公开(公告)号：US20170070025A1

公开(公告)日：2017-03-09

申请号：US15335266

申请日：2016-10-26

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Xiaoxu Lu ,  John Fielden

IPC: H01S3/109

CPC classification number: H01S3/109 ,  G02F1/353 ,  G02F1/3534 ,  G02F1/3558 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2201/17 ,  G02F2203/15 ,  H01S3/0092

Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.

Abstract translation: 深紫外（DUV）连续波（CW）激光器包括配置为产生具有约1μm和1.1μm之间的对应波长的基频的基本CW激光器，包括一个或多个非线性光学器件的三次谐波发生器模块 （NLO）晶体，其产生三次谐波和可选的二次谐波，以及五次谐波发生器。 第五谐波发生器模块包括在基频处谐振的腔，并且在第一NLO晶体中组合基频和三次谐波以产生第四谐波，然后在第二NLO晶体中组合第四谐波与未消耗的基频，以产生 五次谐波。 使用一个或多个透镜来分别在第一和第二NLO晶体中聚焦第三和第四谐波。

公开(公告)号：US20170063026A1

公开(公告)日：2017-03-02

申请号：US15344383

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S4/00

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract translation: 描述了用于产生亚200nm光的改进的固态激光器。 该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。 激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。 通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率，良好的稳定性和高可靠性。

公开(公告)号：US20170047207A1

公开(公告)日：2017-02-16

申请号：US15234638

申请日：2016-08-11

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Yinying Xiao-Li ,  Xuefeng Liu ,  John Fielden

IPC: H01J40/06 ,  G03F7/20 ,  H01J37/29 ,  H01J37/285 ,  H01J1/34 ,  H01J35/14

CPC classification number: G03F7/70008 ,  H01J1/304 ,  H01J1/34 ,  H01J35/065 ,  H01J37/073 ,  H01J2201/30411 ,  H01J2201/3048 ,  H01J2237/0635

Abstract: An electron source is formed on a silicon substrate having opposing first and second surfaces. At least one field emitter is prepared on the second surface of the silicon substrate to enhance the emission of electrons. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitter using a process that minimizes oxidation and defects. The field emitter can take various shapes such as pyramids and rounded whiskers. One or several optional gate layers may be placed at or slightly lower than the height of the field emitter tip in order to achieve fast and accurate control of the emission current and high emission currents. The field emitter can be p-type doped and configured to operate in a reverse bias mode or the field emitter can be n-type doped.

Abstract translation: 在具有相对的第一和第二表面的硅衬底上形成电子源。 在硅衬底的第二表面上制备至少一个场致发射体以增强电子的发射。 为了防止硅的氧化，使用最小化氧化和缺陷的工艺将薄的连续的硼层直接设置在场致发射体的输出表面上。 场发射器可以采取各种形状，例如金字塔和圆形晶须。 一个或几个可选的栅极层可以放置在或稍低于场发射极尖端的高度，以便实现对发射电流和高发射电流的快速和准确的控制。 场发射极可以是p型掺杂的并且被配置为以反偏压模式操作，或者场发射极可以是n型掺杂的。

公开(公告)号：US09559019B2

公开(公告)日：2017-01-31

申请号：US14588055

申请日：2014-12-31

Applicant: KLA-Tencor Corporation

Inventor： Michael Adel ,  Leonid Poslavsky ,  John Fielden ,  John Madsen ,  Robert Peters

IPC: H01L21/66

CPC classification number: H01L22/12 ,  H01L22/20 ,  H01L22/30 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

Abstract translation: 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。

公开(公告)号：US09529182B2

公开(公告)日：2016-12-27

申请号：US14170384

申请日：2014-01-31

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: G01N21/95 ,  H01S3/00 ,  H01S3/23 ,  G02B17/08

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract translation: 描述了用于产生亚200nm光的改进的固态激光器。 该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。 激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。 通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率，良好的稳定性和高可靠性。

