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公开(公告)号：US20190250504A1
公开(公告)日：2019-08-15
申请号：US15776588
申请日：2018-04-16
发明人： Yoel Feler , Vladimir Levinski , Roel Gronheid , Sharon Aharon , Evgeni Gurevich , Anna Golotsvan , Mark Ghinovker
CPC分类号： G03F1/84 , G01N21/00 , G03F1/26 , G03F1/44 , G03F7/70283 , G03F7/70633 , G03F7/70683 , G06F17/5068
摘要： Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology. Pattern placement discrepancies may be reduced by using sub-resolved assist features in the mask design which have a same periodicity (fine pitch) as the periodic structure and/or by calibrating the measurement results using PPE (pattern placement error) correction factors derived by applying learning procedures to specific calibration terms, in measurements and/or simulations. Metrology targets are disclosed with multiple periodic structures at the same layer (in addition to regular target structures), e.g., in one or two layers, which are used to calibrate and remove PPE, especially when related to asymmetric effects such as scanner aberrations, off-axis illumination and other error sources.
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公开(公告)号：US10381256B2
公开(公告)日：2019-08-13
申请号：US15065430
申请日：2016-03-09
IPC分类号： H01L21/683 , H01L21/67
摘要： An apparatus for fixing a wafer, including a chuck having a surface, a plurality of through bores in the chuck extending through the surface of the chuck, a fixed vacuum bellows, and a plurality of floating air bearings, wherein the fixed vacuum bellows and a respective floating air bearing of the plurality of floating air bearings are each individually arranged in separate through bores of the plurality of through bores and elevationally above the surface of the chuck.
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公开(公告)号：US10381216B2
公开(公告)日：2019-08-13
申请号：US16231048
申请日：2018-12-21
摘要： An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
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公开(公告)号：US10379061B1
公开(公告)日：2019-08-13
申请号：US15406732
申请日：2017-01-15
CPC分类号： G01N21/9501 , G01B11/24 , G01B2210/56 , G06F17/00 , G06K9/6267 , G06T7/0004 , G06T7/60 , G06T2207/20021 , G06T2207/30148 , H01L22/12
摘要： Systems and methods for improving results of wafer higher order shape (HOS) characterization and wafer classification are disclosed. The systems and methods in accordance with the present disclosure are based on localized shapes. A wafer map is partitioned into a plurality of measurement sites to improve the completeness of wafer shape representation. Various site based HOS metric values may be calculated for wafer characterization and/or classification purposes, and may also be utilized as control input for a downstream application. In addition, polar grid partitioning schemes are provided. Such polar grid partitioning schemes may be utilized to partition a wafer surface into measurement sites having uniform site areas while providing good wafer edge region coverage.
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105.发明授权公开(公告)号：US10379057B2
公开(公告)日：2019-08-13
申请号：US14984833
申请日：2015-12-30
摘要： An illumination system, an inspection tool and a method for inspecting an object are disclosed. A configurable area light source is arranged in an illumination optical axis of an illumination beam path, wherein the configurable area light source is configured such that different beam diameters are settable. At least one illumination lens is positioned in the illumination beam path for directing a collimated beam at least onto a field of view on a surface of the object, wherein a value of an angle of incidence of the illumination optical axis of the illumination beam path equals a value of an angle of reflectance of the imaging optical axis of the imaging beam path. The invention allows the combination of the functionality of a wide angle coaxial illumination and a collimated coaxial illumination in one illumination system.
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106.发明授权公开(公告)号：US10371626B2
公开(公告)日：2019-08-06
申请号：US15387180
申请日：2016-12-21
发明人： Andrew V. Hill , Amnon Manassen , Ohad Bachar
摘要： A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.
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公开(公告)号：US20190228944A1
公开(公告)日：2019-07-25
申请号：US15980212
申请日：2018-05-15
发明人： Sameet K. Shriyan , Oscar Florendo , Joseph Maurino , Daniel Bui
IPC分类号： H01J37/12 , H01J37/147
摘要： These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the beam separator in a bifilar manner, which can maintain constant power in the beam separator coils. Wien power can be determined, and then heater coil current can be determined.
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公开(公告)号：US20190226960A1
公开(公告)日：2019-07-25
申请号：US16247012
申请日：2019-01-14
摘要： A two-dimensional nanoindentation measurement apparatus includes a first actuator that imparts a first force in a first direction, and a second actuator that imparts a second force in a second direction orthogonal to the first direction. A first elongate member has a first end attached to the first actuator and a second end attached to an indenter tip that engages the surface of the sample. A second elongate member includes a first end attached to the second actuator and a second end connected to the second end of the first elongate member. The first elongate member is rigid in the first direction and compliant in the second direction, and the second elongate member is rigid in the second direction and compliant in the first direction. The first force is imparted to the indenter tip in the first direction through the first elongate member, and the second force is imparted to the indenter tip in the second direction through the second elongate member.
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109.发明授权公开(公告)号：US10359706B1
公开(公告)日：2019-07-23
申请号：US16103386
申请日：2018-08-14
IPC分类号： G03F7/20
摘要： A sample analysis system includes a scanning electron microscope, an optical and/or eBeam inspection system, and an optical metrology system. The system further includes at least one controller. The controller is configured to receive a first plurality of selected regions of interest of the sample; generate a first critical dimension uniformity map based on a first inspection performed by the scanning electron microscope at the first selected regions of interest; determine a second plurality of selected regions of interest based on the first critical dimension uniformity map; generate a second critical dimension uniformity map based on a second inspection performed by the optical and/or eBeam inspection system at the second selected regions of interest; and determine one or more process tool control parameters based on inspection results and on overlay measurements performed on the sample by the optical metrology system.
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公开(公告)号：US10354929B2
公开(公告)日：2019-07-16
申请号：US13887524
申请日：2013-05-06
摘要： An optimized measurement recipe is determined by reducing the set of measurement technologies and ranges of machine parameters required to achieve a satisfactory measurement result. The reduction in the set of measurement technologies and ranges of machine parameters is based on available process variation information and spectral sensitivity information associated with an initial measurement model. The process variation information and spectral sensitivity information are used to determine a second measurement model having fewer floating parameters and less correlation among parameters. Subsequent measurement analysis is performed using the second, constrained model and a set of measurement data corresponding to a reduced set of measurement technologies and ranges of machine parameters. The results of the subsequent measurement analysis are compared with reference measurement results to determine if a difference between the estimated parameter values and the parameter values derived from the reference measurement is within a predetermined threshold.
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