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91.发明授权公开(公告)号：US09029813B2
公开(公告)日：2015-05-12
申请号：US13112784
申请日：2011-05-20
摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
摘要翻译： 在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。 第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。 通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。 片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。
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92.发明授权Oscillator-amplifier drive laser with seed protection for an EUV light source 有权振荡器放大器驱动激光器，具有EUV光源的种子保护功能公开(公告)号：US08462425B2
公开(公告)日：2013-06-11
申请号：US13077757
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1
摘要翻译： 如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1
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公开(公告)号：US20110141865A1
公开(公告)日：2011-06-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。
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94.发明申请SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR 有权用于激光生产的等离子体超紫外线室的系统，方法和装置，具有热水和冷收集器公开(公告)号：US20100258749A1
公开(公告)日：2010-10-14
申请号：US12725167
申请日：2010-03-16
IPC分类号： H05G2/00
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
摘要翻译： 一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。
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公开(公告)号：US20100176313A1
公开(公告)日：2010-07-15
申请号：US12653585
申请日：2009-12-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译： 公开了一种用于产生EUV辐射的装置，其可以包括目标材料，产生用于与靶材料相互作用的激光束的系统和一对电极。 可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。
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公开(公告)号：US07518787B2
公开(公告)日：2009-04-14
申请号：US11452558
申请日：2006-06-14
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源，第一放大器可以具有以饱和能量（Es，1）和小信号增益（go，1）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（Es，2）和小信号增益（go，2）的增益介质，其中（go，1）>（go，2）和（Es，2）>（ Es，1）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。
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公开(公告)号：US07368741B2
公开(公告)日：2008-05-06
申请号：US11107535
申请日：2005-04-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译： 本发明提供了一种可靠，高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号：US06566667B1
公开(公告)日：2003-05-20
申请号：US09690084
申请日：2000-10-16
IPC分类号： H05H134
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.
摘要翻译： 高能光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。 优选地，电极与轴上的阳极同轴地配置。 阳极优选是中空的，并且活性气体通过阳极引入。 这允许对光谱线源进行优化和缓冲气体的单独优化。 本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中央阳极的热管冷却系统。
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公开(公告)号：US6034978A
公开(公告)日：2000-03-07
申请号：US310872
申请日：1999-05-12
申请人： Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
发明人： Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
CPC分类号： G03F7/70025 , H01S3/134 , H01S3/036
摘要： A gas discharge laser with fast response gas temperature control to maintain laser gas temperature within desired limits during burst mode operation. Preferred embodiments include a passive temperature stabilizer having fins with surface areas exposed to flowing laser gas at least equal to the surface area of the cooling fins of a laser gas heat exchanger. Preferred embodiments utilize heating elements and coolant flow control to regulate laser gas temperatures using processors programmed to anticipate idle periods.
摘要翻译： 一种具有快速响应气体温度控制的气体放电激光器，用于在脉冲串模式操作期间将激光气体温度保持在期望的限度内。 优选实施例包括具有散热片的被动温度稳定器，其表面积暴露于至少等于激光气体热交换器的冷却片的表面积的流动激光气体。 优选实施例利用加热元件和冷却剂流量控制来调节激光气体温度，使用编程为预期空闲周期的处理器。
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100.发明申请公开(公告)号：US20180184509A9
公开(公告)日：2018-06-28
申请号：US15208548
申请日：2016-07-12
IPC分类号： H05G2/00
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
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