公开(公告)号：US09525265B2

公开(公告)日：2016-12-20

申请号：US14596738

申请日：2015-01-14

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Justin Dianhuan Liou ,  J. Joseph Armstrong ,  Yujun Deng ,  John Fielden

IPC: H01S3/10 ,  H01S3/00

CPC classification number: H01S3/10046 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/08004 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10 ,  H01S3/10061 ,  H01S2301/20 ,  H01S2301/203 ,  H01S2301/206

Abstract: A repetition rate (pulse) multiplier includes one or more beam splitters and prisms forming one or more ring cavities with different optical path lengths that delay parts of the energy of each pulse. A series of input laser pulses circulate in the ring cavities and part of the energy of each pulse leaves the system after traversing the shorter cavity path, while another part of the energy leaves the system after traversing the longer cavity path, and/or a combination of both cavity paths. By proper choice of the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitters. Some embodiments generate a time-averaged output beam profile that is substantially flat in one dimension.

Abstract translation: 重复率（脉冲）乘法器包括一个或多个分束器和棱镜，其形成具有延迟每个脉冲的能量部分的不同光程长度的一个或多个环形空腔。 一系列输入激光脉冲在环形腔中循环，并且每个脉冲的能量的一部分在穿过较短腔体路径之后离开系统，而另一部分能量在穿过较长腔体路径后离开系统，和/或组合 两个腔道。 通过适当选择环腔光程长度，激光脉冲的输出系列的重复率可以是输入重复率的倍数。 可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。 一些实施例产生在一个维度上基本上平坦的时间平均的输出光束轮廓。

公开(公告)号：US20160359292A1

公开(公告)日：2016-12-08

申请号：US15239268

申请日：2016-08-17

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Justin Dianhuan Liou ,  J. Joseph Armstrong ,  Yujun Deng ,  John Fielden

IPC: H01S3/10 ,  H01S3/083 ,  H01S3/08

CPC classification number: H01S3/10046 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/08004 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10 ,  H01S3/10061 ,  H01S2301/20 ,  H01S2301/203 ,  H01S2301/206

Abstract: A repetition rate (pulse) multiplier includes one or more beam splitters and prisms forming one or more ring cavities with different optical path lengths that delay parts of the energy of each pulse. A series of input laser pulses circulate in the ring cavities and part of the energy of each pulse leaves the system after traversing the shorter cavity path, while another part of the energy leaves the system after traversing the longer cavity path, and/or a combination of both cavity paths. By proper choice of the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitters. Some embodiments generate a time-averaged output beam profile that is substantially flat in one dimension.

Abstract translation: 重复率（脉冲）乘法器包括一个或多个分束器和棱镜，其形成具有延迟每个脉冲的能量部分的不同光程长度的一个或多个环形空腔。 一系列输入激光脉冲在环形腔中循环，并且每个脉冲的能量的一部分在穿过较短腔体路径之后离开系统，而另一部分能量在穿过较长腔体路径后离开系统，和/或组合 两个腔道。 通过适当选择环腔光程长度，激光脉冲的输出系列的重复率可以是输入重复率的倍数。 可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。 一些实施例产生在一个维度上基本上平坦的时间平均的输出光束轮廓。

公开(公告)号：US09494531B2

公开(公告)日：2016-11-15

申请号：US14455161

申请日：2014-08-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  John Fielden ,  Ivan Maleev

IPC: G01N21/88 ,  G01J1/04 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01J1/04 ,  G01N21/8806

Abstract: Methods and systems for minimizing interference among multiple illumination beams generated from a non-uniform illumination source to provide an effectively uniform illumination profile over the field of view of an inspection system are presented. In some examples, a pulsed beam of light is split into multiple illumination beams such that each of the beams are temporally separated at the surface of the specimen under inspection. In some examples, multiple illumination beams generated from a non-uniform illumination source are projected onto spatially separated areas on the surface of the specimen. A point object of interest illuminated by each area is imaged onto the surface of a time-delay integration (TDI) detector. The images are integrated such that the relative position of the illumination areas along the direction of motion of the point object of interest has no impact on the illumination efficiency distribution over the field of view.

