080197297A1

    公开(公告)日：2008-08-21

    申请号：US11471434

    申请日：2006-06-20

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： G01J3/10

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    High repetition rate laser produced plasma EUV light source
    3.
    发明授权
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US07087914B2

    公开(公告)日：2006-08-08

    申请号：US10803526

    申请日：2004-03-17

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    System method and apparatus for selecting and controlling light source bandwidth
    7.
    发明授权
    System method and apparatus for selecting and controlling light source bandwidth 有权
    选择和控制光源带宽的系统方法和装置

    公开(公告)号：US08144739B2

    公开(公告)日：2012-03-27

    申请号：US12605306

    申请日：2009-10-23

    申请人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

    发明人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

    IPC分类号： H01S3/10

    CPC分类号： H01S3/08009 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/027 ,  G01J3/06 ,  G01J3/14 ,  G01J3/18 ,  G01J2003/1208 ,  G02B5/1828 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/1067

    摘要： The bandwidth selection mechanism includes a first actuator mounted on a second face of a dispersive optical element, the second face being opposite from a reflective face, the first actuator having a first end coupled to a first end block and a second end coupled to a second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body of the dispersive optical element along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator being operative to apply equal and opposite forces to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element.

    摘要翻译： 所述带宽选择机构包括安装在分散光学元件的第二面上的第一致动器，所述第二面与反射面相对，所述第一致动器具有联接到第一端块的第一端和耦合到第二端的第二端 第一致动器可操作以对第一端块和第二端块施加相等且相反的力，以沿着主体的纵向轴线并沿垂直于反射面的第一方向弯曲分散光学元件的主体 的色散光学元件。 带宽选择机构还包括第二致动器，其可操作以在垂直于分散光学元件的反射面的第二方向上施加相等且相反的力沿着身体的纵向轴线弯曲身体。

    System Method and Apparatus for Selecting and Controlling Light Source Bandwidth
    8.
    发明申请
    System Method and Apparatus for Selecting and Controlling Light Source Bandwidth 有权
    用于选择和控制光源带宽的系统方法和装置

    公开(公告)号：US20100149647A1

    公开(公告)日：2010-06-17

    申请号：US12605306

    申请日：2009-10-23

    申请人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

    发明人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

    IPC分类号： G02B5/04

    CPC分类号： H01S3/08009 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/027 ,  G01J3/06 ,  G01J3/14 ,  G01J3/18 ,  G01J2003/1208 ,  G02B5/1828 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/1067

    摘要： A mechanism for bandwidth selection includes a dispersive optical element having a body including a reflective face of dispersion including an area of incidence extending in a longitudinal axis direction along the reflective face of the dispersive optical element. The body also includes a first end block, disposed at a first longitudinal end of the body and a second end block, disposed at a second longitudinal end of the body, the second longitudinal end being opposite the first longitudinal end. The bandwidth selection mechanism also includes a first actuator mounted on a second face of the dispersive optical element, the second face being opposite from the reflective face, the first actuator having a first end coupled to the first end block and a second end coupled to the second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator mounted on a third face of the dispersive optical element, the third face being normal to the reflective face, the second actuator having a first end coupled to the first end block with a first flexture and a second end coupled to the second end block with a second flexture, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element, the second direction also being perpendicular to the first direction the second actuator including a pressurized fluid force application mechanism. A method of selecting bandwidth is also disclosed.

    摘要翻译： 用于带宽选择的机构包括具有主体的分散光学元件，该主体包括具有沿着沿着分散光学元件的反射面的纵轴方向延伸的入射区域的分散体的反射面。 主体还包括设置在主体的第一纵向端部处的第一端部块和设置在主体的第二纵向端部处的第二端部块，第二纵向端部与第一纵向端部相对。 所述带宽选择机构还包括安装在所述分散光学元件的第二面上的第一致动器，所述第二面与所述反射面相对，所述第一致动器具有联接到所述第一端块的第一端和联接到所述第一端块的第二端 所述第一致动器可操作以对所述第一端块和所述第二端块施加相等且相反的力，以沿着所述主体的纵向轴线并沿着垂直于所述分散光学的反射面的第一方向弯曲所述主体 元件。 所述带宽选择机构还包括安装在所述分散光学元件的第三面上的第二致动器，所述第三面垂直于所述反射面，所述第二致动器具有第一端部，所述第一端部具有与所述第一端部块连接的第一弯曲部， 所述第一致动器可操作以对所述第一端块和所述第二端块施加相等且相反的力，以沿着所述主体的纵向轴线在垂直于第二方向的第二方向上弯曲所述主体 到所述分散光学元件的反射面，所述第二方向也垂直于所述第一方向，所述第二致动器包括加压流体力施加机构。 还公开了一种选择带宽的方法。