Abstract translation: 提出了用于最小化从不均匀照明源产生的多个照明光束之间的干扰的方法和系统，以在检查系统的视场上提供有效均匀的照明轮廓。 在一些示例中，脉冲光束被分成多个照明光束，使得每个光束在被检查的样品的表面处在时间上分离。 在一些示例中，从不均匀照明源产生的多个照明光束投影到样本表面上的空间分离的区域上。 由每个区域照明的感兴趣的点对象被成像到时间延迟积分（TDI）检测器的表面上。 图像被集成为使得照明区域沿着感兴趣点对象的运动方向的相对位置对视场的照明效率分布没有影响。

公开(公告)号：US20160315114A1

公开(公告)日：2016-10-27

申请号：US15201028

申请日：2016-07-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Jingjing Zhang ,  John Fielden

IPC: H01L27/146 ,  H01L31/107 ,  G01N21/88 ,  H01L27/148 ,  G01N21/95

CPC classification number: H01L27/14632 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/061 ,  G01N2201/0638 ,  G01N2201/12 ,  H01L27/14609 ,  H01L27/1461 ,  H01L27/14612 ,  H01L27/1462 ,  H01L27/1464 ,  H01L27/14643 ,  H01L27/14645 ,  H01L27/14647 ,  H01L27/14681 ,  H01L27/14685 ,  H01L27/14687 ,  H01L27/14689 ,  H01L27/14698 ,  H01L27/14825 ,  H01L27/14831 ,  H01L27/14856 ,  H01L31/028 ,  H01L31/107 ,  H01L31/1804

Abstract: A high sensitivity image sensor comprises an epitaxial layer of silicon that is intrinsic or lightly p doped (such as a doping level less than about 1013 cm−3). CMOS or CCD circuits are fabricated on the front-side of the epitaxial layer. Epitaxial p and n type layers are grown on the backside of the epitaxial layer. A pure boron layer is deposited on the n-type epitaxial layer. Some boron is driven a few nm into the n-type epitaxial layer from the backside during the boron deposition process. An anti-reflection coating may be applied to the pure boron layer. During operation of the sensor a negative bias voltage of several tens to a few hundred volts is applied to the boron layer to accelerate photo-electrons away from the backside surface and create additional electrons by an avalanche effect. Grounded p-wells protect active circuits as needed from the reversed biased epitaxial layer.

公开(公告)号：US20160300701A1

公开(公告)日：2016-10-13

申请号：US15189871

申请日：2016-06-22

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  David L. Brown ,  John Fielden

IPC: H01J40/06 ,  H01L31/103 ,  H01L31/0216 ,  H01J43/08

CPC classification number: H01J40/06 ,  H01J43/08 ,  H01L31/02161 ,  H01L31/103

Abstract: A system for inspecting a sample including a detector, either a photomultiplier tube or an electron-bombarded image sensor, that is positioned to receive light from the sample. The detector includes a semiconductor photocathode and a photodiode. Notably, the photodiode includes a p-doped semiconductor layer, an n-doped semiconductor layer formed on a first surface of the p-doped semiconductor layer to form a diode, and a pure boron layer formed on a second surface of the p-doped semiconductor layer. The semiconductor photocathode includes silicon, and further includes a pure boron coating on at least one surface.

Abstract translation: 用于检查包括检测器，光电倍增管或电子轰击图像传感器的样品的系统，其被定位成接收来自样品的光。 检测器包括半导体光电阴极和光电二极管。 值得注意的是，光电二极管包括p掺杂半导体层，形成在p掺杂半导体层的第一表面上以形成二极管的n掺杂半导体层，以及在p掺杂的第二表面上形成的纯硼层 半导体层。 半导体光电阴极包括硅，并且在至少一个表面上还包括纯硼涂层。